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Joseph J Rosamilia

from Morristown, NJ
Age ~81
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Also known as:
Joe J Rosamilia
Phone and address:
34 Tall Timber Dr, Morristown, NJ 07960
(973) 267-1783
Related to:
Emma M ReadlingerAlicia Renee Abele, 56Scott J Readlinger, 46Scott Readlinger, 60Eileen C Rosamilia, 73Ralph E Rosamilia, 80Leslie E Readlinger, 45Ralph E Rosamilia, 73
Connected to:
Leah N Rosamilia, 56Sara L Rosamilia, 30Wesley Rosamilia, 97Alicia Rosamond, 37Rachel L Rosamond, 47John Rosamore, 58Dean A Rosan, 67Jonathan S Rosan, 57Beverly D Rosand, 79Donald R Rosander, 92

Joseph Rosamilia Phones & Addresses

  • 34 Tall Timber Dr, Morristown, NJ 07960 (973) 267-1783
  • East Hanover, NJ
  • 34 Tall Timber Dr, Morristown, NJ 07960

Resumes

Resumes

Joseph Rosamilia Photo 1

Partner, Goodman, O'malley, Rosamilia, Voorman & Fass, Llc

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Position:
Partner at Goodman, O'Malley, Rosamilia & Voorman, LLC
Location:
Greater New York City Area
Industry:
Accounting
Work:
Goodman, O'Malley, Rosamilia & Voorman, LLC since Nov 1986
Partner
Education:
Pace University - Lubin School of Business 1983 - 1987
Joseph Rosamilia Photo 2

Associate Director, Imbruvica Regulatory Program Manager

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Location:
1939 Pinta Ct, Toms River, NJ 08753
Industry:
Pharmaceuticals
Work:
The Janssen Pharmaceutical Companies of Johnson & Johnson
Associate Director, Imbruvica Regulatory Program Manager
Genentech Oct 2006 - Apr 2012
Senior Program Manager Regulatory Affairs
Lsi Corporation 2001 - Oct 2006
Project Manager
Nokia Bell Labs Aug 1985 - Sep 2001
Member of Technical Staff
Education:
Stanford University 2013 - 2015
University of Medicine and Dentistry of New Jersey 2008 - 2010
Seton Hall University 1979 - 1983
Masters, Chemistry Kean University 1975 - 1979
Skills:
Cross Functional Team Leadership
Project Management
Project Planning
Strategic Planning
Outsourcing
Management
Drug Development
Resource Management
Fda
Clinical Trials
Biotechnology
Regulatory Affairs
Product Development
Clinical Development
Pharmaceutical Industry
Validation
Regulatory Requirements
Strategy
Ms Project
Budgets
Forecasting
Analysis
Quality Assurance
Product Lifecycle Management
Joseph Rosamilia Photo 3

Joseph Rosamilia

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Joseph Rosamilia Photo 4

Joseph Rosamilia

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Joseph Rosamilia Photo 5

Owner, Jsd & Sons

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Location:
Greater New York City Area
Industry:
Management Consulting

Business Records

Name / Title
Company / Classification
Phones & Addresses
Joseph Rosamilia
Partner
Goodman, O'Malley, Rosamilia & Voorman LLC
Accounting/Auditing/Bookkeeping
188 State Rte 10, East Hanover, NJ 07936
(973) 599-0999
Joseph Rosamilia
Principal
Zephyr Investments LLC
Oil & Energy · Investor
60 Grandview Ave, Berkeley Heights, NJ 07922

Publications

Us Patents

Devices Involving The Photo Behavior Of Fullerenes

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US Patent:
51713730, Dec 15, 1992
Filed:
Jul 30, 1991
Appl. No.:
7/738005
Inventors:
Arthur F. Hebard - Bernardsville NJ
Barry Miller - Murray Hill NJ
Joseph M. Rosamilia - Berkeley Heights NJ
William L. Wilson - Somerville NJ
Assignee:
AT&T Bell Laboratories - Murray Hill NJ
International Classification:
H01L 31028
US Classification:
136252
Abstract:
It has been found that fullerenes exhibit photoelectronic behavior such as photoconductivity or photovoltaic properties. Such behavior allows the fabrication of a variety of devices, such as solar cells and the use of various light-induced processes, such as the generation of a current by illumination of appropriate fullerene interfaces.

