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Clement T Anyadiegwu

from Norristown, PA
Age ~53
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Also known as:
Toks Anyadiegwu, Anyadiegwu Clement, Clement N, Clement U
Related to:
Maria Perez, 32Maria Suarez, 48Ramona Perez, 56Samuel Newton, 51Eileen Smith, 79
Connected to:
Chinelo Anyadiegwu, 75Mical O Anyah, 36Agnes Anyam, 55James A Anyan, 71Nana K Anyan, 65Nechole Anyan, 46Ngozi A Anyanacho, 56Veronica Anyango, 46Akere O Anyangwe, 52Anthonia N Anyanwu, 36

Clement Anyadiegwu Phones & Addresses

  • Norristown, PA
  • Bloomington, IN
  • 3806 Hunters Glen Dr, Plainsboro, NJ 08536
  • Parlin, NJ
  • 11 Senna Dr, Parlin, NJ 08859

Publications

Us Patents

Photoactive Compounds

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US Patent:
7833693, Nov 16, 2010
Filed:
Dec 10, 2008
Appl. No.:
12/331672
Inventors:
M. Dalil Rahman - Flemington NJ, US
Francis M. Houlihan - Millington NJ, US
Munirathna Padmanaban - Bridgewater NJ, US
SangHo Lee - Bridgewater NJ, US
Ralph R. Dammel - Flemington NJ, US
David Rentkiewicz - Roselle Park NJ, US
Clement Anyadiegwu - Parlin NJ, US
International Classification:
G03F 7/00
G03F 7/004
US Classification:
4302701, 430913, 549 14, 549 30, 549 43, 549 44, 549 62, 549 63
Abstract:
The present application relates to a compound of formula A-X—B, where (i) A-X—B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R—SO or (ii) A-X—B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi, Q, R, Ac, Bc, and Xc are defined herein. The compounds are useful as photoactive materials.

Composition For Coating Over A Photoresist Pattern Comprising A Lactam

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US Patent:
7923200, Apr 12, 2011
Filed:
Apr 9, 2007
Appl. No.:
11/697804
Inventors:
Muthiah Thiyagarajan - Bridgewater NJ, US
Ralph R. Dammel - Flemington NJ, US
Yi Cao - Bedminster NJ, US
SungEun Hong - Bedminster NJ, US
WenBing Kang - Kakegawa, JP
Clement Anyadiegwu - Parlin NJ, US
Assignee:
AZ Electronic Materials USA Corp. - Somerville NJ
International Classification:
G03F 7/40
US Classification:
430313, 430 14, 430330, 430331
Abstract:
The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1)The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.

Photoactive Compounds

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US Patent:
20070015084, Jan 18, 2007
Filed:
Feb 16, 2006
Appl. No.:
11/355762
Inventors:
M. Rahman - Flemington NJ, US
Francis Houlihan - Millington NJ, US
Munirathna Padmanaban - Bridgewater NJ, US
SangHo Lee - Bridgewater NJ, US
Ralph Dammel - Flemington NJ, US
David Rentkiewicz - Roselle Park NJ, US
Clement Anyadiegwu - Parlin NJ, US
International Classification:
G03C 1/00
US Classification:
430270100
Abstract:
The present application relates to a compound of formula A-X-B, where (i) A-X-B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R—SO or (ii) A-X-B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi, Q, R, Ac, Bc, and Xc are defined herein. The compounds are useful as photoactive materials.

Antireflective Coating Composition Comprising Fused Aromatic Rings

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US Patent:
20100119979, May 13, 2010
Filed:
Nov 13, 2008
Appl. No.:
12/270189
Inventors:
M. Dalil Rahman - Flemington NJ, US
Douglas McKenzie - Easton PA, US
Clement Anyadiegwu - Parlin NJ, US
International Classification:
C08G 65/40
C08L 71/10
G03F 7/20
US Classification:
430313, 528218, 525534, 430319, 427595
Abstract:
The present invention relates to an organic spin coatable antireflective coating composition comprising with (i) at least one unit with fused aromatic rings in the backbone of the polymer of structure (1), (ii) at least one aromatic unit ring in the backbone of the polymer of structure (2) where the aromatic ring has a pendant alkylene(fusedaromatic) group and a pendant hydroxy group, and, (iii) at least one unit with an aliphatic moiety in the backbone of the polymer of structure (3).where, Fris a substituted or unsubstituted fused aromatic ring moiety with 3 or more fused aromatic rings, Fris a fused aromatic ring moiety with 2 or more fused aromatic rings, Ar is a substituted or unsubstituted aromatic ring moiety, R′ and R″ are independently selected from hydrogen and C-Calkyl, y=1-4, and B is a substituted or unsubstituted aliphatic moiety, and Ris selected from hydrogen or aromatic moiety. The invention further relates to a process for imaging the present composition.

