Nabil A Amro

7491422, Feb 17, 2009

Feb 14, 2005

11/056391

Hua Zhang - Evanston IL, US
Robert Elghanian - Wilmette IL, US
Linette Demers - Evanston IL, US
Nabil Amro - Chicago IL, US
Sandeep Disawal - Chicago IL, US
Sylvain Cruchon-Dupeyrat - Chicago IL, US

Nanoink, Inc. - Chicago IL

B05D 5/00
B05D 1/28
B82B 1/00
G01N 33/00
G03F 1/00

427256, 977857, 977863, 977879, 250307, 430 5

A novel method of transporting ink to a substrate with dip-pen nanolithographic (DPN) stamp tips coated with polymer (e. g. , polydimethylsiloxane (PDMS), etc. ). This kind of tip adsorbs chemicals (“inks”) easily and is used to generate DPN nanopatterns that are imaged with the same tip after a DPN process. This method builds a bridge between micro-contact printing (μCP) and DPN, making it possible for one to easily generate smaller structures of any molecules that have been patterned by the μCP technique. The easy tip-coating and writing process enriches the state-of-the-art DPN technique. The sub-100 nm DPN resolution obtained by using this kind of novel tip is comparable to that with a conventional SiNprobe tip. Importantly, the unique stamp tip was able to transfer solvent (e. g. , liquid “ink”) onto a substrate, resulting in fabrication of hollow nanostructures with only one DPN holding/writing step.

7691541, Apr 6, 2010

Oct 21, 2003

10/689547

Percy Van Crocker - Chicago IL, US
Sylvain Cruchon-Dupeyrat - Chicago IL, US
Linette Demers - Chicago IL, US
Robert Elghanian - Chicago IL, US
Sandeep Disawal - Chicago IL, US
Nabil Amro - Chicago IL, US
Hua Zhang - Chicago IL, US

NanoInk, Inc. - Skokie IL

G03F 1/00
G03F 1/14
B05D 3/00
B32B 43/00
B82B 3/00

430 5, 427140, 977857, 977863

Photomask repair and fabrication with use of direct-write nanolithography, including use of scanning probe microscopic tips (e. g. , atomic force microscope tips, etc. ) for deposition of ink materials including sol-gel inks. Additive methods can be combined with subtractive methods. Holes can be filled with nanostructures. Heights of the nanostructures filling the holes can be controlled without losing control of the lateral dimensions of the nanostructures. Phase shifters on phase shifting masks (PSMs) are additively repaired with selectively deposited sol-gel material that is converted to solid oxide, which has optical transparency and index of refraction adapted for the phase shifters repaired.

8071168, Dec 6, 2011

Feb 25, 2005

11/065694

Sylvain Cruchon-Dupeyrat - Chicago IL, US
Hua Zhang - Evanston IL, US
Robert Elghanian - Chicago IL, US
Linette Demers - Evanston IL, US
Nabil Amro - Chicago IL, US
Sandeep Disawal - Chicago IL, US
John Bussan - Naperville IL, US

Nanoink, Inc. - Skokie IL

B05D 5/00

427256, 427 21

A new, low temperature method for directly writing conductive metal traces with micron and sub-micron sized features. In this method, a flat beam is used, such as an AFM cantilever, with or without a tip, to draw traces of metal precursor ink onto a substrate. The dimensions of the metal traces can be directly controlled by the geometry of the cantilever, so that one can controllably deposit traces from 1 micron to over 100 microns wide with microfabricated cantilevers. Cantilevers with sharp tips can be used to further shrink the minimum features sizes to sub-micron scale. The height of the features can be increased by building layers of similar or different material.

8214916, Jul 3, 2012

Jan 25, 2010

12/656312

Nabil A. Amro - Wheeling IL, US
Raymond Sanedrin - Skokie IL, US

NanoInk, Inc. - Skokie IL

G01Q 20/02

850 6, 850 40, 850 32

Better leveling procedures for patterning at the small scale including the nanoscale. A method comprising: providing at least one array of cantilevers comprising tips thereon, wherein the cantilevers comprise at least one relatively bright spot, or at least two relatively bright spots, near the tip upon viewing, providing a substrate, leveling the array and the substrate with respect to each other, wherein the relatively bright spot near the tip is viewed to determine a contact of the tip and substrate.

