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Hugo W K Chan

from Fremont, CA
Age ~73

Hugo Chan Phones & Addresses

  • 46850 Sentinel Dr, Fremont, CA 94539 (408) 807-3823
  • Rancho Palos Verdes, CA
  • San Jose, CA
  • Alameda, CA
  • Rch Palos Vrd, CA
  • 46850 Sentinel Dr, Fremont, CA 94539

Work

Company: Budget mobile Oct 2014 Position: Mobile sales associate

Education

School / High School: Los Angeles City College- Los Angeles, CA 2014 Specialities: Math

Professional Records

Medicine Doctors

Hugo Chan Photo 1

Hugo Y. Chan

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Specialties:
Obstetrics & Gynecology
Work:
Rideout Women & Children Clinic
1215 Plumas St STE 1200, Yuba City, CA 95991
(530) 671-6148 (phone), (530) 671-6432 (fax)
Education:
Medical School
Chung Shan Med And Dental Coll, Taiching, Taiwan
Graduated: 1972
Conditions:
Menopausal and Postmenopausal Disorders
Abnormal Vaginal Bleeding
Breast Disorders
Candidiasis of Vulva and Vagina
Conditions of Pregnancy and Delivery
Languages:
Chinese
English
Description:
Dr. Chan graduated from the Chung Shan Med And Dental Coll, Taiching, Taiwan in 1972. He works in Yuba City, CA and specializes in Obstetrics & Gynecology. Dr. Chan is affiliated with Fremont Medical Center and Rideout Regional Medical Center.
Hugo Chan Photo 2

Hugo Yuen-Charn Chan

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Specialties:
Obstetrics & Gynecology
Gynecology
Obstetrics
Education:
Chung Shan Medical University (1972)

Resumes

Resumes

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Vice President

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Location:
2975 Stender Way, Santa Clara, CA 95054
Industry:
Medical Devices
Work:
On Semiconductor
Vice President
Education:
University of California, Berkeley
Hugo Chan Photo 4

Vp, Implantable Medical Devices

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Location:
670 north Mccarthy Blvd, Milpitas, CA 95035
Industry:
Medical Devices
Work:
Ami
Vp, Implantable Medical Devices
Education:
University of California, Berkeley 1971 - 1977
Hugo Chan Photo 5

Vp, Imd

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Location:
Berkeley, CA
Industry:
Medical Devices
Work:
Nanoamp Solutions Feb 1998 - Oct 2006
Chief Executive Officer

On Semiconductor Feb 1998 - Oct 2006
Vp, Imd
Education:
University of California, Berkeley 1977
Doctorates, Doctor of Philosophy, Electronics Engineering, Philosophy
University of Illinois at Urbana - Champaign 1971
Bachelors, Electronics Engineering
University of California
Skills:
Semiconductors
Ic
Semiconductor Industry
Asic
Soc
Process Improvement
Implantable Medical Devices
Superconductors
Business Development and Management
Strategic Partnerships
Leadership
Electronics
Languages:
Mandarin
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Hugo Chan

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Hugo Chan Photo 7

Hugo Chan

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Location:
United States
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Hugo Perez Chan Compton, CA

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Work:
Budget Mobile

Oct 2014 to 2000
Mobile Sales Associate

Education:
Los Angeles City College
Los Angeles, CA
2014 to 2018
Math

Business Records

Name / Title
Company / Classification
Phones & Addresses
Hugo Chan
President
Nanoamp Solutions Inc
Semiconductor and Related Device Manufacturing
670 N Mccarthy Blvd, Milpitas, CA 95035
(408) 935-7777
Hugo Chan
Principal
Ami Semiconductor, Inc
Whol Electrical Equipment
3001 Stender Way, Santa Clara, CA 95054

Publications

Us Patents

Implant-Patterned Superconductive Device And A Method For Indirect Ion Implantation Of Superconductive Films

