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John J Amara

from Bristol, RI
Age ~72
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Also known as:
John A Amara, John J Baker, John A Mcclosey, John Jamara, John Jbaker
Phone and address:
120 Ferry Rd, Bristol, RI 02809
Related to:
Lawrence M Amara, 67
Connected to:
Cindy M Amara, 60Ellis Amara, 32Francis Amara, 35Frank J Amara, 75James Amara, 59Lansana P Amara, 46Nadia Amara, 59Rama Amara, 60Ramesh Amara, 56Simone Amara, 54

John Amara Phones & Addresses

  • 120 Ferry Rd, Bristol, RI 02809
  • Madison, CT
  • Westbrook, CT
  • 240 Baker St, Walpole, MA 02081 (508) 668-5811
  • Bryn Mawr, PA
  • Foxboro, MA
  • New Haven, CT
  • Hyde Park, MA
  • 249 Hope St APT 4, Bristol, RI 02809 (508) 668-5811

Work

Company: - Freetown, MA Position: Program officer

Education

School / High School: Voccational Instite- Freetown, KY 2013 Specialities: Bachelor of Sciece in Program Officer

Resumes

Resumes

John Amara Photo 1

Chief Executive Officer

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Location:
Madison, CT
Industry:
Non-Profit Organization Management
Work:
Social Evaluation Nigeria
Chief Executive Officer
Education:
Benue State University 2008 - 2012
Masters, Economics
Skills:
Microsoft Excel
Microsoft Office
Nonprofits
Microsoft Word
International Development
Strategic Planning
Program Evaluation
Research
Program Management
Qualitative Research
Program Development
Interests:
Social Development
Training and Poverty Reduction
John Amara Photo 2

Key Account Manager

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Location:
257 Ferris Ave, East Providence, RI 02916
Industry:
Industrial Automation
Work:
Heavy Construction Corporation - Norfolk County, Massachusetts since Jul 2012
Owner
John J. Amara & Sons, Inc. - Boston, Massacusetts Jul 2005 - Dec 2012
Project Superintendent
GE - New Haven, Connecticut Jul 2004 - Jun 2005
Account Manager
Tribune Broadcasting - Hartford, Connecticut Jul 2003 - Jun 2004
Account Executive
Education:
Bentley University 1999 - 2003
Skills:
New Business Development
Account Management
Contract Negotiation
Negotiation
Marketing
Project Planning
Construction Management
Project Estimation
Marketing Strategy
Business Development
Customer Service
Operations Management
Public Speaking
Sales Process
Key Account Development
National Accounts
Sales
Sales Management
Project Management
Leadership
Pricing Strategy
Sales Operations
Business To Business
Solution Selling
John Amara Photo 3

John Amara

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Location:
Bristol, RI
Industry:
Construction
John Amara Photo 4

John Amara Freetown, KY

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Work:
Program OfficerFreetown, MA
Education:
Voccational Instite
Freetown, KY
2013 to 2014
Bachelor of Sciece in Program Officer

Business Records

Name / Title
Company / Classification
Phones & Addresses
John J. Amara
President
J J L Equipment Corp
Excavation Contractor
97 Providence St, Boston, MA 02136
PO Box 366344, Boston, MA 02136
(617) 361-6224
John C. Amara
President
U.S. CLEANING SERVICE INC
29 New Bedford St, Newton, MA 02160
Hyde Park, MA 02136
John J. Amara
President
JOHN J. AMARA & SONS, INC
PO Box 366344, Hyde Park, MA 02136
240 Baker St, Walpole, MA
John J. Amara
President
J.J.L. EQUIPMENT CORP
PO Box 366344, Hyde Park, MA 02136
240 Baker St, Walpole, MA
John C. Amara
President
ENTERTAINMENT ENTERPRISES, INC
28 Howell St #1, Boston, MA 02125
819 E Broadway So, Boston, MA 02127
John Amara
President
INTEGRATED NETWORK COMMUNICATIONS, INC
29 New Bedford St, Hyde Park, MA 02136
29 Bedford St, Hyde Park, MA 02136
John J. Amara
Principal
Arc Realty Development LLC
Real Estate Agent/Manager
99 Providence St, Boston, MA 02136
John J. Amara
Manager
AMARA REALTY, LLC
97 Providence St, Hyde Park, MA 02136
240 Baker St, Walpole, MA 02081

