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Robert Stubbers Phones & Addresses

  • Mahomet, IL
  • 309 E Tomaras Ave, Savoy, IL 61874 (217) 390-2784
  • 3220 Brentwood Dr, Champaign, IL 61821 (217) 355-7338
  • 105 Wright St, Champaign, IL 61820
  • 3875 Cooper St, Cincinnati, OH 45241 (513) 891-5388
  • Blue Ash, OH
  • 1211 Clark St, Urbana, IL 61801 (217) 344-6936
  • 105 S Wright St APT 306, Champaign, IL 61820

Work

Position: Food Preparation and Serving Related Occupations

Education

Degree: Bachelor's degree or higher

Business Records

Name / Title
Company / Classification
Phones & Addresses
Robert Stubbers
Professor
Starfire Industries LLC
Biological Products, Except Diagnostic
60 Hazelwood Dr, Champaign, IL 61820
(708) 955-6691

Publications

Us Patents

Gas-Target Neutron Generation And Applications

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US Patent:
20030152186, Aug 14, 2003
Filed:
Jan 28, 2002
Appl. No.:
10/058561
Inventors:
Brian Jurczyk - Joliet IL, US
John DeMora - Chicago IL, US
Robert Stubbers - Cincinnati OH, US
International Classification:
G21B001/00
G21J001/00
US Classification:
376/109000
Abstract:
Described herein are integrated systems for generating neutrons to perform a variety of tasks including: on-line analysis of bulk material and industrial process control (as shown in FIG. ), security interrogation (as shown in FIG. ), soil and environmental analysis, and medical diagnostic treatment. These systems are based on novel gas-target neutron generation which embodies the beneficial characteristics of replenishable fusible gas targets for very long lifetime, stability and continuous operation, combined with the advantageous features common to conventional accelerator neutron tubes including: on/off operation, hermetically sealed operation, and safe storage and transport. Innovative electron management techniques provide gas-target neutron production efficiencies that are comparable or surpass existing sources. The high-pressure high-resistance gaseous discharge is presented as a favorable gas-target neutron generator embodiment, combining ion source regions, accelerator regions, gas-target regions and electron management components within a single simple cost-effective device that is adaptable to various geometric configurations that provide specific neutron emission profiles for greater analysis capacity.

Long Life High Efficiency Neutron Generator

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US Patent:
20110044418, Feb 24, 2011
Filed:
Feb 27, 2009
Appl. No.:
12/919912
Inventors:
Robert Andrew Stubbers - Champaign IL, US
Brian Edward Jurczyk - Champaign IL, US
Darren Adam Alman - Savoy IL, US
Matthew David Coventry - Champaign IL, US
Michael Jerome Schaus - Glen Ellyn IL, US
Assignee:
Starfire Industries LLC - Champaign IL
International Classification:
G21B 1/00
G21B 1/17
G21B 1/05
US Classification:
376116, 376114, 376121
Abstract:
The design of a compact, high-efficiency, high-flux capable compact-accelerator fusion neutron generator (FNG) is discussed. FNG's can be used in a variety of industrial analysis applications to replace the use of radioisotopes which pose higher risks to both the end user and national security. High efficiency, long lifetime, and high power-handling capability are achieved though innovative target materials and ion source technology. The device can be scaled up for neutron radiography applications, or down for borehole analysis or other compact applications. Advanced technologies such as custom neutron output energy spectrum, pulsing, and associated particle imaging can be incorporated.

Method And System For In Situ Depositon And Regeneration Of High Efficiency Target Materials For Long Life Nuclear Reaction Devices

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US Patent:
20110091000, Apr 21, 2011
Filed:
Feb 27, 2009
Appl. No.:
12/919890
Inventors:
Robert Andrew Stubbers - Champaign IL, US
Brian Edward Jurczyk - Champaign IL, US
Darren Adam Alman - Savoy IL, US
Matthew David Coventry - Champaign IL, US
Michael Jerome Schaus - Glen Ellyn IL, US
Assignee:
Starfire Industries LLC - Champaign IL
International Classification:
G21B 1/19
G21B 1/17
US Classification:
376109
Abstract:
Aspects of the invention relate to several methods to deposit and regenerate target materials in neutron generators and similar nuclear reaction devices. In situ deposition and regeneration of a target material reduces tube degradation of the nuclear reaction device and covers impurities on the surface of the target material at the target location. Further aspects of the invention include a method of designing a target to generate neutrons at a high efficiency rate and at a selected neutron energy from a neutron energy spectrum.

