Aritaka Hishida

7824837, Nov 2, 2010

Oct 22, 2007

11/876332

Hengpeng Wu - Hillsborough NJ, US
Mark O. Neisser - Whitehouse Station NJ, US
Shuji S Ding-Lee - Branchburg NJ, US
Aritaka Hishida - Bedminster NJ, US
Joseph E. Oberlander - Phillipsburg NJ, US
Medhat E. Toukhy - Flemington NJ, US

AZ Electronic Materials USA Corp. - Somerville NJ

G03F 7/095
G03F 7/039
G03F 7/11

4302701, 4302881, 4302711, 430914, 430311, 430326, 430330, 430327, 438952

The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.

8039202, Oct 18, 2011

Oct 24, 2007

11/877891

Yu Sui - Shizuoka, JP
Hengpeng Wu - Hillsborough NJ, US
Wenbing Kang - Shizuoka, JP
Mark O. Neisser - Whitehouse Station NJ, US
Tomohide Katayama - Shizuoka, JP
Shuji S. Ding-Lee - Branchburg NJ, US
Aritaka Hishida - Bedminster NJ, US
Joseph E. Oberlander - Phillipsburg NJ, US
Medhat E. Toukhy - Flemington NJ, US

AZ Electronic Materials USA Corp. - Somerville NJ

G03F 7/26

430311

The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.

20050214674, Sep 29, 2005

Mar 25, 2004

10/808884

Yu Sui - Ogasa-gun, JP
Hengpeng Wu - Hillsborough NJ, US
Wenbing Kang - Ogasa-gun, JP
Mark Neisser - Whitehouse Station NJ, US
Tomohide Katayama - Ogasa-gun, JP
Shuji Ding-Lee - Branchburg NJ, US
Aritaka Hishida - Bedminster NJ, US
Joseph Oberlander - Phillipsburg NJ, US
Medhat Toukhy - Flemington NJ, US

G03F007/004

430270100, 430326000

The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.

20060057501, Mar 16, 2006

Sep 15, 2004

10/941221

Hengpeng Wu - Hillsborough NJ, US
Shuji Ding-Lee - Branchburg NJ, US
Zhong Xiang - Somerset NJ, US
Aritaka Hishida - Bedminster NJ, US
Jianhui Shan - Pennington NJ, US

G03C 5/00

430311000

The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with a reactive compound containing hydroxy groups and/or acid groups, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.

20060058468, Mar 16, 2006

Jun 22, 2005

11/159002

Hengpeng Wu - Hillsborough NJ, US
Shuji Ding-Lee - Branchburg NJ, US
Zhong Xiang - Edison NJ, US
Aritaka Hishida - Bedminster NJ, US
Jianhui Shan - Pennington NJ, US
Hong Zhuang - Raritan NJ, US

C08F 8/00

525386000

The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.