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Justin Strike Phones & Addresses

  • Hanover, MN
  • Osseo, MN
  • Fargo, ND
  • Harris, MN
  • Chaska, MN
  • Minneapolis, MN
  • Wright, MN
  • 7513 Wedgewood Way, Osseo, MN 55311

Work

Position: Food Preparation and Serving Related Occupations

Education

Degree: Bachelor's degree or higher

Publications

Us Patents

Reticle Carrier Including Reticle Positioning And Location Means

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US Patent:
7139066, Nov 21, 2006
Filed:
Nov 30, 2004
Appl. No.:
10/999371
Inventors:
Brian Wiseman - Glencoe MN, US
Justin Strike - Maple Grove MN, US
Assignee:
Entegris, Inc. - Chaska MN
International Classification:
G03B 27/62
G03B 27/64
G03B 27/58
US Classification:
355 75, 355 76, 355 72
Abstract:
A carrier for a reticle used in photolithographic semiconductor processing, having a base portion and a cover portion. The base portion has a plurality of reticle supports and a plurality of reticle positioning members. The cover portion is adapted to sealingly mate with the base portion, and has an inner surface with a plurality of spaced apart reticle restraints and a pair of reticle positioning tabs projecting inwardly therefrom. Each reticle positioning tab has a diagonal edge portion, and is oriented so that the diagonal edge portion urges a reticle resting on the reticle supports into engagement with the reticle restraints when the cover portion is mated with the base portion.

Substrate Container With Pressure Equalization

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US Patent:
7528936, May 5, 2009
Filed:
Feb 26, 2006
Appl. No.:
11/364860
Inventors:
Barry Gregerson - Deephaven MN, US
David Halbmaier - Shorewood MN, US
Stephen Sumner - Minneapolis MN, US
Brian Wiseman - Glencoe MN, US
Anthony Mathius Tieben - Jordon MN, US
Justin Strike - Maple Grove MN, US
Assignee:
Entegris, Inc. - Chaska MN
International Classification:
G03B 27/58
US Classification:
355 72, 355 53, 355 75, 206710
Abstract:
The present invention is a pod for containing a particulate sensitive substrate and for providing pressure equalization between the exterior and an interior environment of the pod and for minimizing gaseous fluid flow inside adjacent to the particulate sensitive substrate. The pod comprises a primary pod, a diaphragm positioned in a cover, the diaphragm having a normal undeflected position, the diaphragm deflectable from the normal undeflected position. Preferably, the pod comprises a secondary pod disposed in the primary pod defining a second enclosure for containing the particulate sensitive substrate. The pod may comprise a filter attached to the pod and providing gaseous fluid communication between the exterior of the pod and the interior of the pod. The diaphragm is responsive to rapid pressure changes and the filter is responsive to slower pressure changes and allows the diaphragm to return to its normal undeflected position.

Reticle Pod With Isolation System

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US Patent:
7607543, Oct 27, 2009
Filed:
Feb 26, 2006
Appl. No.:
11/364562
Inventors:
Barry Gregerson - Deephaven MN, US
David Halbmaier - Shorewood MN, US
Stephen Sumner - Minneapolis MN, US
Brian Wiseman - Glencoe MN, US
Anthony Mathius Tieben - Jordon MN, US
Justin Strike - Maple Grove MN, US
Assignee:
Entegris, Inc. - Chaska MN
International Classification:
B65D 85/00
US Classification:
206710, 355 72, 355 75, 4142171
Abstract:
The present invention provides a reticle container that is equipped with a secondary container which houses the reticle and is housed in the primary container. The secondary container is held within the primary container with shock and vibration isolation members so that the secondary container has multiple degrees of freedom of motion within the primary container. The reticle is secured inside the secondary container such that shock and vibration transmission from the reticle container to the reticle is substantially attenuated.

Reticle Carrier

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US Patent:
20040004704, Jan 8, 2004
Filed:
Jul 5, 2002
Appl. No.:
10/190347
Inventors:
Brian Wiseman - Glencoe MN, US
Justin Strike - Maple Grove MN, US
Assignee:
Entegris, Inc.
International Classification:
G03B027/62
US Classification:
355/075000, 355/072000, 355/053000
Abstract:
A carrier for a reticle used in photolithographic semiconductor processing, having a base portion and a cover portion. The base portion has a plurality of reticle supports and a plurality of reticle positioning members. The cover portion is adapted to sealingly mate with the base portion, and has an inner surface with a plurality of spaced apart reticle restraints and a pair of reticle positioning tabs projecting inwardly therefrom. Each reticle positioning tab has a diagonal edge portion, and is oriented so that the diagonal edge portion urges a reticle resting on the reticle supports into engagement with the reticle restraints when the cover portion is mated with the base portion.

Trough Seal

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US Patent:
20180142787, May 24, 2018
Filed:
Nov 20, 2017
Appl. No.:
15/818737
Inventors:
- St. Paul MN, US
Brian Finander - Vadnais Heights MN, US
Luis Bruno - Zarcero, CR
Justin Strike - Hanover MN, US
International Classification:
F16J 15/02
A61M 25/06
A61N 1/05
Abstract:
A seal to permit the passage of a device through the seal. The seal includes an elastic component having a proximal end, a distal end, and an elongated trough adjacent the distal end. The elastic component has a slit that intersects the elongated trough.
Justin A Strike from Hanover, MN, age ~47 Get Report