Inventors:
Martin Weiss - Portland OR, US
Brian Kinnear - Hillsboro OR, US
Telly Koffas - Beaverton OR, US
David Fryer - Hillsboro OR, US
Ming-chuan Yang - Meridian ID, US
William T. Blanton - Hillsboro OR, US
International Classification:
G01J 4/00
Abstract:
In one embodiment, a wafer alignment system, comprises a radiation source to generate radiation, a radiation directing assembly to direct at least a portion of the radiation onto a surface of a wafer, the radiation having a polarization state, an optical analyzer to collect at least a portion of the radiation reflected from the wafer, the wafer including at least a first region having a first grating pattern oriented in a first direction and at least a second region having a second grating pattern oriented in a second direction, different from the first direction.