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US Patent:
6335108, Jan 1, 2002
Filed:
Sep 7, 2000
Appl. No.:
09/657203
Inventors:
John R. LaGraff - Niskayuna NY
James M. Murduck - Redondo Beach CA
Hugo W-K. Chan - Fremont CA
Assignee:
TRW Inc. - Redondo Beach CA
International Classification:
H01L 3924
US Classification:
428689, 505238, 505325, 428699, 428701, 428702, 428930
Abstract:
An implant patterned superconductive device and a method for indirect implant-patterning of oxide superconducting materials is provided. The method forms a device having an oxide superconducting layer on a substrate, deposits a passivation layer atop the oxide superconducting layer, and implants chemical impurities in a selected portion of the superconducting layer through the passivation layer. This modifies the conductivity of the selected portion of the oxide superconducting layer and electrically isolates the selected portion from the non-selected portion of the oxide superconducting layer. The passivation layer is made of a material less susceptible to implant damage than the oxide superconducting layer to allow inhibition of the oxide superconducting layer while protecting the crystalline structure of the top surface of the oxide superconducting layer and keeping it planarized. The passivation layer is preferably a dielectric material having a crystal lattice structure which is compatible to that of the oxide superconducting layer. The method is especially efficient for the fabrication of devices with multiple layers of oxide superconductive materials because it does not degrade the epitaxial templates crystalline structure.

Smart Memory

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US Patent:
20030005214, Jan 2, 2003
Filed:
Jul 2, 2001
Appl. No.:
09/898520
Inventors:
Hugo Chan - Fremont CA, US
International Classification:
G06F012/00
US Classification:
711/104000
Abstract:
A smart memory includes a memory array and one or more memory-intensive additional functions, all packaged in a standard memory package that has substantially the same fit and form as a standard integrated-circuit memory. One type of smart memory chip is a multi-media RAM (MMRAM) chip that provides on a single integrated-circuit chip a memory array and a compressor/decompressor (CODEC) section where connections between the memory array section and the CODEC section are on the single integrated-circuit die. The smart memory eliminates the need for additional special function integrated-circuit packages and significantly reduces the clock rate and the power consumption of a baseband chip in a personal communication device.

Planar In-Line Resistors For Superconductor Circuits

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US Patent:
59125039, Jun 15, 1999
Filed:
Jan 2, 1997
Appl. No.:
8/785031
Inventors:
Hugo W. Chan - Rancho Palos Verdes CA
Arnold H. Silver - Rancho Palos Verdes CA
Assignee:
TRW Inc. - Redondo Beach CA
International Classification:
H01L 3900
H01B 1200
B32B 1200
US Classification:
257663
Abstract:
A method of fabricating a low-inductance, in-line resistor includes the steps of: depositing a superconductive layer 12 on a base layer 14; patterning an interconnect region 16 on the superconductive layer 12; and converting the interconnect region 16 of the superconductive layer 12 to a resistor material region 18. The resistor region 18 and the superconductive layer 12 are substantially in the same plane. The method can further include the steps of depositing a conductive layer 22 on the resistor region 18 and on the photo-resist layer 20, and lifting off the photo-resist layer 20 to leave the conductive layer 22 on the resistor region 18. As such, the conductive layer 22 provides a low sheet resistivity for the resistor region 18. In another embodiment, the method includes the steps of: depositing in-situ a superconductive layer 12 on a base layer 14; depositing in-situ a conductive layer 22 on the superconductive layer 12 to form a bi-layer 24; patterning an interconnect region 16 on the bi-layer 24; and converting the interconnect region 16 of the bi-layer 24 to a resistor material region 18.

Monolithically-Integrated Semiconductor/Superconductor Infrared Detector And Readout Circuit

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US Patent:
53110200, May 10, 1994
Filed:
Nov 4, 1992
Appl. No.:
7/971502
Inventors:
Arnold H. Silver - Rancho Palos Verdes CA
Hugo W. Chan - Rancho Palos Verdes CA
Bruce J. Dalrymple - Redondo Beach CA
Szutsun S. Ou - Manhattan Beach CA
Eugene L. Dines - Lawndale CA
Susanne L. Thomasson - Redondo Beach CA
Assignee:
TRW Inc. - Redondo Beach CA
International Classification:
H01L 3922
H01L 3100
US Classification:
2503384
Abstract:
A monolithically-integrated semiconductor/ superconductor infrared detector and readout circuit providing sensitive, low-noise detection of infrared radiation for high-performance focal plane array applications. The infrared detector and readout circuit includes a semiconductor infrared detector and a semiconductor/superconductor transimpedance readout amplifier fabricated directly on the infrared detector using thin-film, integrated-circuit processing techniques. A superconducting analog-to-digital (A/D) converter digitizes the detector signals in the cryogenically cooled environment of the detector before coupling the signals to the much warmer and electromagnetically noisier environment of the back-end signal processing electronics, thus reducing noise contamination.