Process For Making Metallized Structure And Article Comprising Structure

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US Patent:
49140817, Apr 3, 1990
Filed:
Jan 15, 1988
Appl. No.:
7/144832
Inventors:
Barry Miller - New Providence NJ
Joseph M. Rosamilia - Berkeley Heights NJ
Assignee:
American Telephone and Telegraph Company, AT&T Bell Laboratories - Murray Hill NJ
International Classification:
C25D 700
US Classification:
505 1
Abstract:
Processes are described for electroplating metal or alloy on superconducting oxides using either a nonaqueous bath or aqueous bath with suitably applied potential. Articles made in accordance with the electroplating process are also described.

Process And Apparatus For Semiconductor Device Fabrication

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US Patent:
54725160, Dec 5, 1995
Filed:
Apr 15, 1994
Appl. No.:
8/228336
Inventors:
Karrie J. Hanson - Westfield NJ
Gregg S. Higashi - Berkeley Heights NJ
Joseph M. Rosamilia - Berkeley Heights NJ
Assignee:
AT&T Corp. - Murray Hill NJ
International Classification:
B08B 704
US Classification:
134 18
Abstract:
A method and apparatus for cleaning substrates in a process for device fabrication is disclosed. An aqueous solution of hydrogen peroxide and ammonium hydroxide is used to clean the substrates. The concentration of hydrogen peroxide and ammonium hydroxide in the cleaning solution is maintained at a certain level. The life of the cleaning solution is extended by the process. By maintaining the concentrations of the hydrogen peroxide and ammonium hydroxide in the solution within a desired range, the process also provides a cleaning solution that effectively cleans the substates throughout the entire time the solution is used to clean the substrates. The apparatus monitors certain solution parameters such as the pH and the conductivity of the cleaning solution and adds hydrogen peroxide and/or ammonium hydroxide to the cleaning solution to maintain the parameters, and thus the concentration of hydrogen peroxide and ammonium hydroxide, at desired levels.

Method Of Making Devices Having Thin Dielectric Layers

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US Patent:
62944479, Sep 25, 2001
Filed:
Jul 12, 1999
Appl. No.:
9/351971
Inventors:
Thomas Boone - Whitehouse Station NJ
Joseph Mark Rosamilia - Berkeley Heights NJ
Assignee:
Agere Systems Guardian Corp. - Orlando FL
International Classification:
H01L 213205
US Classification:
438585
Abstract:
A method for making a thin dielectric layer is disclosed which is useful in fabricating semiconductor devices, particularly transistors and DRAM cell devices. The method comprises a two-steps, i. e. , (i) growing a base layer of dielectric material on a substrate having a thickness in excess of the desired thickness for the layer, and (ii) etching back the base layer to the desired thickness. With these two steps, a thin dielectric layer of less than 20. ANG. may be provided having substantial uniformity across its surface with a standard deviation in surface contours of less than 0. 7. ANG.

Apparatus For Continuously Controlling The Peroxide And Ammonia Concentration In A Bath

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US Patent:
55782736, Nov 26, 1996
Filed:
Aug 18, 1995
Appl. No.:
8/516712
Inventors:
Karrie J. Hanson - Westfield NJ
Gregg S. Higashi - Berkeley Heights NJ
Joseph M. Rosamilia - Berkeley Heights NJ
Assignee:
Lucent Technologies, Inc. - Murray Hill NJ
International Classification:
G05D 700
US Classification:
422110
Abstract:
A method and apparatus for cleaning substrates in a process for device fabrication is disclosed. An aqueous solution of hydrogen peroxide and ammonium hydroxide is used to clean the substrates. The concentration of hydrogen peroxide and ammonium hydroxide in the cleaning solution is maintained at a certain level. The life of the cleaning solution is extended by the process. By maintaining the concentrations of the hydrogen peroxide and ammonium hydroxide in the solution within a desired range, the process also provides a cleaning solution that effectively cleans the substates throughout the entire time the solution is used to clean the substrates. The apparatus monitors certain solution parameters such as the pH and the conductivity of the cleaning solution and adds hydrogen peroxide and/or ammonium hydroxide to the cleaning solution to maintain the parameters, and thus the concentration of hydrogen peroxide and ammonium hydroxide, at desired levels.
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Joseph J Rosamilia from Morristown, NJ, age ~81 Get Report