Inventors:
James R. Nonnemacher - Rochester NY
Michael T. Regan - Fairport NY
Frank G. Webster - Rochester NY
Assignee:
Eastman Kodak Company - Rochester NY
International Classification:
G03G 506
G03G 1704
Abstract:
Electrophotosensitive materials having the structure ##STR1## wherein R represents a basic heterocyclic nucleus as well as groups such as hydrogen, alkyl, aryl, aralkyl, etc. ; A. sub. 1 represents a wide variety of basic heterocyclic nuclei; A. sub. 2 represents aryl or may be the same as A. sub. 1 ; G represents O or S; M is 0 to 3; N is 0 to 1; and L. sup. 1, L. sup. 2, L. sup. 3, L. sup. 4 and L. sup. 5 represetn hydrogen, alkyl or aryl.