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Daryl L Nishida

from Portland, OR
Age ~68
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Also known as:
Daryl Lee Nishida, Darryl L Nishida
Related to:
Kyle J Nishida, 32Tomio T Nishida, 94Heidi L Nishida, 65Stephen I Nishida, 32Duane Z Nishida, 62Rachel H Nishida, 35Henry I KagawaDorothy Y Nishida, 92Lynn M Nishida, 62Luke LarsenLynn N Nishida, 64
Connected to:
Eiji E Nishida, 55Kathleen M Nishida, 61Masayo Nishida, 52Mitsuhiro Nishida, 84Yoshio Nishida, 57Yukio Nishida, 59Alysen L Nishiguchi, 38Mika Nishiguchi, 57Darice N Nishihara, 64Garett K Nishihara, 38

Daryl Nishida Phones & Addresses

  • Portland, OR
  • Aloha, OR
  • Clackamas, OR

Work

Company: Edwards Dec 2017 Position: Program manager

Education

Degree: Master of Business Administration, Masters School / High School: Portland State University 1988 to 1992

Skills

Semiconductors • Product Management • Cross Functional Team Leadership • Program Management • Debugging • Embedded Systems • Product Development • Electronics • Product Marketing • Strategic Planning • Asic • Ic • Manufacturing • Leadership • Firmware • Semiconductor Industry • Problem Solving • Leading Global Teams • Business Operational Planning • Cross Functional Collaborations • Microsoft Project • Microsoft Office

Industries

Electrical/Electronic Manufacturing

Resumes

Resumes

Daryl Nishida Photo 1

Program Manager

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Location:
San Francisco, CA
Industry:
Electrical/Electronic Manufacturing
Work:
Edwards
Program Manager
Intel Corporation Jan 2000 - Mar 2017
Program Manager
Intel Corporation Jan 1997 - Jan 2000
Quality Reliability Engineer
Merix Corporation Jan 1994 - Dec 1996
Commodity Specialist and and Board Assembly Manager
Tektronix Jan 1979 - Dec 1993
Process Engineer
Education:
Portland State University 1988 - 1992
Master of Business Administration, Masters University of Portland 1980 - 1988
Bachelors, Electrical Engineering
Skills:
Semiconductors
Product Management
Cross Functional Team Leadership
Program Management
Debugging
Embedded Systems
Product Development
Electronics
Product Marketing
Strategic Planning
Asic
Ic
Manufacturing
Leadership
Firmware
Semiconductor Industry
Problem Solving
Leading Global Teams
Business Operational Planning
Cross Functional Collaborations
Microsoft Project
Microsoft Office

Publications

Us Patents

Spacers For Use In An Electro-Optical Addressing Structure

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US Patent:
6356248, Mar 12, 2002
Filed:
Sep 12, 1994
Appl. No.:
08/304973
Inventors:
Paul C. Martin - Vancouver WA
Daryl L. Nishida - Aloha OR
Assignee:
Tektronix, Inc. - Beaverton OR
International Classification:
G09G 328
US Classification:
345 60, 345 87
Abstract:
A flat panel liquid crystal display ( ) has an addressing structure ( ) that uses an ionizable gaseous medium captured within channels ( ) in a first electrode structure ( ). An electro-optical material ( ) structure positioned between the first electrode structure and a second electrode structure ( ) has thickness that is determined by spacers ( , and ) that are formed on second electrode structure at points directly opposite support structures ( ) between the channels. Such spacers provide support for the second electrode structure and do not intrude into the active area ( ) of the display. The spacers are preferably formed of a polyimide resin layer using a photoetch process. Particulate spacers ( ) can also be entrained in a black surround material ( ) before it is applied to achieve spacers confined to inactive regions. Alternately, spacers ( ) can be formed of the black surround material using a two-step photoetching process.

Offset Electrodes

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US Patent:
53112040, May 10, 1994
Filed:
Aug 27, 1992
Appl. No.:
7/936957
Inventors:
Daryl L. Nishida - Aloha OR
Assignee:
Tektronix, Inc. - Wilsonville OR
International Classification:
G09G 328
US Classification:
345 60
Abstract:
Addressing apparatus that electronically address data sites of a digital array include electrodes (36, 38) manufactured with consistent electrical contact quality on the surfaces of projections (30) from a substrate (14). This is accomplished by providing such electrodes with portions that are offset to follow regions of more equal slope on the projections. The offset electrodes are of more consistent structural and electrical contact quality and thereby facilitate an increase in the yield of the manufacturing process.
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Daryl L Nishida from Portland, OR, age ~68 Get Report