Inventors:
Koji Tsunekawa - Tokyo, JP
Yoshinori Nagamine - Tokyo, JP
Shinji Furukawa - San Jose CA, US
Assignee:
CANON ANELVA CORPORATION - Kawasaki-shi
International Classification:
H01L 21/477
F27D 11/12
F25B 29/00
US Classification:
165 61, 165 63, 165 64, 392416, 392418
Abstract:
The present invention provides a vacuum heating/cooling apparatus capable of rapidly heating and also rapidly cooling only a substrate while a high vacuum degree is maintained after film-formation processing. The vacuum heating/cooling apparatus according to an embodiment of the present invention includes a vacuum chamber (), a halogen lamp () which emits heating light, a quartz window () for allowing the heating light to enter the vacuum chamber (), a substrate supporting base () having a cooling function, and a lift pin () which causes the substrate () to stand still at a heating position P and a cooling position P and moves the substrate () between the heating position P and the cooling position P
