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Charles Raymond Szmanda

from Westborough, MA
Age ~74
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Also known as:
Charles R Szmanda, Charles M Szmanda, Charles Samanda
Phone and address:
4 Crossman Ave, Westboro, MA 01581
(508) 836-4143
Related to:
Benjamin P Szmanda, 49
Connected to:
Rachel H Szmed, 60Marzena B Szmelter, 66Benjamin D Szmidt, 35Kenneth J Szmigiel, 60Isaac Y Szmuilowicz, 68Sam Szmulewicz, 76Sarah R Szmuller, 70Glenn P Szmurlo, 65Melisa Y Szmurlo, 44Paulette L Szmurlo, 72

Charles Szmanda Phones & Addresses

  • 4 Crossman Ave, Westborough, MA 01581 (508) 836-4143
  • Saint Louis, MO
  • Newton, MA
  • Hopkinton, MA
  • 4 Crossman Ave, Westborough, MA 01581 (508) 341-7589

Work

Company: The dow chemical company Apr 1, 1989 to Jul 1, 2009 Position: Research fellow

Education

Degree: Doctorates, Doctor of Philosophy School / High School: University of Wisconsin - Madison 1973 to 1979 Specialities: Chemistry

Skills

Electronics • Data Analysis • Physical Chemistry • Computing • Physical Organic Chemistry • Valuation • Nanotechnology • Chemistry • Patents • Polymers • Semiconductors • R&D • Characterization • Materials Science • Physics • Design of Experiments • Organic Chemistry • Process Simulation • Photolithography • Product Development • Technology Transfer • Spectroscopy • Electrochemistry • Surface Chemistry • Manufacturing • Materials • Uv/Vis • Analytical Chemistry • Nmr • Nanomaterials • Polymer Chemistry • Lithography • Thin Films • Commercialization • Polymer Science • Formulation • Scanning Electron Microscopy • Coatings • Chemical Engineering • Catalysis • Chromatography • Gas Chromatography • Tga • Mems • Optics • Organic Synthesis • Photovoltaics • Patent Prosecution • Intellectual Property • Prosecution

Ranks

Certificate: License 48,618

Interests

Civil Rights and Social Action • Politics • Education • Environment • Poverty Alleviation • Science and Technology

Emails

c***[email protected]

Industries

Legal Services

Resumes

Resumes

Charles Szmanda Photo 1

Principal

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Location:
Antigo, WI
Industry:
Legal Services
Work:
The Dow Chemical Company Apr 1, 1989 - Jul 1, 2009
Research Fellow
The Patent Practice of Szmanda & Shelnut Apr 1, 1989 - Jul 1, 2009
Principal
Rohm and Haas Electronic Materials Jan 2000 - Apr 2009
Research Fellow
Patent Practice 2001 - 2009
Patent Agent
Shipley 1989 - 1997
Senior Fellow
Education:
University of Wisconsin - Madison 1973 - 1979
Doctorates, Doctor of Philosophy, Chemistry University of Wisconsin - Stevens Point 1973
Loyola University Chicago 1971 - 1973
Bachelors, Bachelor of Science, Mathematics, Chemistry Antigo High School 1965 - 1969
University of Wisconsin - Stevens Point
Skills:
Electronics
Data Analysis
Physical Chemistry
Computing
Physical Organic Chemistry
Valuation
Nanotechnology
Chemistry
Patents
Polymers
Semiconductors
R&D
Characterization
Materials Science
Physics
Design of Experiments
Organic Chemistry
Process Simulation
Photolithography
Product Development
Technology Transfer
Spectroscopy
Electrochemistry
Surface Chemistry
Manufacturing
Materials
Uv/Vis
Analytical Chemistry
Nmr
Nanomaterials
Polymer Chemistry
Lithography
Thin Films
Commercialization
Polymer Science
Formulation
Scanning Electron Microscopy
Coatings
Chemical Engineering
Catalysis
Chromatography
Gas Chromatography
Tga
Mems
Optics
Organic Synthesis
Photovoltaics
Patent Prosecution
Intellectual Property
Prosecution
Interests:
Civil Rights and Social Action
Politics
Education
Environment
Poverty Alleviation
Science and Technology
Certifications:
License 48,618
License 11,271

Publications

Us Patents

Polymer And Photoresist Compositions

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US Patent:
6406828, Jun 18, 2002
Filed:
Feb 24, 2000
Appl. No.:
09/511726
Inventors:
Charles R. Szmanda - Westborough MA
George G. Barclay - Jefferson MA
Peter Trefonas, III - Medway MA
Wang Yueh - Shrewsbury MA
Assignee:
Shipley Company, L.L.C. - Marlborough MA
International Classification:
G03F 7004
US Classification:
4302701, 526262, 526264, 526266, 526281, 526288, 526171, 526229, 5263297
Abstract:
Disclosed are polymers including as polymerized units one or more spirocyclic olefin monomer of the formulae I or Ia wherein A=CH ; G=C(Zâ), O, and NR ; R =H, (C -C )alkyl or substituted (C -C )alkyl; E and W are independently selected from C(Zâ), O and a chemical bond; Zâ=O; n=1; m=1; mâ=0; 1=0 to 5; and p=0 to 5; provided that when both E and W are C(Zâ), G is NR ; wherein T and L are taken together to form a double bond. These polymers are useful in photoresist compositions. Methods of making and using these polymers are also disclosed.

