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Kyle J Doyel

from Franklin, TN
Age ~68
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Also known as:
Kyle J Doxe, Kyle J Doyle, Kymberly Doyel, Oxel D Kyle
Phone and address:
1134 Beechs Tavern Trl, Franklin, TN 37069
(615) 595-0944
Related to:
Kimberly A Smith, 51Stephen T Harvey, 49Donald Smith, 54Kathryn P Hitchcock, 66Kenneth Harvey, 52Karen L Alexander, 67
Connected to:
Billy W Doyel, 75Craig S Doyel, 72Nancy G Doyel, 71Paige R Doyel, 64Alyssa A Doyen, 41Christopher B Doyen, 30Jean D Doyen, 43Jodi Doyen, 56Nathalie C Doyen, 46David E Doyer, 35

Kyle Doyel Phones & Addresses

  • 1134 Beechs Tavern Trl, Franklin, TN 37069 (615) 595-0944
  • 721 Shadowlawn Ct, Franklin, TN 37069
  • Nashville, TN
  • Brentwood, TN
  • Melbourne, FL
  • 1134 Beechs Tavern Trl, Franklin, TN 37069 (615) 347-5614

Work

Company: Kyzen corporation Apr 1990 Position: President and chief executive officer

Education

School / High School: Oregon State University 1974 to 1980 Specialities: Chemical Engineering, Business Administration

Skills

Process Engineering • Product Development • Manufacturing • New Business Development • Process Improvement • Lean Manufacturing • Strategic Planning • Engineering • Spc • Sales Management • Product Marketing • Marketing Strategy • Electronics • Team Building • Marketing

Industries

Chemicals

Resumes

Resumes

Kyle Doyel Photo 1

President And Chief Executive Officer

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Location:
Nashville, TN
Industry:
Chemicals
Work:
Kyzen Corporation
President and Chief Executive Officer
Education:
Oregon State University 1974 - 1980
Skills:
Process Engineering
Product Development
Manufacturing
New Business Development
Process Improvement
Lean Manufacturing
Strategic Planning
Engineering
Spc
Sales Management
Product Marketing
Marketing Strategy
Electronics
Team Building
Marketing

Business Records

Name / Title
Company / Classification
Phones & Addresses
Kyle Doyel
CEO
KYZEN Corporation
Chemicals
430 Harding Industrial Dr, Nashville, TN 37211
(615) 831-0888, (615) 831-0889, (800) 845-5524
Kyle J Doyel
President
KYZEN CORPORATION
Mfg Polish/Sanitation Goods Mfg Misc Industry Machinery
2565 Bent Pne St, Melbourne, FL 32935
430 Harding Industrial Dr, Nashville, TN 37211
(615) 831-0888
Kyle J. Doyel
Director
Advanced Resin Systems,Inc
430 Harding Industrial Dr, Nashville, TN 37211
1263 Rand Rd, Des Plaines, IL 60016

Publications

Us Patents

Low Ozone Depleting Brominated Compound Mixtures For Use In Solvent And Cleaning Applications

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US Patent:
6689734, Feb 10, 2004
Filed:
Jul 10, 2002
Appl. No.:
10/191280
Inventors:
Kyle J. Doyel - Franklin TN
Michael L. Bixenman - Old Hickory TN
Scotty S. Sengsavang - Murfreesboro TN
Arthur J. Thompson - Madison TN
Valerie G. Porter - Antioch TN
Patricia D. Overstreet - Murfreesboro TN
Kristie L. Gholson - Murfreesboro TN
Assignee:
Kyzen Corporation - Nashville TN
International Classification:
C11D 344
US Classification:
510410, 510177, 510365, 510407, 510411, 510412, 510505, 510506, 134 38, 134 40
Abstract:
Chemical solvating, degreasing, stripping and cleaning agents. The agents are cleaning and solvating mixtures of mono brominated compounds with highly fluorinated compounds and/or other agents that improve and enhance the properties of the original mixture. The addition of these agents to the composition will modify the physical and/or cleaning characteristics of the monobrominated compound and/or monobrominated compound-fluorinated compound mixture to accomplish is desired cleaning or solvating task. These other agents are one or more of the following materials: alcohols, esters, ethers, cyclic ethers, ketones, alkanes, terpenes, dibasic esters, glycol ethers, pyrollidones, or low or non ozone depleting chlorinated and chlorinated/fluorinated hydrocarbons. These mixtures are useful in a variety of solvating, vapor degreasing, photoresist stripping, adhesive removal, aerosol, cold cleaning, and solvent cleaning applications including defluxing, drycleaning, degreasing, particle removal, metal and textile cleaning.

