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Igor Abramson Phones & Addresses

  • Duvall, WA
  • 6521 Timberview Ct, San Jose, CA 95120
  • Cupertino, CA
  • 10195 Beardon Dr APT 2, Cupertino, CA 95014

Publications

Us Patents

Layered Waveguide Fabrication By Additive Manufacturing

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US Patent:
20220206232, Jun 30, 2022
Filed:
Dec 15, 2021
Appl. No.:
17/551543
Inventors:
- Menlo Park CA, US
Ankit VORA - Bothell WA, US
Igor ABRAMSON - Duvall WA, US
Nihar Ranjan MOHANTY - Snoqualmie WA, US
International Classification:
G02B 6/42
G02B 27/01
Abstract:
A multi-layer waveguide display includes a base waveguide layer, one or more grating couplers on one or two surfaces of the base waveguide layer, an overcoat layer on each grating coupler of the one or more grating couplers and filling grating grooves of the grating coupler, and a first waveguide layer stack on a first side of the base waveguide layer. The first waveguide layer stack includes one or more polymer layers. Each of the one or more polymer layers is characterized by a respective refractive index lower than the refractive index of the base waveguide layer. Each polymer layer is formed in a plurality of process cycles, where each process cycle includes dispensing a two-dimensional array of droplets of a resin material to form a thin layer and cross-linking the thin layer to form a sublayer of the polymer layer.

Formulations For Advanced Polishing Pads

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US Patent:
20200070302, Mar 5, 2020
Filed:
Aug 2, 2019
Appl. No.:
16/529884
Inventors:
- Santa Clara CA, US
Ankit VORA - Bothell WA, US
Boyi FU - San Jose CA, US
Venkat HARIHARAN - Lehi UT, US
Mayu YAMAMURA - San Mateo CA, US
Mario CORNEJO - San Jose CA, US
Igor ABRAMSON - Cupertino CA, US
Mo YANG - Sunnyvale CA, US
Daniel REDFIELD - Morgan Hill CA, US
Rajeev BAJAJ - Fremont CA, US
Nag B. PATIBANDLA - Pleasanton CA, US
International Classification:
B24B 37/24
C08F 283/00
B33Y 10/00
B33Y 70/00
B29C 64/112
Abstract:
Methods and formulations for manufacturing polishing articles used in polishing processes are provided. In one implementation, a UV curable resin precursor composition is provided. The UV curable resin precursor comprises a precursor formulation. The precursor formulation comprises a first resin precursor component that comprises a semi-crystalline radiation curable oligomeric material, wherein the semi-crystalline radiation curable oligomeric material is selected from a semi-crystalline aliphatic polyester urethane acrylate, a semi-crystalline aliphatic polycarbonate urethane acrylate, a semi-crystalline aliphatic polyether urethane acrylate, or combinations thereof. The precursor formulation further comprises a second resin precursor component that comprises a monofunctional or multifunctional acrylate monomer. The resin precursor formulation further comprises a photoinitiator, wherein the precursor formulation has a viscosity that enables the precursor formulation to be dispensed to form a portion of a polishing article by an additive manufacturing process.
Igor Abramson from Duvall, WA, age ~34 Get Report