Polymer And Photoresist Compositions

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US Patent:
6599677, Jul 29, 2003
Filed:
Apr 20, 2002
Appl. No.:
10/126904
Inventors:
Charles R. Szmanda - Westborough MA
George G. Barclay - Jefferson MA
Peter Trefonas, III - Medway MA
Wang Yueh - Shrewsbury MA
Assignee:
Shipley Company, L.L.C. - Marlborough MA
International Classification:
G03F 7004
US Classification:
4302701, 526262, 526264, 526266, 526281, 526288, 526171, 526229, 5263297
Abstract:
Disclosed are spirocyclic olefin ploymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.

Polymers And Photoresist Compositions

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US Patent:
6749983, Jun 15, 2004
Filed:
Jun 11, 1999
Appl. No.:
09/330418
Inventors:
Gary N. Taylor - Marlborough MA
Charles R. Szmanda - Westborough MA
Assignee:
Shipley Company, L.L.C. - Marlborough MA
International Classification:
G03C 173
US Classification:
4302701, 430326, 430910, 430914, 4302711, 4302721, 430311
Abstract:
The present invention provides novel polymers and chemically-amplified positive-acting photoresist compositions that contain such polymers as a resin binder component. Preferred polymers of the invention include one or more structural groups that are capable of reducing the temperature required for effective deprotection of acid-labile moieties of the polymer.

Polymers And Photoresist Compositions For Short Wavelength Imaging

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US Patent:
6749986, Jun 15, 2004
Filed:
Sep 8, 2001
Appl. No.:
09/948459
Inventors:
Gary N. Taylor - Northboro MA
Charles R. Szmanda - Westborough MA
Assignee:
Shipley Company, L.L.C. - Marlborough MA
International Classification:
G03F 7004
US Classification:
4302701, 430326, 430906, 430907
Abstract:
The present invention includes new polymers and use of such polymers as a resin component for photoresist compositions, particularly chemically-amplified positive-acting photoresist compositions. Polymers and resists of the invention are particularly useful for imaging with short wavelength radiation, such as sub-200 nm and preferably about 157 nm. Polymers of the invention contain one or more groups alpha to an acidic site that are substituted by one or more electron-withdrawing groups.

Solvents And Photoresist Compositions For Short Wavelength Imaging

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US Patent:
6787286, Sep 7, 2004
Filed:
Mar 19, 2002
Appl. No.:
10/101202
Inventors:
Charles R. Szmanda - Westborough MA
Anthony Zampini - Westborough MA
Assignee:
Shipley Company, L.L.C. - Marlborough MA
International Classification:
G03F 7039
US Classification:
4302701, 4302711, 430311, 430326, 430912
Abstract:
New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as 157 nm. Resists of the invention comprise a fluorine-containing polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can maintain the resist components in solution and include one or more preferably two or more (i. e. blends) of solvents. In particularly preferred solvent blends of the invention, each blend member evaporates at substantially equal rates, whereby the resist composition maintains a substantially constant concentration of each blend member.

Photoresist Composition

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US Patent:
6855475, Feb 15, 2005
Filed:
Mar 19, 2002
Appl. No.:
10/101103
Inventors:
Charles R. Szmanda - Westborough MA, US
Assignee:
Shipley Company, L.L.C. - Marlborough MA
International Classification:
G03F007/004
US Classification:
4302701, 430326, 430905, 430907
Abstract:
Disclosed are photoresist compositions suitable for imaging with sub 200 nm wavelength radiation including as polymerized units one or more monomers having an electronegative substituent and an ester group containing certain leaving groups. Also disclosed are methods of providing photoresist relief images using the photoresist compositions.

Photoresist Compositions For Short Wavelength Imaging

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US Patent:
6858379, Feb 22, 2005
Filed:
Mar 20, 2002
Appl. No.:
10/101768
Inventors:
Anthony Zampini - Westborough MA, US
Charles R. Szmanda - Westborough MA, US
Gary N. Taylor - Northboro MA, US
James F. Cameron - Cambridge MA, US
Gerhard Pohlers - Newton MA, US
Assignee:
Shipley Company, L.L.C. - Marlborough MA
International Classification:
G03C005/00
US Classification:
430325, 4302701, 430326, 430907
Abstract:
New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm such as 157 nm. In one aspect, resists of the invention comprise a fluorine-containing polymer, a photoactive component, and one or more additional components of an amine or other basic composition, a dissolution inhibitor compound, a surfactant or leveling agent, or a plasticizer material. In another aspect, resists of the invention contain a fluorine-containing resin and one or more photoacid generator compounds, particularly non-aromatic onium salts and imidosulfonates, and other non-ionic photoacid generator compounds.

Method And System For Recycling Materials

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US Patent:
6907432, Jun 14, 2005
Filed:
Nov 28, 2000
Appl. No.:
09/723746
Inventors:
Charles R. Szmanda - Westborough MA, US
Peter Trefonas, III - Medway MA, US
Richard C. Hemond - Acton MA, US
Mark S. Thirsk - Mendon MA, US
Leo L. Linehan - Grafton MA, US
Anthony Zampini - Westborough MA, US
Assignee:
Shipley Company, L.L.C. - Marlborough MA
International Classification:
G06F017/30
US Classification:
7071041, 707 10, 705 1
Abstract:
A system and method is provided for recycling raw materials from a plurality waste streams generated by waste stream providers and includes a waste stream monitoring module for monitoring the plurality of waste streams and determining an amount of reusable raw materials contained in each of the plurality of waste streams. Also included is a reusable materials database for storing the amount of each of the raw materials contained in any of the plurality of waste streams. A user operating an access device communications with the reusable materials database for viewing the amount of each of said raw materials.
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Charles Raymond Szmanda from Westborough, MA, age ~74 Get Report