Inventors:
Visweswaren Sivaramakrishnan - Santa Clara CA, US
John White - Hayward CA, US
Koichi Ishikawa - Yokohama, JP
Hideaki Miyamoto - Uji, JP
Takeshi Kawano - Santa Clara CA, US
Assignee:
Applied Materials - Santa Clara CA
International Classification:
B01F 3/04
US Classification:
261 62, 261 66, 261261, 261DIG 65, 118726
Abstract:
The disclosure relates to a vaporizer valve which accepts a carrier gas and a pressurized liquid and forms a mixture of the carrier gas and vaporized liquid. An internal cavity receives the carrier gas through a carrier aperture and the liquid through a liquid aperture, and the mixed gas and vapor are exhausted out of the cavity via a third aperture. A moveable diaphragm disposed adjacent to the liquid aperture forms a vaporization region having a pressure gradient. The liquid passing through this pressure gradient vaporizes due to expansion. By controlling the diaphragm position with a feedback control circuit responsive to a liquid flow rate monitor, the liquid flow rate may be controlled independently of the carrier gas flow rate.