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Blaine R Spady

from Lincoln, NE
Age ~55
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Also known as:
Blaine Russell Spady, Blaine S Russell, Blain Spady, Blaine Spadey
Phone and address:
5021 Concord Rd, Lincoln, NE 68516
(402) 421-8707
Related to:
Sophie G WheelerBrian Shaw, 49Robin ShawRobin L Shaw, 53Michelle R Shay, 51Janice C Shaw, 83Richard S Shaw, 60Robin L Spady, 47Alexander L Shaw, 29Larry R Shaw, 81
Connected to:
Brock N Spady, 41Delores M Spady, 63Dennis C Spady, 59Elaine M Spady, 73Eric D Spady, 56Judy A Spady, 70Julie L Spady, 61Kelly R Spady, 38Lawrence Spady, 89Roger E Spady, 72

Blaine Spady Phones & Addresses

  • 5021 Concord Rd, Lincoln, NE 68516 (402) 421-8707
  • Palm Springs, CA
  • Sunnyvale, CA
  • 3210 La Terrace Cir, San Jose, CA 95123
  • 404 Huckleberry Dr, San Jose, CA 95123
  • Champion, NE
  • Santa Clara, CA
  • 5021 Concord Rd, Lincoln, NE 68516

Work

Company: Smith hayes financial services Jun 2006 Position: Vice president public finance

Education

Degree: Master of Business Administration School / High School: University of Nebraska-Lincoln 2005 to 2007 Specialities: Finance

Skills

Investments • Portfolio Management • Financial Modeling • Financial Analysis • Risk Management • Cross Functional Team Leadership • Mergers

Emails

b***[email protected]

Industries

Financial Services

Resumes

Resumes

Blaine Spady Photo 1

Chief Executive Officer

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Location:
1225 L St, Lincoln, NE 68508
Industry:
Financial Services
Work:
SMITH HAYES Financial Services since Jun 2006
Vice President Public Finance
LPL Financial Jan 2005 - Apr 2006
Investment Consultant
Nanometrics May 1995 - Jun 2004
Director of Engineering
Education:
University of Nebraska-Lincoln 2005 - 2007
Master of Business Administration, Finance University of Nebraska-Lincoln 1987 - 1995
Master of Science in Electrical Engineering, Materials Science
Skills:
Investments
Portfolio Management
Financial Modeling
Financial Analysis
Risk Management
Cross Functional Team Leadership
Mergers

Publications

Us Patents

Compact Rotating Stage

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US Patent:
6779278, Aug 24, 2004
Filed:
Jul 17, 2003
Appl. No.:
10/622385
Inventors:
Blaine R. Spady - Lincoln NE
Dan M. Colban - Tracy CA
Assignee:
Nanometrics Incorporated - Milpitas CA
International Classification:
B65G 4907
US Classification:
33569, 414936
Abstract:
A compact stage includes a rotary driver and a vertical linear driver that are in the same horizontal plane, which advantageously reduces the height of the device. The stage may include a rotating shaft to which a chuck is mounted. A rotary drive, which may be an annular rotary drive, is coupled to and rotates the rotating shaft. A linear drive is also coupled to the rotating shaft and in one embodiment extends through the center of the annular rotary drive. The linear drive moves the rotating shaft along a vertical axis. The linear drive may be, e. g. , a voice coil motor that uses a spring to bias the rotating shaft along the vertical axis.

High Precision Substrate Prealigner

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US Patent:
6836690, Dec 28, 2004
Filed:
Jul 19, 2002
Appl. No.:
10/199278
Inventors:
Blaine R. Spady - Lincoln NE
William A. McGahan - Spicewood TX
James V. Read - Austin TX
Arosha W. Goonesekera - Lincoln NE
Eric A. Rost - Lincoln NE
Assignee:
Nanometrics Incorporated - Milpitas CA
International Classification:
H01L 2166
US Classification:
700108, 702150
Abstract:
A prealigner includes a light source and light detector that detects the position of the periphery of a substrate as a rotary chuck rotates the substrate. The prealigner includes a processor that receives and records the peripheral position of the substrate relative to the angular position of the substrate. The prealigner determines the center of the substrate by fitting a curve to the recorded data set, after eliminating any spikes in the data, e. g. , caused by the notch or parts of the chuck. The center may then be easily and accurately determined using the amplitude and phase of the fitted curve. The position of the notch is determined by fitting a curve to the data set for the notch and determining the derivative of the curve. The mid-point of the notch and the offset error of the apex of the notch from the mid-point are calculated based on the derivative.

Stage With Two Substrate Buffer Station

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US Patent:
6854948, Feb 15, 2005
Filed:
Aug 15, 2002
Appl. No.:
10/219569
Inventors:
Blaine R. Spady - Lincoln NE, US
Dan M. Colban - Tracy CA, US
Robert S. Kearns - Saratoga CA, US
Assignee:
Nanometrics Incorporated - Milpitas CA
International Classification:
B65G049/07
US Classification:
41441603, 414281, 414938, 414936
Abstract:
A stage used, e. g. , in semiconductor fabrication, includes a two substrate buffer station and a movable chuck. The buffer station, in one embodiment is fixed, i. e. , non-movable relative to the stage. In another embodiment, the support elements of the buffer station may move in unison vertically or horizontally. In another embodiment, a pair of the support elements horizontally moves toward another pair of support elements to reduce the necessary horizontal motion of the chuck. For example, an unprocessed substrate is loaded onto the top supporting elements of the buffer station, while processed substrates are unloaded from the bottom supporting element of the buffer station. The movable chuck is used to remove the unprocessed substrates from the buffer station and to place the processed substrates on the buffer station.