Antireflective Coating Compositions

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US Patent:
20100151392, Jun 17, 2010
Filed:
Dec 11, 2008
Appl. No.:
12/332501
Inventors:
M. Dalil Rahman - Flemington NJ, US
Yi Yi - Somerville NJ, US
Douglas McKenzie - Easton PA, US
Clement Anyadiegwu - Parlin NJ, US
Ping-Hung Lu - Bridgewater NJ, US
International Classification:
G03F 7/20
C08L 83/06
US Classification:
430313, 525474, 430311
Abstract:
The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer, a linking component, a crosslinker, and an acid generator. The invention further relates to a process for imaging the present composition.

Composition For Coating Over A Photoresist Pattern Comprising A Lactam

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US Patent:
20120219919, Aug 30, 2012
Filed:
Feb 24, 2011
Appl. No.:
13/033912
Inventors:
Muthiah Thiyagarajan - Bridgewater NJ, US
Ralph R. Dammel - Flemington NJ, US
Yi Cao - Bedminster NJ, US
SungEun Hong - Bedminster NJ, US
WenBing Kang - Kakegawa, JP
Clement Anyadiegwu - Parlin NJ, US
International Classification:
G03F 7/26
US Classification:
430331
Abstract:
The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure ()where Ris independently selected hydrogen, C-Calkyl, C-Calkyl alcohol, hydroxy (OH), amine (NH), carboxylic acid, and amide (CONH), represents the attachment to the polymer, m=1-6, and n=1-4.The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.

Antireflective Coating Composition And Process Thereof

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US Patent:
20120251956, Oct 4, 2012
Filed:
Jan 17, 2012
Appl. No.:
13/351681
Inventors:
M. Dalil RAHMAN - Flemington NJ, US
Douglas MCKENZIE - Easton PA, US
Jianhui SHAN - Pennington NJ, US
JoonYeon CHO - Bridgewater NJ, US
Salem K. MULLEN - Florham Park NJ, US
Clement ANYADIEGWU - Parlin NJ, US
Assignee:
AZ ELECTRONIC MATERIALS USA CORP. - SOMERVILLE NJ
International Classification:
G03F 7/20
C09D 171/10
US Classification:
430311, 524611, 524540
Abstract:
The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1):where A is a fused aromatic ring, B has a structure (2), and C is a hydroxybiphenyl of structure (3)where Ris C-Calkyl and Ris C-Calkyl.The invention further relates to a process for forming an image using the composition.

Antireflective Coating Composition And Process Thereof

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US Patent:
20140038109, Feb 6, 2014
Filed:
Aug 1, 2012
Appl. No.:
13/563877
Inventors:
M. Dalil RAHMAN - Flemington NJ, US
Clement ANYADIEGWU - Parlin NJ, US
Douglas MCKENZIE - Easton PA, US
JoonYeon CHO - Bridgewater NJ, US
Assignee:
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. - Somerville NJ
International Classification:
C09D 165/02
G03F 7/20
US Classification:
430319, 524611
Abstract:
The invention relates to an antireflective coating composition comprising a crosslinkable polymer, where the crosslinkable polymer comprises at least one unit of fused aromatic moiety, at least one unit with a phenylene moiety in the backbone of the polymer, and at least one hydroxybiphenyl unit, furthermore where the polymer comprises a crosslinking moiety of structure (4),where R, R″and R′″are independently hydrogen or a C-Calkyl. The invention further relates to a process for forming an image using the composition.
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Clement T Anyadiegwu from Norristown, PA, age ~53 Get Report