Publications

Us Patents

Polymer Synthetic Technique

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US Patent:
8283423, Oct 9, 2012
Filed:
Sep 28, 2007
Appl. No.:
12/311378
Inventors:
Timothy M. Swager - Newton MA, US
John P. Amara - Charlestown MA, US
Assignee:
Massachusetts Institute of Technology - Cambridge MA
International Classification:
C08F 2/00
C08F 279/00
C08F 38/00
US Classification:
526 75, 526284, 526285, 525245, 5253261, 5253281, 5253593, 525417
Abstract:
The present invention generally relates to methods for the synthesis of species including monomers and polymers. Methods of the invention comprise the use of chemical techniques including metathesis chemistry to synthesize, for example, monomers and/or polymers with desired functional groups.

Emissive Polymers And Devices Incorporating These Polymers

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US Patent:
20070081921, Apr 12, 2007
Filed:
Sep 29, 2006
Appl. No.:
11/541028
Inventors:
Timothy Swager - Newton MA, US
John Amara - Charlestown MA, US
Assignee:
Massachusetts Institute of Technology - Cambridge MA
International Classification:
G01N 21/00
US Classification:
422082050
Abstract:
The present invention relates to a class of luminescent and conductive polymer compositions having chromophores, and particularly solid films of these compositions exhibiting increased luminescent lifetimes, quantum yields and amplified emissions. These desirable properties can be provided through polymers having rigid groups designed to prevent polymer reorganization, aggregation or π-stacking upon solidification. These polymers can also display an unusually high stability with respect to solvent and heat exposures. The invention also relates to a sensor and a method for sensing an analyte through the luminescent and conductive properties of these polymers. Analytes can be sensed by activation of a chromophore at a polymer surface. Analytes include aromatics such as heterocycles, phosphate ester groups and in particular explosives and chemical warfare agents in a gaseous state. The present invention also relates to devices and methods for amplifying emissions by incorporating a polymer having an energy migration pathway and/or providing the polymer as a block co-polymer or as a multi-layer.

Coating Compositions For Use With An Overcoated Photoresist

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US Patent:
20090148789, Jun 11, 2009
Filed:
Nov 12, 2008
Appl. No.:
12/291641
Inventors:
John P. Amara - Charlestown MA, US
Nicola Pugliano - Grafton MA, US
Jin Wuk Sung - Worcester MA, US
Michael K. Gallagher - Hopkinton MA, US
Michael S. Castorano - Leominster MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
G03F 7/20
G03F 7/004
US Classification:
4302701, 430326
Abstract:
In one aspect, the invention relates to silicon-containing organic coating compositions, particularly antireflective coating compositions, that contain a repeat unit wherein chromophore moieties such as phenyl are spaced from Si atom(s). In another aspect, silicon-containing underlayer compositions are provided that are formulated as a liquid (organic solvent) composition, where at least one solvent of the solvent component comprise hydroxy groups.

