Inventors:
Bjoern Pigur - Brooklyn NY, US
Alfred Snowman - Englewood NJ, US
Assignee:
Praxair Technology, Inc. - Danbury CT
International Classification:
C22F 1/08
US Classification:
148681, 148682, 20429812, 20429813, 723652
Abstract:
The present invention relates to methods for improving deposited film uniformity and controlling the erosion of sputter targets. Improved methods for achieving predetermined microstructure orientation in copper hollow cathode magnetron (HCM) sputter targets and targets prepared by such methods are disclosed.