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Yuanhong Hong Guo

from Mountain View, CA
Age ~50
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Also known as:
Yuanhong Te Guo, Yuan Hong Guo, Yuan-Hong Guo, Hong Guo Yuan, Yuanghong Glio
Related to:
Ke Guo, 49Dan Xu, 59Jian-Yu Xu, 55Jianyu Xu, 47Dan Xu, 51Ruqun Shan Qun, 50Yuankai Chen, 38Chuanhao Guo, 53Guohai Xia, 61Zhaofu ChenQian Guo, 52
Connected to:
Alyssa D Guo, 27Annabella P Guo, 54Audrey M Guo, 33Bev Guo, 45Billy Guo, 33Biwei Guo, 42Charlene S Guo, 66Christopher L Guo, 42Chunyuan Guo, 44Deborah Guo, 32

Yuanhong Guo Phones & Addresses

  • Mountain View, CA
  • Elk Grove, CA
  • 1426 Rocklin Ct, San Jose, CA 95131
  • 1721 Warburton Ave, Santa Clara, CA 95050 (408) 564-5620
  • 2200 Monroe St, Santa Clara, CA 95050 (408) 564-5620
  • Mount Aukum, CA
  • Ithaca, NY
  • 1432 Tanaka Dr, San Jose, CA 95131

Work

Company: Applied materials Nov 2007 Position: Senior systems design engineer

Education

Degree: Master of Engineering School / High School: Cornell University 2000 to 2002 Specialities: System Engineering

Skills

Semiconductors • Manufacturing • Engineering Management • Systems Engineering • Testing

Industries

Semiconductors

Resumes

Resumes

Yuanhong Guo Photo 1

Senior Manager System Engineering

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Location:
1721 Warburton Ave, Santa Clara, CA 95050
Industry:
Semiconductors
Work:
Applied Materials since Nov 2007
Senior Systems Design Engineer
AKT America, a subsidary of Applied Materials May 2006 - Nov 2007
Senior Systems Design Engineer
Applied Materials Feb 2002 - May 2006
Senior Systems Design Engineer
Steel & Machinery Department Feb 1995 - Aug 2000
Deputy Manager
Education:
Cornell University 2000 - 2002
Master of Engineering, System Engineering Shanghai Jiao Tong University 1991 - 1995
Bachelor, Mechanical Engineering, Machine Manufacturing and Equipment
Skills:
Semiconductors
Manufacturing
Engineering Management
Systems Engineering
Testing

Publications

Us Patents

Substrate Support Components Having Quartz Contact Tips

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US Patent:
20080105201, May 8, 2008
Filed:
Oct 29, 2007
Appl. No.:
11/927120
Inventors:
TIMOTHY RONAN - San Jose CA, US
Yuanhong Guo - San Jose CA, US
Robert Decottignies - Redwood City CA, US
Todd W. Martin - Mountain View CA, US
Darryl K. Angelo - Sunnyvale CA, US
Song-Moon Suh - San Jose CA, US
Nitin Khurana - Milpitas CA, US
Edward Ng - San Jose CA, US
International Classification:
B05C 13/00
US Classification:
118500
Abstract:
A support component comprises a support structure having a support surface with one or more quartz contact tips. In one version, the support component comprises a robot blade capable of transferring a substrate into and out of a chamber. The robot blade comprises a plate having a plurality of raised mesas, each raised mesa comprising a quartz contact tip which minimizes contact with the substrate thereby generating fewer contaminant particles during substrate transportation. Other versions of the support component include a heat exchange pedestal, lift pin assembly, and lifting fin assembly.

Prevention Of Contamination Of Substrates During Pressure Changes In Processing Systems

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US Patent:
20230048337, Feb 16, 2023
Filed:
Aug 12, 2022
Appl. No.:
17/886748
Inventors:
- Santa Clara CA, US
Raechel Chu-Hui Tan - San Francisco CA, US
Changgong Wang - San Jose CA, US
Yuanhong Guo - Mountain View CA, US
Sai Padhy - San Jose CA, US
Ashley M. Okada - San Jose CA, US
Kenneth Le - Fremont CA, US
Atilla Kilicarslan - Mountain View CA, US
Dean C. Hruzek - Cedar Park TX, US
International Classification:
F24F 3/167
F24F 11/00
F24F 11/49
F24F 11/74
Abstract:
Disclosed are implementations for minimizing substrate contamination during pressure changes in substrate processing systems. Over a duration of a pressure change (increase or decrease) in a chamber of a substrate processing system, a flow rate is adjusted multiple times to reduce occurrence of contaminant particles in an environment of the chamber. In some instances, the flow rate is changed continuously using at least one dynamic valve that enable continuous control over the pressure dynamics of the chamber.

