Inventors:
Alex Cooper - Brooklyn NY, US
Yevgeny Bederak - Long Meadow MA, US
Sergey Vladimirtsev - Brooklyn NY, US
Assignee:
Universal Photonics, Inc. - Hicksville NY
International Classification:
B24D 17/00
Abstract:
A polishing pad for polishing curved surfaces has a pad element having an axis, a central opening adjoining the axis and forming an inner edge, and an outer peripheral edge, first engaging means provided on the outer peripheral edge for engaging an outer periphery of a curved supporting body, and second engaging means provided on the inner edge of the pad element and engageable with a central opening of the curved supporting body, the first and second engaging means being harder than the pad element.