Cleaning Compositions Containing Dichloroethylene And Six Carbon Alkoxy Substituted Perfluoro Compounds

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US Patent:
6699829, Mar 2, 2004
Filed:
Jun 7, 2002
Appl. No.:
10/164308
Inventors:
Kyle Doyel - Nashville TN
Michael Bixenman - Old Hickory TN
Assignee:
Kyzen Corporation - Nashville TN
International Classification:
C11D 344
US Classification:
510410, 510202, 510365, 510411, 510412
Abstract:
Chemical solvating, degreasing, stripping and cleaning agents. The agents are cleaning and solvating mixtures of dichloroethylene and alkoxy-substituted perfluoro compounds that contain six carbon atoms, with optionally highly fluorinated materials to retard flammability and/or other enhancement agents that improve and enhance the properties of the composition to accomplish its desired cleaning or solvating task. These other agents are one or more of the following materials: alcohols, esters, ethers, cyclic ethers, ketones, alkanes, aromatics, amines, siloxanes terpenes, dibasic esters, glycol ethers, pyrollidones, or low- or non-ozone depleting halogenated hydrocarbons. These mixtures are useful in a variety of solvating, vapor degreasing, photoresist stripping, adhesive removal, aerosol, cold cleaning, and solvent cleaning applications including defluxing, dry-cleaning, degreasing, particle removal, metal and textile cleaning.

Cleaning Compositions Containing Dichloroethylene And Six Carbon Alkoxy Substituted Perfluoro Compounds

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US Patent:
7288511, Oct 30, 2007
Filed:
Oct 29, 2003
Appl. No.:
10/694747
Inventors:
Kyle Doyel - Nashville TN, US
Michael Bixenman - Old Hickory TN, US
Assignee:
Kyzen Corporation - Nashville TN
International Classification:
C11D 7/50
US Classification:
510412, 510408, 510410, 510177, 510288
Abstract:
Chemical solvating, degreasing, stripping and cleaning agents. The agents are cleaning and solvating mixtures of dichloroethylene and alkoxy-substituted perfluoro compounds that contain six carbon atoms, with optionally highly fluorinated materials to retard flammability and/or other enhancement agents that improve and enhance the properties of the composition to accomplish its desired cleaning or solvating task. These other agents are one or more of the following materials: alcohols, esters, ethers, cyclic ethers, ketones, alkanes, aromatics, amines, siloxanes terpenes, dibasic esters, glycol ethers, pyrollidones, or low- or non-ozone depleting halogenated hydrocarbons. These mixtures are useful in a variety of solvating, vapor degreasing, photoresist stripping, adhesive removal, aerosol, cold cleaning, and solvent cleaning applications including defluxing, dry-cleaning, degreasing, particle removal, metal and textile cleaning.

Cleaning Agent For Removal Of Soldering Flux

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US Patent:
20120152286, Jun 21, 2012
Filed:
Dec 9, 2011
Appl. No.:
13/316063
Inventors:
Kyle J. Doyel - Franklin TN, US
Michael L. Bixenman - Old Hickory TN, US
David T. Lober - Franklin TN, US
Wayne Raney - White House TN, US
Kevin Soucy - Nashville TN, US
Assignee:
Kyzen Corporation - Nashville TN
International Classification:
B08B 3/00
C11D 7/60
C11D 3/60
US Classification:
134 26, 510175
Abstract:
A composition effective for removing solder fluxes either as a concentrated material or when diluted with water. The composition is effective in removing all types of solder fluxes including rosin type, resin type, no-clean, low residue, lead-free, organic acid and water soluble soldering fluxes. The composition comprises tripropylene glycol butyl ether and an alkali and has a pH of greater than 7.5. The composition may contain additional optional solvents and additives to enhance cleaning of articles or to impart other properties to the composition. The composition can be contacted with a surface to be cleaned in a number of ways and under a number of conditions depending on the manufacturing or processing variables present.