Wafer Treatment For Achieving Defect-Free Self-Assembled Monolayers

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US Patent:
20200402792, Dec 24, 2020
Filed:
Sep 8, 2020
Appl. No.:
17/014975
Inventors:
- Santa Clara CA, US
Lei Zhou - San Jose CA, US
Biao Liu - San Jose CA, US
Cheng Pan - San Jose CA, US
Yuanhong Guo - San Jose CA, US
Liqi Wu - San Jose CA, US
Michael S. Jackson - Sunnyvale CA, US
Ludovic Godet - Sunnyvale CA, US
Tobin Kaufman-Osborn - Sunnyvale CA, US
Erica Chen - Cupertino CA, US
Paul F. Ma - Santa Clara CA, US
International Classification:
H01L 21/027
H01L 21/02
H01L 21/67
H01L 21/3105
Abstract:
Methods of depositing a film selectively onto a first material relative to a second material are described. The substrate is pre-cleaned by heating the substrate to a first temperature, cleaning contaminants from the substrate and activating the first surface to promote formation of a self-assembled monolayer (SAM) on the first material. A SAM is formed on the first material by repeated cycles of SAM molecule exposure, heating and reactivation of the first material. A final exposure to the SAM molecules is performed prior to selectively depositing a film on the second material. Apparatus to perform the selective deposition are also described.

Substrate Support With Edge Seal

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US Patent:
20190326152, Oct 24, 2019
Filed:
Apr 18, 2019
Appl. No.:
16/388308
Inventors:
- Santa Clara CA, US
BONNIE CHIA - SUNNYVALE CA, US
SONG-MOON SUH - SAN JOSE CA, US
CHENG-HSIUNG TSAI - CUPERTINO CA, US
YUANHONG GUO - MOUNTAIN VIEW CA, US
LEI ZHOU - SANTA CLARA CA, US
DAVID LANGTRY - SUNNYVALE CA, US
International Classification:
H01L 21/687
H01L 21/67
C23C 16/455
Abstract:
Methods and apparatus for supporting a substrate are provided herein. In some embodiments, a substrate support to support a substrate having a given diameter includes: a base ring having an inner diameter less than the given diameter, the base ring having a support surface configured to contact a first surface of the substrate and to form a seal between the support surface and the first surface of the substrate, when disposed atop the base ring; and a clamp ring having an inner diameter less than the given diameter, wherein the clamp ring includes a contact surface proximate the inner diameter configured to contact an upper surface of the substrate, when present, and wherein the clamp ring and the base ring are further configured to provide a bias force toward each other to clamp the substrate in the substrate support.

Wafer Treatment For Achieving Defect-Free Self-Assembled Monolayers

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US Patent:
20180366317, Dec 20, 2018
Filed:
Jun 14, 2018
Appl. No.:
16/008495
Inventors:
- Santa Clara CA, US
Lei Zhou - San Jose CA, US
Biao Liu - San Jose CA, US
Cheng Pan - San Jose CA, US
Yuanhong Guo - San Jose CA, US
Liqi Wu - San Jose CA, US
Michael S. Jackson - Sunnyvale CA, US
Ludovic Godet - Sunnyvale CA, US
Tobin Kaufman-Osborn - Sunnyvale CA, US
Erica Chen - Cupertino CA, US
Paul F. Ma - Santa Clara CA, US
International Classification:
H01L 21/027
H01L 21/02
H01L 21/67
Abstract:
Methods of depositing a film selectively onto a first material relative to a second material are described. The substrate is pre-cleaned by heating the substrate to a first temperature, cleaning contaminants from the substrate and activating the first surface to promote formation of a self-assembled monolayer (SAM) on the first material. A SAM is formed on the first material by repeated cycles of SAM molecule exposure, heating and reactivation of the first material. A final exposure to the SAM molecules is performed prior to selectively depositing a film on the second material. Apparatus to perform the selective deposition are also described.

Cleaning Of Chamber Components With Solid Carbon Dioxide Particles

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US Patent:
20160016286, Jan 21, 2016
Filed:
Jul 18, 2014
Appl. No.:
14/335291
Inventors:
- Santa Clara CA, US
Yuanhong Guo - Mountain View CA, US
Guangchi Xuan - Sunnyvale CA, US
Pulkit Agarwal - Santa Clara CA, US
International Classification:
B24C 1/00
B08B 7/00
Abstract:
Disclosed herein are systems and methods for cleaning a ceramic article using a stream of solid carbon dioxide (CO) particles. A method includes flowing liquid COinto a spray nozzle, and directing a first stream of solid COparticles from the spray nozzle toward a ceramic article for a first time duration to clean the ceramic article. The liquid COis converted into the first stream of solid COparticles upon exiting the spray nozzle. The first stream of solid COparticles causes a layer of solid COto be formed on the ceramic article. After the layer of solid COhas sublimated, a second stream of solid COparticles is directed from the spray nozzle toward the ceramic article for at least one of the first time duration or a second time duration to further clean the ceramic article.
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Yuanhong Hong Guo from Mountain View, CA, age ~50 Get Report