Method Of Making High-T.sub.c Ssns And Sns Josephson Junction

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US Patent:
60666005, May 23, 2000
Filed:
Jan 22, 1998
Appl. No.:
9/012090
Inventors:
Hugo W. Chan - Palos Verdes Estates CA
Assignee:
TRW Inc. - Redondo Beach CA
International Classification:
H01L 3924
US Classification:
505329
Abstract:
A high temperature superconductor junction and a method of forming the junction are disclosed. The junction 40 comprises a first high-T. sub. c superconductive layer (first base electrode layer) 46 on a substrate 42 and a dielectric layer 48 on the first high-T. sub. c superconductive layer. The dielectric layer and the first high-T. sub. c superconductive layer define a ramp edge 50. A trilayer SNS structure 52 is disposed on the ramp edge to form an SSNS junction. The SNS structure comprises a second high-T. sub. c superconductive layer (second base electrode layer) 54 directly on the first high-T. sub. c superconductive layer, a normal barrier layer 56 on the second high-T. sub. c superconductive layer, and a third high-T. sub. c superconductive layer 58 (counterelectrode) on the barrier layer. The ramp edge is typically formed by photoresist masking and ion-milling.

Using Ion Implantation To Create Normal Layers In Superconducting-Normal-Superconducting Josephson Junctions

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US Patent:
61889199, Feb 13, 2001
Filed:
May 19, 1999
Appl. No.:
9/314774
Inventors:
John R. LaGraff - Niskayuna NY
James M. Murduck - Redondo Beach CA
Hugo W-K. Chan - Fremont CA
Assignee:
TRW Inc. - Redondo Beach CA
International Classification:
H01L 2906
US Classification:
505190
Abstract:
A SNS Josephson junction (10) is provided for use in a superconducting integrated circuit. The SNS junction (10) includes a first high temperature superconducting (HTS) layer (14) deposited and patterned on a substrate (18), such that the first HTS layer (14) is selectively removed to expose a top surface of the substrate (18) as well as to form an angular side surface (22) on the first HTS layer (14) adjacent to the exposed top surface of the substrate (18). Ion implantation is used to form a junction region (12) having non-superconducting properties along the angular side surface (22) of the first HTS layer (14). A second HTS layer (16) is then deposited and patterned over at least a portion of the first HTS layer (14) and the exposed top surface of the substrate (18), thereby forming a SNS Josephson junction.

Multi-Layered Superconductive Interconnects

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US Patent:
55782264, Nov 26, 1996
Filed:
Jul 18, 1995
Appl. No.:
8/503682
Inventors:
Hugo W. Chan - Rancho Palos Verdes CA
Arnold H. Silver - Rancho Palos Verdes CA
Assignee:
TRW Inc. - Redondo Beach CA
International Classification:
B44C 122
US Classification:
216 33
Abstract:
A multi-layer superconductive interconnect structure includes a first multi-layer substrate with a first superconducting layer (SL) deposited on a first epitaxial substrate and a first glue dielectric layer (GDL) on the first SL. A second multi-layer substrate includes a second SL deposited on a second epitaxial substrate and a second GDL on said second SL. The first GDL and the second GDL are clamped and cured together to form a composite substrate.

Method Of Forming A High Performance Low Thermal Loss Bi-Temperature Superconductive Device

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US Patent:
57803145, Jul 14, 1998
Filed:
Jul 14, 1997
Appl. No.:
8/892467
Inventors:
Hugo Wai-Kung Chan - Rancho Palos Verdes CA
Assignee:
TRW Inc. - Redondo Beach CA
International Classification:
H01L 3924
US Classification:
438 2
Abstract:
A superconductive electrical device is operable simultaneously at relatively higher temperatures, i. e. , 60-90K, and at relatively lower temperatures, i. e. , less than 12K. The device comprises a non-superconductive substrate with two regions, a first relatively high temperature region and a second relatively low temperature region. A high temperature superconductor is on the first region and a portion of the second region. A dielectric layer is on the high temperature superconductor. A low temperature superconductor is on the second region of the substrate and on a portion of the dielectric layer. Integrated circuit chips can be secured to both superconductors, thereby yielding a superconductive multi-chip module operable at two different temperatures, such as in a cryo-cooler with two temperature stages.

Wikipedia References

Hugo Chan Photo 9

Hugo Chan

About:
Born:

Hong Kong

Work:
Position:

Chief executive

Education:
Specialty:

Director

Skills & Activities:
Master status:

Indigenous

Hugo Chan Photo 10

Hugo Chan

Hugo W K Chan from Fremont, CA, age ~73 Get Report