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Carlos G Barros

from Batavia, IL
Age ~50
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Also known as:
Carlos G Ballos
Related to:
Mereida BarrosJoshua Engel, 31Rosemary Ramirez, 63Jose D Perez, 54Maria G Perez, 54
Connected to:
Alvin F Barros, 67Amaury Barros, 55Catalina I Barros, 61Cesarino D Barros, 40Danielson M Barros, 58Debora J Barros, 67Dianna M Barros, 54Domingos G Barros, 54Donald L Barros, 75Elizabeth M Barros, 45

Carlos Barros Phones & Addresses

  • Batavia, IL
  • Lombard, IL
  • 1121 Natalie Dr, West Chicago, IL 60185 (708) 337-0058
  • Naperville, IL
  • Addison, IL
  • Bensenville, IL
  • Downers Grove, IL
  • River Grove, IL
  • Chicago, IL

Specialities

Labour Law

Professional Records

Lawyers & Attorneys

Carlos Barros Photo 1

Carlos Barros - Lawyer

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Specialties:
Labour Law
ISLN:
915860089
Admitted:
2000

Resumes

Resumes

Carlos Barros Photo 2

Fifa Confederations Cup Volunteer

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Location:
Rio de Janeiro, Rio de Janeiro, Brazil
Industry:
Events Services
Work:
PepsiCo FoodService - Valhalla, NY Nov 2009 - Dec 2012
Lab Technician
Boehringer Ingelheim Pharmaceuticals - Danbury, CT Jul 2009 - Oct 2009
Clinical Manufacturing Technician
Procter & Gamble/Duracell - Bethel, CT Aug 2008 - Apr 2009
Lab Technician
Boehringer Ingelheim Pharmaceuticals Jan 2003 - Dec 2006
Dispensary Lab Technician
Nestle USA Jan 2001 - May 2002
Applications Lab Technician
Education:
Western Connecticut State University 2002 - 2004
Norwalk Community College 2004 - 2007
Associate's degree, Marketing
Skills:
GMP
Sop
R&D
Laboratory
Troubleshooting
Quality System
Data Analysis
Microsoft Office
Interests:
Sporting and Entertainment Events
Languages:
Portuguese
English
Spanish
Carlos Barros Photo 3

Optics Process Engineer At Cabot Microelectronics

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Position:
Optics Process Engineer at Cabot Microelectronics
Location:
Greater Chicago Area
Industry:
Semiconductors
Work:
Cabot Microelectronics since Jun 2007
Optics Process Engineer
Rubicon Technologies Nov 2002 - Feb 2007
Polishing Production Manager
Education:
Universidad Politécnica Salesiana
Interests:
Basketball, traveling, Six Sigma, dancing
Carlos Barros Photo 4

Carlos Barros

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Location:
United States
Carlos Barros Photo 5

Carlos Barros

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Location:
Cabo Verde
Carlos Barros Photo 6

Professional

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Location:
United States
Carlos Barros Photo 7

Carlos Barros

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Location:
United States
Carlos Barros Photo 8

Carlos Barros

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Location:
United States
Carlos Barros Photo 9

Carlos Barros

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Location:
United States

Publications

Isbn (Books And Publications)

History Under Debate: International Reflection On The Discipline

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Author

Carlos Barros

ISBN #

0789026872

History Under Debate: International Reflection On The Discipline

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Author

Carlos Barros

ISBN #

0789026880

Mentalidad Justiciera De Los Irmandinos, Siglo XV

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Author

Carlos Barros

ISBN #

8432306789

Dende Galicia, Marx: Homenaxe a Marx No 1.O Centenario Da Sua Morte

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Author

Carlos Barros

ISBN #

8474922410

A Mentalidade Xusticieira Dos Irmandinos

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Author

Carlos Barros

ISBN #

8475073131

Xudeus E Conversos Na Historia: Actas Do Congreso Internacional, Ribadavia, 14-17 De Outubro De 1991

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Author

Carlos Barros

ISBN #

8488908008

Xudeus E Conversos Na Historia: Actas Do Congreso Internacional, Ribadavia, 14-17 De Outubro De 1991

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Author

Carlos Barros

ISBN #

8488908016

Xudeus E Conversos Na Historia: Actas Do Congreso Internacional, Ribadavia, 14-17 De Outubro De 1991

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Author

Carlos Barros

ISBN #

8488908024

Us Patents

Chemical Mechanical Planarization Pad With A Release Liner Comprising A Pull Tab

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US Patent:
20230090077, Mar 23, 2023
Filed:
Sep 17, 2021
Appl. No.:
17/478690
Inventors:
- Aurora IL, US
Gary Snider - Oswego IL, US
Carlos Barros - West Chicago IL, US
International Classification:
B24B 37/22
Abstract:
A chemical mechanical polishing (CMP) pad with a release liner that has a pull tab is prepared by contacting the CMP pad to an adhesive layer with release liner. The adhesive layer sheet is cut along a first portion of a perimeter of the CMP pad. An extension of the adhesive layer is cut that extends beyond an edge of the CMP pad at the remaining portion of the perimeter of the CMP pad, thereby creating an extension of the adhesive layer sheet with the adhesive layer exposed. The exposed adhesive layer is cut to a depth not to extend into the release liner. The adhesive layer is removed from the exposed region leaving only the release liner pull tab as a continuous extension of the release liner material.

Chemical Mechanical Planarization Pads Via Vat-Based Production

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US Patent:
20200353586, Nov 12, 2020
Filed:
May 7, 2020
Appl. No.:
16/868965
Inventors:
- Aurora IL, US
Lin FU - Rancho Palos Verdes CA, US
William Michael SPITZIG - Lake Oswego OR, US
Chen-Chih TSAI - Naperville IL, US
Ping HUANG - Beaverton OR, US
Justin STEWART - Aurora IL, US
Carlos BARROS - West Chicago IL, US
International Classification:
B24B 37/24
B24B 37/26
B24B 37/22
Abstract:
A chemical mechanical polishing (CMP) pad includes a polishing portion formed using a vat-based additive manufacturing process. The polishing portion includes a polymer material with a first elastic modulus. In some embodiments the polishing portion is disposed on the backing portion. The backing portion may have a second elastic modulus. The second elastic modulus may be less than the first elastic modulus.
Control profile
Carlos G Barros from Batavia, IL, age ~50 Get Report