Manivannan Thothadri

20110198322, Aug 18, 2011

Aug 5, 2010

12/851471

Antoine P. Manens - Saratoga CA, US
Ting-Ruei Shiu - Mountain View CA, US
Bassam Shamoun - Fremont CA, US
Manivannan Thothadri - Mountain View CA, US

Applied Materials, Inc. - Santa Clara CA

B23K 26/00
G01J 1/42
H04N 7/18

21912172, 356218, 348 94, 21912167

In-line metrology methods and systems for use with laser-scribing systems used in solar-cell fabrication are disclosed. Such methods and systems can involve a variety of components, for example, a device for measuring the amount of power input to a laser, a power meter for measuring laser output power, a beam viewer for measuring aspects of a laser beam, a height sensor for measuring a workpiece height, a microscope for measuring workpiece features formed by the laser-scribing system, and a system for monitoring a laser-scribing system and annunciating a warning(s) and/or an error message(s) when operational limits are exceeded. In-line metrology methods can also include the processing of output beam reflections so as to track beam drift over time and/or provide for focusing of an imaging device.

20110139755, Jun 16, 2011

Nov 3, 2010

12/939137

Antoine P. Manens - Sunnyvale CA, US
Manivannan Thothadri - Mountain View CA, US
Arthur Kenichi Yasuda - Belmont CA, US

Applied Materials, Inc. - Santa Clara CA

B23K 26/00

21912167

Multi-wavelength laser-scribing systems are disclosed. A system for scribing a workpiece includes a frame, a translation stage coupled with the frame to support the workpiece and translate the supported workpiece relative to the frame in a longitudinal direction, at least one laser operable to generate a first output having a first wavelength and generate a second output having a second wavelength, and at least one scanning device coupled with the frame and operable to control a position of the first and second outputs. Each of the first and second outputs are able to remove material from at least a portion of the workpiece. Laser assemblies that each include a laser and at least one scanning device can be arranged in rows to enhance the rate at which latitudinal scribe lines are formed.

20210066036, Mar 4, 2021

Oct 26, 2020

17/080802

- Santa Clara CA, US
Rutger MEYER TIMMERMAN THIJSSEN - Sunnyvale CA, US
Kartik RAMASWAMY - San Jose CA, US
Yang YANG - San Diego CA, US
Manivannan THOTHADRI - Mountain View CA, US
Chien-An CHEN - San Jose CA, US

H01J 37/305
H01J 37/32
H01J 37/073
G02B 6/13
H01J 37/147
H01L 21/3065
G02B 5/18

Aspects of the disclosure relate to apparatus for the fabrication of waveguides. In one example, an angled ion source is utilized to project ions toward a substrate to form a waveguide which includes angled gratings. In another example, an angled electron beam source is utilized to project electrons toward a substrate to form a waveguide which includes angled gratings. Further aspects of the disclosure provide for methods of forming angled gratings on waveguides utilizing an angled ion beam source and an angled electron beam source.

20200321186, Oct 8, 2020

Apr 2, 2019

16/373254

- Santa Clara CA, US
Yang YANG - San Diego CA, US
Kartik RAMASWAMY - San Jose CA, US
Manivannan THOTHADRI - Mountain View CA, US
Yue GUO - Redwood City CA, US

H01J 37/063
H01J 37/077
H01J 37/32

Embodiments described herein relate to apparatus and methods for performing electron beam reactive plasma etching. In one embodiment, an apparatus for performing EBRPE processes includes an electrode formed from a material having a high secondary electron emission coefficient. The electrode has an electron emitting surface disposed at a nonparallel angle relative to a major axis of a substrate assembly. The EBRPE apparatus may further comprise a capacitive or inductive coupled plasma generator. In another embodiment, methods for etching a substrate include generating a plasma and bombarding an electrode with ions from the plasma to cause the electrode to emit electrons. The electrons are accelerated toward a substrate to induce directional etching of the substrate. During the EBPRE process, the substrate or electrode is actuated through a process volume during the etching.

20200192027, Jun 18, 2020

Dec 17, 2019

16/716965

- Santa Clara CA, US
Yang YANG - San Diego CA, US
Manivannan THOTHADRI - Mountain View CA, US
Chien-An CHEN - San Jose CA, US
Ludovic GODET - Sunnyvale CA, US
Rutger MEYER TIMMERMAN THIJSSEN - Sunnyvale CA, US

G02B 6/13
H01J 37/305

Aspects of the disclosure relate to apparatus for the fabrication of waveguides. In one example, an angled ion source is utilized to project ions toward a substrate to form a waveguide which includes angled gratings. In another example, an angled electron beam source is utilized to project electrons toward a substrate to form a waveguide which includes angled gratings. Further aspects of the disclosure provide for methods of forming angled gratings on waveguides utilizing an angled ion beam source and an angled electron beam source.

20200194218, Jun 18, 2020

Dec 17, 2019

16/716954

- Santa Clara CA, US
Rutger Meyer Timmerman Thijssen - Sunnyvale CA, US
Kartik Ramaswamy - San Jose CA, US
Yang Yang - San Diego CA, US
Manivannan Thothadri - Mountain View CA, US
Chien-An Chen - San Jose CA, US

H01J 37/073
H01J 37/32
G02B 6/124
G02B 6/12

Aspects of the disclosure relate to apparatus for the fabrication of waveguides. In one example, an angled ion source is utilized to project ions toward a substrate to form a waveguide which includes angled gratings. In another example, an angled electron beam source is utilized to project electrons toward a substrate to form a waveguide which includes angled gratings. Further aspects of the disclosure provide for methods of forming angled gratings on waveguides utilizing an angled ion beam source and an angled electron beam source.

20190285981, Sep 19, 2019

Mar 19, 2018

15/924763

- Santa Clara CA, US
Manivannan THOTHADRI - Mountain View CA, US

G03F 7/00
B29C 33/38
B29C 33/40
B29C 43/02
B29C 43/38
G03F 7/30
G03F 7/20

Embodiments of the present disclosure generally relate to imprint lithography, and more particularly to methods and apparatus for creating a large area imprint without a seam. Methods disclosed herein generally include separating the curing time of the features in a stamp or product from the curing time of the seam and the periphery. The seam and periphery can be cured first or the seam and periphery can be cured last. Additionally, the seam curing operations can be performed on the master, on the stamp, or on the final product.

20190229246, Jul 25, 2019

Mar 29, 2019

16/369574

- Santa Clara CA, US
Manivannan THOTHADRI - Mountain View CA, US
Robert Jan VISSER - Menlo Park CA, US

H01L 33/58
H04N 13/307
H01L 27/15
H01L 25/065
G02B 27/22
G02B 17/00

The present disclosure generally relates to light field displays and methods of displaying images with light field arrays. In one example, the present disclosure relates to pixel arrangements for use in light field displays. Each pixel includes a plurality of LEDs, such as micro LEDs, positioned adjacent respective micro-lenses of each pixel.