Coating Compositions Suitable For Use With An Overcoated Photoresist

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US Patent:
20100297556, Nov 25, 2010
Filed:
Feb 8, 2010
Appl. No.:
12/658614
Inventors:
James F. Cameron - Cambridge MA, US
Jin Wuk Sung - Northborough MA, US
John P. Amara - Reading MA, US
Gregory P. Prokopowicz - Worcester MA, US
David A. Valeri - Leominster MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
G03F 7/004
G03F 7/20
C08G 73/10
C07D 487/08
US Classification:
4302711, 430325, 528367, 548417
Abstract:
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

Coating Compositions Suitable For Use With An Overcoated Photoresist

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US Patent:
20100297557, Nov 25, 2010
Filed:
Feb 8, 2010
Appl. No.:
12/658615
Inventors:
James F. Cameron - Cambridge MA, US
Jin Wuk Sung - Northborough MA, US
John P. Amara - Reading MA, US
Greogory P. Prokopowicz - Worcester MA, US
David A. Valeri - Leominster MA, US
Libor Vyklicky - Yorktown Heights NY, US
Wenjie Li - Poughkeepsie NY, US
Pushkara R. Varanasi - Poughkeepsie NY, US
Irene Y. Popova - Beacon NY, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
G03F 7/004
C08G 73/10
US Classification:
4302711, 528322
Abstract:
Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.

Coating Compositions Suitable For Use With An Overcoated Photoresist

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US Patent:
20110003250, Jan 6, 2011
Filed:
Jun 10, 2010
Appl. No.:
12/813228
Inventors:
John P. Amara - Reading MA, US
James F. Cameron - Cambridge MA, US
Jin Wuk Sung - Northborough MA, US
Gregory P. Prokopowicz - Worcester MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
G03F 7/20
G03F 7/004
C07C 63/36
C08L 67/00
US Classification:
4302711, 562467, 524599, 430326
Abstract:
In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

Chromatography Media And Method

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US Patent:
20120029176, Feb 2, 2012
Filed:
Jul 27, 2011
Appl. No.:
13/191992
Inventors:
David Yavorsky - Bolton MA, US
John Amara - Reading MA, US
Joaquin Umana - Stoneham MA, US
William Cataldo - Bradford MA, US
Mikhail Kozlov - Lexington MA, US
Matthew Stone - Cambridge MA, US
Assignee:
MILLIPORE CORPORATION - Billerica MA
International Classification:
B01D 15/08
B01D 15/10
B01D 15/36
C07K 1/20
B01D 15/32
C07K 1/22
C07K 1/18
B01D 15/04
B01D 15/38
US Classification:
530413, 2105021, 2101982, 210656, 530416, 530417
Abstract:
Adsorptive media for chromatography, particularly ion-exchange chromatography, derived from a shaped fiber. In certain embodiments, the functionalized shaped fiber presents a fibrillated or ridged structure which greatly increases the surface area of the fibers when compared to ordinary fibers. Also disclosed herein is a method to add surface pendant functional groups that provides cation-exchange or anion-exchange functionality to the high surface area fibers. This pendant functionality is useful for the ion-exchange chromatographic purification of biomolecules, such as monoclonal antibodies (mAbs).

High Capacity Composite Depth Filter Media With Low Extractables

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US Patent:
20220387917, Dec 8, 2022
Filed:
Aug 16, 2022
Appl. No.:
17/819969
Inventors:
- Burlington MA, US
David Yavorsky - Bolton MA, US
John Amara - Reading MA, US
Nripen Singh - Acton MA, US
Kwok-Shun Cheng - Nashua NH, US
International Classification:
B01D 39/16
B01D 29/66
Abstract:
A depth filtration device for the clarification of biological fluids including a composite depth filter media having a nonwoven first layer integral with a second layer containing a polyacrylonitrile (PAN) fibers, a filter aid, and a wet-strength resin. The depth filter media exhibits increased binding capacity for soluble impurities such as DNA and host cell proteins from biological/cell culture feedstreams during secondary clarification and low-level impurity clearance of harvested cell culture fluids, such as those used for the manufacture of monoclonal antibodies. The depth filter media additionally exhibits significantly lower flushing requirements, resulting in lower levels of organic, inorganic and bioburden extractables released, high dirt holding capacities and good chemical and/or radiation resistance.
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John J Amara from Bristol, RI, age ~72 Get Report