Precision Polar Coordinate Stage

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US Patent:
6910847, Jun 28, 2005
Filed:
Jul 19, 2002
Appl. No.:
10/199140
Inventors:
Christopher W. Blaufus - San Jose CA, US
Blaine R. Spady - Lincoln NE, US
John D. Heaton - Fremont CA, US
Dan M. Colban - Tracy CA, US
Assignee:
Nanometrics Incorporated - Milpitas CA
International Classification:
B66C023/00
US Classification:
4147445, 4147491, 4147496, 4147511, 4147521
Abstract:
A polar coordinate stage that may be used in a chamber includes a rotating chuck that moves in a linear direction and has the motors that drive the motion of the chuck outside the chamber. The stage can include a linkage of arms to support and drive the linear motion of the chuck. The chuck is coupled to a horizontal rail such that rotational motion of a first arm is translated into precise linear motion of the chuck along the horizontal rail through a second arm. In addition, a system of pulleys within the arms translates rotational (or linear) motion through the arms and rotates the chuck. Vertical motion may be provided by an actuator between the second arm and the chuck or by a motor under the stage. Because of the compact nature of the stage, it can be easily placed within a chamber.

Encoder Measurement Based On Layer Thickness

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US Patent:
6970255, Nov 29, 2005
Filed:
Apr 23, 2003
Appl. No.:
10/422232
Inventors:
Blaine R. Spady - Lincoln NE, US
John D. Heaton - Fremont CA, US
Weidong Yang - Milpitas CA, US
Roger R. Lowe-Webb - Sunnyvale CA, US
Assignee:
Nanometrics Incorporated - Milpitas CA
International Classification:
G01B011/14
G01D005/34
US Classification:
356616, 25023113, 250237 G
Abstract:
An encoder includes a layer on the scale that has a thickness that varies as a function of position along the length of the scale. The position of the sensor head with respect to the scale may be determined by measuring the thickness of the layer or index of refraction, e. g. , using a reflectometer, and converting the thickness to the lateral position. In one embodiment, the thickness of the layer is used to provide a rough position of the sensor head with respect to the scale and an alignment target that includes periodic patterns on both the sensor head and scale is used to provide a refined position.

Edge Grip Chuck

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US Patent:
7032287, Apr 25, 2006
Filed:
Jul 19, 2002
Appl. No.:
10/198948
Inventors:
Blaine R. Spady - Lincoln NE, US
Christopher W. Blaufus - San Jose CA, US
Douglas A. Page - San Jose CA, US
Dan M. Colban - Tracy CA, US
Assignee:
Nanometrics Incorporated - Milpitas CA
International Classification:
B23Q 7/00
B05C 13/00
B05C 13/02
US Classification:
29559, 118500, 118503, 279110, 279123, 269268, 269287
Abstract:
An actuated edge grip chuck includes tabs with raised portions that press against the side of a substrate as opposed clamping on the top or bottom surfaces. The edge grip chuck includes a solid-state actuator to move a moveable tab into an open position. The solid-state actuator may be, e. g. , a piezoelectric actuator or a shape memory alloy. The tab may be biased into the closed position such that when a substrate is held by the edge by the moveable tab and one or more fixed tabs. If desired, more than one moveable tab may be used.

Image Control In A Metrology/Inspection Positioning System

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US Patent:
7289215, Oct 30, 2007
Filed:
Jan 18, 2007
Appl. No.:
11/624666
Inventors:
Blaine R. Spady - Lincoln NE, US
John D. Heaton - Fremont CA, US
Robert Buchanan - Pleasanton CA, US
Richard A. Yarussi - San Francisco CA, US
Assignee:
Nanometrics Incorporated - Milpitas CA
International Classification:
G01B 11/00
G01B 11/14
G01N 21/00
G06K 9/00
US Classification:
356401, 3562371, 356614, 382141, 382145, 382151
Abstract:
A metrology system includes a positioning system that produces linear and rotational motion between an imaging system and the wafer. The imaging system produces signals representing the image of the wafer in the field of view of the imaging system. A control system receives and processes the image signals, and generates corrected signals that compensate for rotational movement between the imaging system and the wafer. In response to the corrected signals, a monitor displays an image with the orientation of features on the wafer within the field of view unaffected by the rotational movement.

Metrology/Inspection Positioning System

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US Patent:
7295314, Nov 13, 2007
Filed:
Dec 8, 1999
Appl. No.:
09/458123
Inventors:
Blaine R. Spady - Lincoln NE, US
John D. Heaton - Fremont CA, US
Robert Buchanan - Pleasanton CA, US
Richard A. Yarussi - San Francisco CA, US
Assignee:
Nanometrics Incorporated - Milpitas CA
International Classification:
G01B 11/00
G01B 11/14
G01N 21/00
G06K 9/00
US Classification:
356401, 3562371, 356614, 382141, 382145, 382151
Abstract:
A metrology/inspection system moves the imaging and/or measuring equipment of the system relative to a wafer. Accordingly, measurement or inspection of the wafer does not require that the wafer be mounted on a precision stage. This allows the wafer to be at rest on any structure native in a processing apparatus when the system measures or inspects the wafer. Accordingly, measurement does not require removing the wafer from the processing apparatus and does not delay processing since the wafer can be measured, for example, during a required cool down period of device fabrication process. Alignment of an optical system includes pre-alignment base on edge detection using the optical system and more precise alignment using image recognition. An R-θ stage can position the optical system at inspection areas on the wafer. Image rotation can provide a fixed orientation for all images at the various inspection areas and can maintain the fixed orientation when moving from one inspection area to the next.
Control profile
Blaine R Spady from Lincoln, NE, age ~55 Get Report