Inventors:
Rajan D. Deshmukh - Pennington NJ
Benjamin J. Eggleton - Summit NJ
Pavel Ivanoff Reyes - Murray Hill NJ
Carl Soccolich - Flemington NJ
Michael Sumetsky - Bridgewater NJ
Paul S. Westbrook - Chatham NJ
Assignee:
Fitel USA Corp. - Norcross GA
International Classification:
G03F 720
US Classification:
430 30, 290321, 359569, 385 37
Abstract:
A grating fabrication process utilizes real-time measurement of a grating characteristic (such as, for example, grating period chirp, reflectivity, group delay) as a feedback error signal to modify the writing process and improve the characteristics of the finished grating. A test beam is launched through the optical medium during the writing process (or at the end of an initial writing process) and a particular characteristic is measured and used to generate a âcorrectiveâ apodization refractive index profile that can be incorporated with the grating to improve its characteristics. The improvements may be applied to a phase (or amplitude) mask used to write the grating (etching, local deformation, coating changes, for example), or the grating itself may be corrected using additional UV exposure, non-uniform annealing, non-uniform heating, and/or non-uniform tensionâthese techniques applied separately or in an intermittent sequence. The utilization of a âclosed loopâ grating fabrication process provides the ability to form gratings with finely tuned characteristics.