Rajesh Vilas Chopdekar

2121 Dwight Way, Berkeley, CA 94704

Research

Lawrence Berkeley National Laboratory
Microscopy Scientist
Uc Davis Nov 1, 2012 - Jan 2018
Postdoctoral Researcher and Research Associate
Uc Davis Sep 2015 - Mar 2017
Lecturer
Paul Scherrer Institut Nov 1, 2009 - Oct 1, 2012
Postdoctoral Scholar
Uc Berkeley Oct 1, 2008 - Aug 1, 2009
Postdoctoral Researcher

University of California, Berkeley 2003 - 2008
Cornell University 2002 - 2003
Doctorates, Doctor of Philosophy, Applied Physics Cornell University 2001 - 2002
Masters, Master of Engineering, Applied Physics Cornell University 1997 - 2001
Bachelors, Bachelor of Science, Engineering, Physics University of California

Characterization
Pulsed Laser Deposition
Oxides
Epitaxy
X Ray Absorption Spectroscopy
Magnetics
Resistivity
X Ray Diffractometry
Sputter Deposition
Evaporators
Cryogenics
Cryostat
Microscopy
Scanning Probe Microscopy
Nanofabrication
Spectroscopy
Nanotechnology
Materials Science
Applied Physics
Afm
Semiconductor Device
University Teaching
Data Analysis
Labview
Physics
Thin Films
Mentoring
Research
Diffraction
Solid State Characterization

English

University of California

2012 to 2000
Postdoctoral Fellow
Paul Scherrer Institute

2009 to 2012
Postdoctoral Fellow
Cornell University and University of California, Berkeley
Berkeley, CA
2004 to 2008
Graduate Research Assistant
IBM Microelectronics
Burlington, VT
2001 to 2001
Intern

Cornell University
Ithaca, NY
2004 to 2008
Ph. D. in Applied Physics
Cornell University
Ithaca, NY
2002 to 2004
Masters of Science in Applied Physics
Cornell University
Ithaca, NY
2001 to 2002
Masters of Engineering in Applied Physics
Cornell University
Ithaca, NY
1997 to 2001
Bachelors of Science in Engineering Physics

Thin film growth pulsed laser deposition (with RHEED), thermal and e-beam evaporation, DC and RF sputtering, chemical vapor deposition; Characterization SQUID magnetometry, vibrating sample magnetometry, magnetotransport with four point probe station and PPMS, scanning probe microscopy (atomic, magnetic, electrostatic force microscopy), four-circle x-ray diffraction, x-ray reflectivity, synchrotron soft x-ray spectroscopy (XAS, XMCD) and microscopy (PEEM, STXM), polarized neutron reflectometry, Rutherford backscattering spectrometry, magneto-optic Kerr effect magnetometry; Fabrication UV contact photolithography, Argon ion milling, wet etching, reactive ion etching, stylus profilometry; Computer Microsoft Office suite, Igor Pro, Origin, MATLAB, LabView, EndNote