Method And Apparatus For Cold Plasma Treatment Of Internal Organs

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US Patent:
20130053762, Feb 28, 2013
Filed:
Aug 27, 2012
Appl. No.:
13/595378
Inventors:
Michael Rontal - Farmington Hills MI, US
David Ruzic - Pesotum IL, US
Brian Jurczyk - Champaign IL, US
Robert Stubbers - Champaign IL, US
International Classification:
A61M 37/00
A61B 1/005
US Classification:
604 24
Abstract:
Chronic sinusitis is treated by the application of cold plasma or plasma-activated species to the infected mucosal surfaces through use of an endoscope having a steerable end which may be projected into the sinus cavities through the nasal cavity. The cold plasma is generated at either the distal end of the endoscope with a power source by application of a power, or at the distal end by gas and electrical connections extending through the endoscope. The cold plasma or plasma-activated species act to destroy bacterial cells but not eukaryotic cells.

Method And Apparatus For Cold Plasma Treatment Of Internal Organs

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US Patent:
20140005481, Jan 2, 2014
Filed:
Aug 9, 2013
Appl. No.:
13/963364
Inventors:
Michael Rontal - Farmington Hills MI, US
David Ruzic - Pesotum IL, US
Brian Jurczyk - Champaign IL, US
Robert Stubbers - Champaign IL, US
International Classification:
A61B 18/04
US Classification:
600158, 604 26, 604 20
Abstract:
Chronic sinusitis is treated by the application of cold plasma or plasma-activated species to the infected mucosal surfaces through use of an endoscope having a steerable end which may be projected into the sinus cavities through the nasal cavity. The cold plasma is generated at either the distal end of the endoscope with a power source by application of a power, or at the distal end by gas and electrical connections extending through the endoscope. The cold plasma or plasma-activated species act to destroy bacterial cells but not eukaryotic cells.

Bellows Coating By Magnetron Sputtering With Kick Pulse

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US Patent:
20220230859, Jul 21, 2022
Filed:
Jan 20, 2022
Appl. No.:
17/580585
Inventors:
- Champaign IL, US
Daniel P. Menet - Urbana IL, US
Ian F. Haehnlein - Champaign IL, US
Robert A. Stubbers - Savoy IL, US
Brian E. Jurczyk - Champaign IL, US
International Classification:
H01J 37/34
C23C 14/35
C23C 14/56
Abstract:
A radial magnetron system for plasma surface modification and deposition of high-quality coatings for multi-dimensional structures is described. The system includes an axial electrode, a target material disposed on a portion of the axial electrode, an applied potential from an external electrical power source, and a high-current contact attached to the axial electrode for the applied potential. The system further includes a primary permanent magnet assembly comprising individual magnetic material elements configured to produce a target-region magnetic field for generating a Hall-effect dense plasma region under application of the applied potential to the axial electrode, and a magnet substrate that supports the primary permanent magnet assembly within the axial electrode. The magnet substrate is configured to provide a passageway for cooling the primary permanent magnet assembly and the axial electrode.

Pulsed Power Module With Pulse And Ion Flux Control For Magnetron Sputtering

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US Patent:
20210343513, Nov 4, 2021
Filed:
Jul 14, 2021
Appl. No.:
17/375383
Inventors:
- Champaign IL, US
Robert Andrew Stubbers - Savoy IL, US
Brian Edward Jurczyk - Champaign IL, US
International Classification:
H01J 37/34
C23C 14/35
C23C 14/34
H03K 3/02
H03K 3/011
Abstract:
An electrical power pulse generator system and a method of the system's operation are described herein. A main energy storage capacitor supplies a negative DC power and a kick energy storage capacitor supplies a positive DC power. A main pulse power transistor is interposed between the main energy storage capacitor and an output pulse rail and includes a main power transmission control input for controlling power transmission from the main energy storage capacitor to the output pulse rail. A positive kick pulse power transistor is interposed between the kick energy storage capacitor and the output pulse rail and includes a kick power transmission control input for controlling power transmission from the kick energy storage capacitor to the output pulse rail. A positive kick pulse power transistor control line is connected to the kick power transmission control input of the positive kick pulse transistor.

System For Coupling Rf Power Into Linacs And Bellows Coating By Magnetron Sputtering With Kick Pulse

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US Patent:
20210327694, Oct 21, 2021
Filed:
May 17, 2021
Appl. No.:
17/322600
Inventors:
- Champaign IL, US
Daniel P. Menet - Urbana IL, US
Ian F. Haehnlein - Champaign IL, US
Ivan A. Shchelkanov - Pleasanton CA, US
Robert A. Stubbers - Savoy IL, US
Brian E. Jurczyk - Champaign IL, US
International Classification:
H01J 37/34
C23C 14/35
C23C 14/34
Abstract:
A system and associated method are described for depositing high-quality films for providing a coating on a three-dimensional surface such as an internal surface of a bellows structure. The system includes a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target. The system further includes an elongated sputtering electrode material tube surrounding the magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along the sputter target. During operation, the system generates and controls ion flux for direct current high-power impulse magnetron sputtering. During operation logic circuitry issues a control signal to control a kick pulse property of a sustained positive voltage kick pulse taken from the group consisting of: onset delay, amplitude and duration.
Robert A Stubbers from Mahomet, IL, age ~53 Get Report