Inventors:
Charles Valverde - Ansonia CT, US
Nicolai Petrov - Hamden CT, US
Eric Yakobson - Aliso Viejo CA, US
Qingyun Chen - Branford CT, US
Vincent Paneccasio, Jr. - Madison CT, US
Richard Hurtubise - Clinton CT, US
Christian Witt - Woodbridge CT, US
Assignee:
Enthone, Inc. - West Haven CT
International Classification:
C23C 18/16
C23C 18/36
C23C 18/32
Abstract:
An electroless plating method and composition for depositing Co, Ni, or alloys thereof onto a metal-based substrate in manufacture of microelectronic devices, involving a source of deposition ions selected from the group consisting of Co ions and Ni ions, a reducing agent for reducing the depositions ions to metal onto the substrate, and a hydrazine-based leveling agent.