Cleaning Agent For Removal Of Soldering Flux

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US Patent:
20130165364, Jun 27, 2013
Filed:
Feb 22, 2013
Appl. No.:
13/774842
Inventors:
Kyle J. Doyel - Franklin TN, US
Michael L. Bixenman - Old Hickory TN, US
David T. Lober - Franklin TN, US
Wayne Raney - White House TN, US
Kevin Soucy - Nashville TN, US
International Classification:
C11D 3/20
C11D 3/30
US Classification:
510175
Abstract:
A composition effective for removing solder fluxes either as a concentrated material or when diluted with water. The composition is effective in removing all types of solder fluxes including rosin type, resin type, no-clean, low residue, lead-free, organic acid and water soluble soldering fluxes. The composition comprises tripropylene glycol butyl ether and an alkali and has a pH of greater than 7.5. The composition may contain additional optional solvents and additives to enhance cleaning of articles or to impart other properties to the composition. The composition can be contacted with a surface to be cleaned in a number of ways and under a number of conditions depending on the manufacturing or processing variables present.

Method And Apparatus For Continuous Separation Of Cleaning Solvent From Rinse Fluid In A Dual-Solvent Vapor Degreasing System

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US Patent:
20140048103, Feb 20, 2014
Filed:
Feb 22, 2013
Appl. No.:
13/773735
Inventors:
Kyle J. Doyel - Franklin TN, US
Michael L. Bixenman - Old Hickory TN, US
Ram Wissel - Franklin TN, US
Alan William McCready - Gilmanton NH, US
Robert Eugene Scheidegger - Bowling Green KY, US
Eddie Joe McChesney - Bowling Green KY, US
Kent Dwayne Tedder - Bowling Green KY, US
International Classification:
B08B 3/14
B08B 3/08
US Classification:
134 10, 134 951
Abstract:
A method for cleaning a precision component which includes the steps of immersing the component in a heated solvating agent disposed in a pre-clean module tank to thereby remove an adherent contaminant; treating the component with a rinsing solvent to remove any remaining contaminants and residual solvating agent in a separate rinse degreaser whereby contaminants removed from the component collect in the rinse degreaser; and removing contaminated solvent from the rinse degreaser to a micro-still to separate the contaminants from the rinse solvent and direct the purified rinse solvent to the rinse degreaser. An apparatus is also provided for cleaning contaminants from a precision component including a pre-clean module tank containing a heated solvating agent, a degreaser containing a rinsing solvent, and a micro-still which separates the contaminants from the rinsing solvent and directs the purified rinsing solvent to the rinse degreaser.

Cleaning Compositions And Methods For Cleaning Resin And Polymeric Materials Used In Manufacture

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US Patent:
60178620, Jan 25, 2000
Filed:
Sep 3, 1998
Appl. No.:
9/148019
Inventors:
Kyle J. Doyel - Nashville TN
Michael L. Bixenman - Nashville TN
Scotty S. Sengsavang - Nashville TN
Kristie L. Gholson - Nashville TN
Patricia D. Overstreet - Nashville TN
Arthur J. Thompson - Nashville TN
Valerie G. Porter - Nashville TN
Assignee:
Kyzen Corporation - Nashville TN
International Classification:
B08B 300
US Classification:
510163
Abstract:
Compositions and methods for cleaning, solvating, and/or removing plastic resins and polymers or other contaminants from manufactured articles or manufacturing equipment, particularly in the production of optical lenses. The compositions contain at least one nitrogen containing compound as well as other optional solvents and additives. The compositions can be contacted with a surface to be cleaned in a number of ways and under a number of conditions depending on the manufacturing or processing variables present.

Cleaning Compositions And Methods For Cleaning Resin And Polymeric Materials Used In Manufacture

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US Patent:
59623837, Oct 5, 1999
Filed:
Sep 3, 1998
Appl. No.:
9/148040
Inventors:
Kyle J. Doyel - Nashville TN
Michael L. Bixenman - Nashville TN
Scotty S. Sengsavang - Nashville TN
Kristie L. Gholson - Nashville TN
Patricia D. Overstreet - Nashville TN
Arthur J. Thompson - Nashville TN
Valerie G. Porter - Nashville TN
Assignee:
Kyzen Corporation - Nashville TN
International Classification:
C11D 726
C11D 728
US Classification:
510164
Abstract:
Compositions and methods for cleaning, solvating, and/or removing plastic resins and polymers or other contaminants from manufactured articles or manufacturing equipment, particularly in the production of optical lenses. The compositions contain at least one nitrogen containing compound as well as other optional solvents and additives. The compositions can be contacted with a surface to be cleaned in a number of ways and under a number of conditions depending on the manufacturing or processing variables present.
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Kyle J Doyel from Franklin, TN, age ~68 Get Report