US Patent:
20050183490, Aug 25, 2005
Inventors:
Anatoly Grayfer - Newton MA, US
Jurgen Lobert - Franklin MA, US
William Goodwin - Medway MA, US
Frank Belanger - Webster MA, US
John Sergi - Franklin MA, US
Mark Phelps - Attleboro MA, US
International Classification:
G01N011/00
Abstract:
The present invention relates to a system and method for sampling a gas flow to measure one or more contaminants within a semiconductor processing tool. The system includes a portable unit containing one or more dry traps, Tenax traps and, if desired, wet impingers. The unit is coupled to a gas flow in a clean room and the dry traps. Tenax traps and wet impingers measure contaminants contained in the gas supply for a determined sampling interval. When the sampling interval is done, the unit is sent to an analysis facility for processing.