20040127025, Jul 1, 2004

Aug 26, 2003

10/647430

Percy Crocker - Chicago IL, US
Linette Demers - Evanston IL, US
Nabil Amro - Skokie IL, US

H01L021/44
B05D005/12

438/677000, 427/125000

Nanolithographic deposition of metallic nanostructures using coated tips for use in microelectronics, catalysis, and diagnostics. AFM tips can be coated with metallic precursors and the precursors patterned on substrates. The patterned precursors can be converted to the metallic state with application of heat. High resolution and excellent alignment can be achieved.

20050221081, Oct 6, 2005

Mar 17, 2005

11/083739

Gang-Yu Liu - Davis CA, US
Nabil Amro - Chicago IL, US
Guohua Yang - Westmont IL, US

B32B015/04

428338000, 428457000, 428420000

Self-assembled monolayers and other solid support/surface-layer systems are widely used as resists for nanofabrication because of its closely packed structure, low defect density, and uniform thickness. However these resists suffer the drawback of low stability in liquid due to desorption and/or oxidation induced desorption. Stabilized solid support/surface-layer systems and methods of preserving the integrity and structure of self-assembled monolayers on solid surfaces are provided. The method involves adding small amount of amphiphilic molecules, such as DMF and DMSO, into aqueous solutions as preserving media. These molecules adhere favorably to defect sites within monolayers and inhibit the initiation of both known degradation pathways: oxidation and desorption. Also provided are stabilized systems including the solid support/surface-layer system and stabilizing solution, as well as kits of stabilizing solutions for use with various systems.

20090023607, Jan 22, 2009

May 7, 2008

12/116908

Sergey V. Rozhok - Skokie IL, US
Michael Nelson - Libertyville IL, US
Nabil A. Amro - Chicago IL, US
Joseph S. Fragala - San Jose CA, US
Raymond Roger Shile - Los Gatos CA, US
John Edward Bussan - Naperville IL, US
Dirk N. vanMerkestyn - Beach Park IL, US

C40B 50/14
C40B 60/14

506 30, 506 40

An apparatus for use in fabricating structures and depositing materials from tips to surfaces for patterning in direct-write mode, providing ability to travel macroscopic distances and yet provide for nanoscale patterning. Useful in small scale fabrication and nanolithography. The instrument can be compact and used on a laboratory bench or desktop. An apparatus comprising: at least one multi-axis assembly comprising a plurality of nanopositioning stages, at least one pen assembly, wherein the pen assembly and the multi-axis assembly are adapted for delivery of material from the pen assembly to a substrate which is positioned by the multi-axis assembly, at least one viewing assembly, at least one controller. Nanopositioning by piezoelectric methods and devices and motors is particularly useful. The apparatus can include integrated environmental chambers and housings, as well as ink reservoirs for materials to be delivered. The viewing assembly can be a microscope with a long working distance. Particularly useful for fabrication of bioarrays or microarrays. The multi-axis assembly can be a five-axis assembly. Software can facilitate efficient usage.

20090181172, Jul 16, 2009

Oct 14, 2008

12/251415

Mohamed PARPIA - Toronto, CA
Emma Tevaarwerk - Evanston IL, US
Nabil Amro - Wheeling IL, US
Raymond Sanedrin - Skokie IL, US

B05D 5/06
C09D 11/00
B05D 3/00
B05D 3/02
B22F 7/04

427256, 106 3113, 427331, 4273722, 419 9

An ink composition comprising: a plurality of metallic nanoparticles suspended in a carrier, wherein the carrier comprises water and at least one organic solvent miscible with water, and wherein the composition is formulated for slow dry rate and proper viscosity for DPN. Also, a method comprising: depositing a composition onto a cantilever, wherein the composition comprises a plurality of metallic nanoparticles suspended in a carrier, wherein the carrier comprises water and at least one organic solvent miscible with water. The composition can be used in direct writing onto surfaces to form patterns and arrays using cantilevers, microcontact printing, ink jet printing, and other methods. The composition is particularly useful for preparing nanoscale features and forming high quality continuous conductive lines and dots, including silver based lines and dots. Applications include surface repair.