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Ronald John Kuse

from San Diego, CA
Age ~61
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Also known as:
Ronald J Kuse, Robert Allen Kuse
Phone and address:
18771 Caminito Pasadero UNIT 58, San Diego, CA 92128
(858) 649-6134
Related to:
Dustin P Mcadon, 45Kristen N Hayes-Kuse, 56Robert Kuse, 59Hifumi KuseGlenn Kuse, 64Toshiko Kuse, 87
Connected to:
Eva M Kuse, 52Glenn M Kuse, 64Judith K Kuse, 75Carol S Kusek, 83Corey Kusek, 37David J Kusek, 39Jonathan Kusek, 33Laura A Kusek, 35Mildred T Kusek, 96Sam M Kusek, 36

Ronald Kuse Phones & Addresses

  • 18771 Caminito Pasadero UNIT 58, San Diego, CA 92128 (858) 649-6134
  • 24214 40Th St, Issaquah, WA 98029
  • Dublin, CA
  • 1545 Woodmeadow Ct, San Jose, CA 95131
  • 1348 Lakeshore Cir, San Jose, CA 95131 (408) 453-0614
  • Sammamish, WA
  • Seattle, WA
  • Pittsburgh, PA
  • Cambridge, MA
  • Sunnyvale, CA

Publications

Us Patents

Reduced Particle Contamination Manufacturing And Packaging For Reticles

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US Patent:
6715495, Apr 6, 2004
Filed:
Dec 13, 2000
Appl. No.:
09/737125
Inventors:
Giang T. Dao - Fremont CA
Ronald J. Kuse - San Jose CA
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
B08B 704
US Classification:
134 11, 134 1, 134 19, 134 21, 134 34, 134 37, 428 14
Abstract:
A method of transporting a reticle is disclosed. The reticle is placed in a reticle carrier that has an ionizer. Moreover, the reticle may be attached with a pellicle. The pellicle consists of a pellicle frame and a pellicle film stretched over the pellicle frame. The pellicle frame has included within an absorbent material.

Reduced Particle Contamination Manufacturing And Packaging For Reticles

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US Patent:
6732746, May 11, 2004
Filed:
Dec 13, 2000
Appl. No.:
09/737139
Inventors:
Giang T. Dao - Fremont CA
Ronald J. Kuse - San Jose CA
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
B08B 704
US Classification:
134 11, 134 19, 134 21, 134 2218, 134 37
Abstract:
A method of transporting a reticle is disclosed. The reticle is placed in a reticle carrier that has an ionizer. Moreover, the reticle may be attached with a pellicle. The pellicle consists of a pellicle frame and a pellicle film stretched over the pellicle frame. The pellicle frame has included within an absorbent material.

Method Of Transporting A Reticle

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US Patent:
6763608, Jul 20, 2004
Filed:
Sep 26, 2002
Appl. No.:
10/256357
Inventors:
Giang T. Dao - Fremont CA
Ronald J. Kuse - San Jose CA
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
F26B 700
US Classification:
34380, 34275, 34276
Abstract:
A method of transporting a reticle is disclosed. The reticle is placed in a reticle carrier that has an ionizer. Moreover, the reticle may be attached with a pellicle. The pellicle consists of a pellicle frame and a pellicle film stretched over the pellicle frame. The pellicle frame has included within an absorbent material.

Reduced Particle Contamination Manufacturing And Packaging For Reticles

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US Patent:
7368020, May 6, 2008
Filed:
Apr 5, 2004
Appl. No.:
10/818311
Inventors:
Giang T. Dao - Fremont CA, US
Ronald J. Kuse - San Jose CA, US
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
B08B 7/04
US Classification:
134 30, 134 1, 134 11, 134 19, 134 26, 134 34, 134 39, 134 42
Abstract:
A method of transporting a reticle is disclosed. The reticle is placed in a reticle carrier that has an ionizer. Moreover, the reticle may be attached with a pellicle. The pellicle consists of a pellicle frame and a pellicle film stretched over the pellicle frame. The pellicle frame has included within an absorbent material.

Charge Blocking Layers For Nonvolatile Memories

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US Patent:
8298890, Oct 30, 2012
Filed:
Sep 3, 2009
Appl. No.:
12/553918
Inventors:
Ronald John Kuse - Dublin CA, US
Monica Sawkar Mathur - San Jose CA, US
Wen Wu - Pleasanton CA, US
Assignee:
Intermolecular, Inc. - San Jose CA
International Classification:
H01L 21/336
US Classification:
438257, 438211, 438593, 438972, 257239, 257261, 257298, 257E21179, 257E21495
Abstract:
A semiconductor memory element is described, including a substrate including a source region, a drain region, and a channel region, a tunnel oxide over the channel region of the substrate, a charge storage layer over the tunnel oxide, a charge blocking layer over the charge storage layer, and a control gate over the charge blocking layer. The charge blocking layer further includes a first layer including a transition metal oxide, a second layer including a metal silicate, a third layer including the transition metal oxide of the first layer.

Resistive-Switching Memory Elements Having Improved Switching Characteristics

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US Patent:
8343813, Jan 1, 2013
Filed:
Feb 12, 2010
Appl. No.:
12/705474
Inventors:
Ronald John Kuse - Dublin CA, US
Imran Hashim - Saratoga CA, US
Tony Chiang - Campbell CA, US
Assignee:
Intermolecular, Inc. - San Jose CA
International Classification:
H01L 21/332
H01L 45/00
US Classification:
438133, 438104, 438381, 365 51, 365148, 365189011, 257 2, 257 4, 257512, 257E21001, 257E21006, 257E45003, 257E47001
Abstract:
Resistive-switching memory elements having improved switching characteristics are described, including a memory element having a first electrode and a second electrode, a switching layer between the first electrode and the second electrode comprising hafnium oxide and having a first thickness, and a coupling layer between the switching layer and the second electrode, the coupling layer comprising a material including metal titanium and having a second thickness that is less than 25 percent of the first thickness.

Method For Reducing Forming Voltage In Resistive Random Access Memory

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US Patent:
20130089949, Apr 11, 2013
Filed:
Nov 9, 2012
Appl. No.:
13/673504
Inventors:
Ronald J. Kuse - San Diego CA, US
Jinhong Tong - Santa Clara CA, US
Assignee:
Intermolecular Inc. - San Jose CA
International Classification:
H01L 45/00
US Classification:
438104
Abstract:
Methods for producing RRAM resistive switching elements having reduced forming voltage include preventing formation of interfacial layers, and creating electronic defects in a dielectric film. Suppressing interfacial layers in an electrode reduces forming voltage. Electronic defects in a dielectric film foster formation of conductive pathways.

Cleaning Solvent For Aircraft Hydraulic Fluid

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US Patent:
53043227, Apr 19, 1994
Filed:
May 15, 1992
Appl. No.:
7/888992
Inventors:
Ronald J. Kuse - Kent WA
Assignee:
The Boeing Company - Seattle WA
International Classification:
C11D 730
C11D 750
C23G 5028
B08B 304
US Classification:
252172
Abstract:
An environmentally compliant cleaning solvent for removing commercial aircraft hydraulic fluid comprises from about 25 to 35 volume percent perfluorocarbon with from about 4 to 8 carbons in the alkyl chain, from about 25 to 35 volume percent hydrochlorofluorocarbon with about 2 to 5 carbons in the alkyl chain; and the balance petroleum distillates with from about 5 to 9 carbons in the alkyl chain.
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Ronald John Kuse from San Diego, CA, age ~61 Get Report