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Edmund Living Elce

from Castalia, OH
Age ~59
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Also known as:
Edmund Te Elce, Edmundo Elce, Edmond Elce
Phone and address:
5219 Rockwood Dr, Castalia, OH 44824
(216) 280-8195
Connected to:
Connie Elcess, 76Helena Elchaak, 100Ghassan K Elcheikhali, 69David J Elchert, 72Leonard J Elchert, 55Esmond Elcock, 41Keith L Elcock, 42Matt Elcock, 42Michael B Elcock, 44Michelle Elcock, 56

Edmund Elce Phones & Addresses

  • 5219 Rockwood Dr, Castalia, OH 44824 (216) 280-8195
  • 2226 Northland Ave, Lakewood, OH 44107 (216) 221-0763
  • 9489 Cherry Tree Dr, Strongsville, OH 44136 (440) 234-2757
  • 9489 Cherry Tree Dr #309, Strongsville, OH 44136 (440) 234-2757
  • 1251 Weathervane Ln, Akron, OH 44313 (330) 869-8736
  • 1251 Weathervane Ln #2A, Akron, OH 44313 (330) 869-8736

Work

Position: Development engineer and polymer chemist

Resumes

Resumes

Edmund Elce Photo 1

Development Engineer And Polymer Chemist

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Location:
Cleveland, OH
Work:

Development Engineer and Polymer Chemist

Business Records

Name / Title
Company / Classification
Phones & Addresses
Edmund Elce
Human Resources Manager
Promerus LLC
Chemicals · Commercial Physical Research · Other Electronic Parts Merchant Whols
9921 Brecksville Rd, Brecksville, OH 44141
(440) 922-0300, (440) 992-0300

Publications

Us Patents

Photosensitive Compositions Based On Polycyclic Polymers

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US Patent:
7022790, Apr 4, 2006
Filed:
Jun 19, 2003
Appl. No.:
10/465511
Inventors:
Edmund Elce - Strongsville OH, US
Takashi Hirano - Tokyo, JP
Larry F. Rhodes - Silver Lake OH, US
Brian L. Goodall - Ambler PA, US
SaiKumar Jayaraman - Chandler AZ, US
W. Chris McDougall - Midland MI, US
Shenliang Sun - Bethany CT, US
Assignee:
Sumitomo Bakelite Company, Ltd.
International Classification:
C08F 10/00
US Classification:
526281, 526283, 528403
Abstract:
A copolymer composition including a copolymer having repeat units of structural formula I: where X is selected from —CH—, —CH—CH— and O; m is an integer from 0 to 5; and each occurrence of R–Rare independently selected from H; Cto Clinear, branched, and cyclic alkyl, aryl, aralkyl, alkaryl, alkenyl and alkynyl that can include one or more hetero atoms selected from O, N, and Si; a group that contains an epoxy functionality; —(CH)C(O)OR; —(CH)C(O)OR; —(CH)OR; —(CH)OC(O)R; —(CH)C(O)R; —(CH)OC(O)OR; and any combination of two of R, R, R, and Rlinked together by a linking group. A portion of the repeat units having structural formula I contain at least one epoxy functional pendant group. The copolymer composition can be included with a material that photonically forms a catalyst in a photodefinable dielectric composition, which can be used to form a photodefinable layer on a substrate.

Directly Photodefinable Polymer Compositions And Methods Thereof

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US Patent:
7378456, May 27, 2008
Filed:
Jan 27, 2005
Appl. No.:
11/044484
Inventors:
Edmund Elce - Lakewood OH, US
Ramakrishna Ravikiran - Strongsville OH, US
Larry F. Rhodes - Silver Lake OH, US
Robert Shick - Strongsville OH, US
Saikumar Jayaraman - Chandler AZ, US
Assignee:
Promerus LLC - Brecksville OH
International Classification:
C08J 3/28
G03C 1/73
C08F 236/20
US Classification:
522153, 522154, 4302871, 25218224, 526279
Abstract:
The present invention relates to a directly photoimageable polymer composition (DPPC) and methods for its use in forming microelectronic and optoelectronic devices. Such DPPC encompasses a polymer having at least one norbornene-type repeat unit having a pendant silyl containing radical and at least one norbornene-type repeat unit having an acrylate containing radical.

Photosensitive Dielectric Resin Compositions, Films Formed Therefrom And Semiconductor And Display Devices Encompassing Such Films

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US Patent:
7524594, Apr 28, 2009
Filed:
Jul 1, 2005
Appl. No.:
11/171391
Inventors:
Dino Amoroso - Medina OH, US
Brian Bedwell - Brecksville OH, US
Andrew Bell - Lakewood OH, US
Edmund Elce - Lakewood OH, US
Rajesh Raja Puthenkovilakom - North Royalton OH, US
Ramakrishna Ravikiran - Strongsville OH, US
Robert Shick - Strongsville OH, US
Xiaoming Wu - Strongsville OH, US
Hiroaki Makabe - Tokyo, JP
Yasunori Takahashi - Tokyo, JP
Etsu Takeuchi - Tokyo, JP
Daoji Gan - Indianapolis IN, US
Seok Ho Kang - Marlborough MA, US
Assignee:
Promerus LLC - Brecksville OH
International Classification:
G03F 7/004
G03F 7/30
US Classification:
430 18, 430192, 430193, 4302701, 430326, 430905, 526282
Abstract:
Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.

