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Andu A Tefera

from Sunnyvale, CA
Age ~68
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Also known as:
Alem Tefera Andu
Related to:
Tara M RoySandra K PeralesAn T Kent, 69James KentLataheanga TuuaMinh Tu, 51
Connected to:
Behailu T Tefera, 43Beza A Tefera, 34Hanna A Tefera, 41Helen B Tefera, 42Martha W Tefera, 64Seble Tefera, 50Daniel G Teferi, 34Kebede Y Teferi, 71Axum T Teferra, 38Michael Teferra, 69

Andu Tefera Phones & Addresses

  • Sunnyvale, CA
  • Fremont, CA
  • San Jose, CA
  • Santa Clara, CA
  • Oakland, CA
  • 3750 Tamayo St APT 105, Fremont, CA 94536

Work

Company: Global computing & consulting Sep 2009 Position: Consultant, chief design mechanical engineer

Education

School / High School: San Jose State University 2004 to 2009 Specialities: Design Mecanical Engineering MS

Skills

Minitab • Engineering • Manufacturing • Pro Engineer • Six Sigma • Project Management • R&D • Product Development • Engineering Management • Spc • Testing

Languages

English

Industries

Mechanical Or Industrial Engineering

Resumes

Resumes

Andu Tefera Photo 1

Transition

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Location:
1725 Noranda Dr, Sunnyvale, CA 94087
Industry:
Mechanical Or Industrial Engineering
Work:
GLOBAL COMPUTING & CONSULTING since Sep 2009
Consultant, Chief Design Mechanical Engineer
BAE Systems Mar 2008 - Sep 2009
Staff, Mechanical Engineer
MIPOX International Corporation Aug 2005 - Mar 2007
NPI Engineer
Education:
San Jose State University 2004 - 2009
University of California, Davis 1989 - 1992
BSME, Mechanical & Aeronautical Engineering (double)
Skills:
Minitab
Engineering
Manufacturing
Pro Engineer
Six Sigma
Project Management
R&D
Product Development
Engineering Management
Spc
Testing
Languages:
English

Publications

Us Patents

Water-Based Non-Organic Coolant For Texturing Hard Disk

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US Patent:
20080081543, Apr 3, 2008
Filed:
Sep 29, 2006
Appl. No.:
11/540777
Inventors:
Andu Alem Tefera - Sunnyvale CA, US
International Classification:
B24B 7/30
C09K 5/00
US Classification:
451 41, 252 71
Abstract:
A water-based non-organic coolant contains a texturing surfactant, a wetting surfactant, a lubricating surfactant and a bacterial growth inhibitor each of a specified composition and each in an amount within a specified range. As a hard disk is rotated, slurry containing abrading particles and such a coolant is applied to its surface as a polishing tape is pressed on it to obtain a textured surface of a high quality.

Apparatus For The Application Of An Advanced Texture Process

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US Patent:
61559148, Dec 5, 2000
Filed:
Sep 18, 1998
Appl. No.:
9/156331
Inventors:
Frank Richard Reynen - Cupertino CA
Simon Wing Tat Fung - Fremont CA
Eric Steck Freeman - Oakland CA
Andu Alem Tefera - San Jose CA
Assignee:
Seagate Technologies, LLC - Scotts Valley CA
International Classification:
B24B 700
US Classification:
451168
Abstract:
Apparatus for removing random scratches formed during the polishing of magnetic recording media, and for disposing on the surface of the media a near-circumferential texture which increases the recording reliability of the media while simultaneously reducing its failure rate. The present invention teaches the application of a low unit load force to a pad and polishing tape combination in contact with a rotating and oscillating disk surface to completely remove the random scratches previously formed by a polishing step. The apparatus facilitates the application of a specially designed, extremely fine alumina slurry composition without producing similar size circumferential scratches at the high surface speeds. The apparatus provides for a smoother disk surface heretofore available, the surface being significantly more uniform than known batch process apparatus for polishing and texturing disks, leading to increased recording reliability, and increased efficiency of manufacturing through reduced manufacturing and post-deployment failures.

Apparatus For The Application Of An Advanced Texture Process

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US Patent:
62770055, Aug 21, 2001
Filed:
Sep 19, 2000
Appl. No.:
9/665364
Inventors:
Frank Richard Reynen - Cupertino CA
Simon Wing Tat Fung - Fremont CA
Eric Steck Freeman - Oakland CA
Andu Alem Tefera - San Jose CA
Assignee:
Seagate Technology LLC - Scotts Valley CA
International Classification:
B24B 700
US Classification:
451168
Abstract:
Apparatus for removing random scratches formed during the polishing of magnetic recording media, and for disposing on the surface of the media a near-circumferential texture which increases the recording reliability of the media while simultaneously reducing its failure rate. The present invention teaches the application of a low unit load force to a pad and polishing tape combination in contact with a rotating and oscillating disk surface to completely remove the random scratches previously formed by a polishing step. The apparatus facilitates the application of a specially designed, extremely fine alumina slurry composition without producing similar size circumferential scratches at the high surface speeds. The apparatus provides for a smoother disk surface heretofore available, the surface being significantly more uniform than known batch process apparatus for polishing and texturing disks, leading to increased recording reliability, and increased efficiency of manufacturing through reduced manufacturing and post-deployment failures.

Advanced Mechanical Texture Process For High Density Magnetic Recording Media

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US Patent:
61296120, Oct 10, 2000
Filed:
Sep 18, 1998
Appl. No.:
9/156332
Inventors:
Frank Richard Reynen - Cupertino CA
Simon Wing Tat Fung - Fremont CA
Eric Steck Freeman - Oakland CA
Andu Alem Tefera - San Jose CA
Assignee:
Seagate Technologies, Inc. - Scotts Valley CA
International Classification:
B24B 100
US Classification:
451 53
Abstract:
Method for removing random scratches formed during the polishing of magnetic recording media, and for disposing on the surface of the media a near-circumferential texture which increases the recording reliability of the media while simultaneously reducing its failure rate. The present invention teaches the application of a low unit load force to a large surface pad and polishing tape combination while in contact with a rotating disk surface that is also moving in a circumferential direction to completely remove the random scratches previously formed by a polishing step. The scratches are removed with the aid of a specially designed, extremely fine alumina slurry composition which prevent producing similar size circumferential scratches at the high surface speeds. The methodology provides for a smoother disk surface than prior known super-polish/texture methodologies. The methodology taught by the principles of the present invention is inherently more uniform than known batch process for polishing and texturing disks and leads to increased efficiency of media manufacturing through reduced manufacturing and post-deployment failures.
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Andu A Tefera from Sunnyvale, CA, age ~68 Get Report