Photosensitive Dielectric Resin Compositions, Films Formed Therefrom And Semiconductor And Display Devices Encompassing Such Films

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US Patent:
7858721, Dec 28, 2010
Filed:
Apr 27, 2009
Appl. No.:
12/387025
Inventors:
Dino Amoroso - Medina OH, US
Brian Bedwell - Brecksville OH, US
Andrew Bell - Lakewood OH, US
Edmund Elce - Lakewood OH, US
Rajesh Raja Puthenkovilakom - North Royalton OH, US
Ramakrishna Ravikiran - Strongsville OH, US
Robert Shick - Strongsville OH, US
Xiaoming Wu - Strongsville OH, US
Hiroaki Makabe - Tokyo, JP
Yasunori Takahashi - Tokyo, JP
Etsu Takeuchi - Tokyo, JP
Daoji Gan - Indianapolis IN, US
Seok Ho Kang - Marlborough MA, US
Assignee:
Promerus LLC - Brecksville OH
International Classification:
C08F 232/02
G03F 7/004
US Classification:
526281, 4302701, 430905
Abstract:
Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.

Photosensitive Compositions Based On Polycyclic Polymers For Low Stress, High Temperature Films

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US Patent:
8030425, Oct 4, 2011
Filed:
Dec 3, 2008
Appl. No.:
12/327611
Inventors:
Christopher Apanius - Moreland Hills OH, US
Matthew Apanius - Hudson OH, US
Edmund Elce - Lakewood OH, US
Hendra Ng - Highland Heights OH, US
Brian Knapp - Medina OH, US
Takashi Hirano - Tokyo, JP
Junya Kusunoki - Tokyo, JP
Robert Shick - Brecksville OH, US
Assignee:
Promerus LLC - Brecksville OH
International Classification:
C08F 10/00
C08F 36/00
C08G 59/00
US Classification:
526281, 526283, 528403
Abstract:
Vinyl addition polymer compositions, methods for forming such compositions, methods for using such compositions to form microelectronic and optoelectronic devices are provided. The vinyl addition polymer encompassed by such compositions has a polymer backbone having two or more distinct types of repeat units derived from norbornene-type monomers independently selected from monomers of Formula I:.

Directly Photodefinable Polymer Compositions And Methods Thereof

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US Patent:
8053515, Nov 8, 2011
Filed:
Dec 3, 2007
Appl. No.:
11/949328
Inventors:
Edmund Elce - Lakewood OH, US
Andrew Bell - Lakewood OH, US
Brian Knapp - Medina OH, US
Hendra Ng - Highland Heights OH, US
Larry F. Rhodes - Silver Lake OH, US
Robert Shick - Brecksville OH, US
Wei Zhang - Brecksville OH, US
William DiMenna - University Heights OH, US
Saikumar Jayaraman - Chandler AZ, US
Jianyong Jin - Clemson SC, US
Rajesh Raja Puthenkovilakom - Mentor OH, US
Ramakrishna Ravikiran - Vernon Hills IL, US
Xiaoming Wu - Strongsville OH, US
Etsu Takeuchi - Tokyo, JP
Assignee:
Promerus LLC - Brecksville OH
International Classification:
C08G 63/60
US Classification:
524599, 526258, 526259, 526262
Abstract:
A polymer includes a first type of repeat unit represented by Formula I:.

Photosensitive Compositions Based On Polycyclic Polymers

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US Patent:
8114948, Feb 14, 2012
Filed:
Jan 3, 2006
Appl. No.:
11/324738
Inventors:
Edmund Elce - Strongsville OH, US
Takashi Hirano - Tokyo, JP
Larry F. Rhodes - Silver Lake OH, US
Brian L. Goodall - Ambler PA, US
SaiKumar Jayaraman - Chandler AZ, US
W. Chris McDougall - Midland MI, US
Shenliang Sun - Bethany CT, US
Assignee:
Sumitomo Bakelite Company, Ltd. - Tokyo
International Classification:
C08F 10/00
C08F 36/00
C08G 59/00
US Classification:
526281, 526283, 528403
Abstract:
A copolymer composition including a copolymer having repeat units of structural formula I:.

Polynorbornene Pervaporation Membrane Films, Preparation And Use Thereof

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US Patent:
8215496, Jul 10, 2012
Filed:
Jan 27, 2009
Appl. No.:
12/360820
Inventors:
Brain Knapp - Medina OH, US
Edmund Elce - Lakewood OH, US
Brian Bedwell - Palo Alto CA, US
Leah J. Langsdorf - Akron OH, US
Ryan Wilks - Hudson OH, US
Assignee:
Promerus LLC - Brecksville OH
International Classification:
B01D 39/00
B01D 39/14
US Classification:
21050028, 21050023, 21050033
Abstract:
Embodiments in accordance with the present invention provide forming polynorbornenes useful for forming pervaporation membranes, the membranes themselves and methods of making such membranes.
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Edmund Living Elce from Castalia, OH, age ~59 Get Report