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Anatoly Shchemelinin

from Bozeman, MT
Age ~59
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Also known as:
Anotoly Shchemelinin, An Shchemelinin, Anna Shchemelinin, Anatoly N, Y N
Phone and address:
1544 Hunters Way, Bozeman, MT 59718
Related to:
Maxim M Shchemelinin, 37Yoni Shchemelinin, 32Ester Shchemelinin, 32Anna Shchemelinin, 61
Connected to:
Kateryna V Shchennikova, 44Alysa V Shcherbakova, 42Andriy Shcherbyna, 55Ekaterina V Shcherbakova, 40Feliks Shcherbakov, 37Igor Shcherba, 55Marta V Shcherbakova, 33Nataliya Shcherbakova, 37Tatyana Y Shcherban, 60Andriana Shchudlak, 35

Anatoly Shchemelinin Phones & Addresses

  • 1544 Hunters Way, Bozeman, MT 59718
  • Manhattan, MT
  • Pleasanton, CA
  • 10117 Adriana Ave, Cupertino, CA 95014 (408) 517-0797

Work

Company: Kla-tencor 2010 Position: Principal research engineer

Education

School / High School: Leningrad Plytechnical institute, Ioffe Physical and Technical Institute 1982 Specialities: MS in Physics and EE

Resumes

Resumes

Anatoly Shchemelinin Photo 1

Anatoly Shchemelinin Bozeman, MT

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Work:
KLA-Tencor

2010 to 2000
Principal Research engineer
KLA-Tencor
Milpitas, CA
2002 to 2010
Principal System Engineer
Applied Materials
Santa Clara, CA
Mar 2000 to Jun 2002
Senior Staff System engineer
TSK (Israel) Herzelia, Israel

Oct 1997 to Mar 2000
Senior System development engineer
Intel

Dec 1996 to Oct 1997
VLSI circuit design engineer
KLA Instruments (Israel)
,
Apr 1994 to Dec 1996
Algorithm and System Engineer
Nanonics Ltd

1990 to 1994
Research Engineer / PhD student
Radio Technical Research Institute

1988 to 1990
Research Engineer
Education:
Leningrad Plytechnical institute, Ioffe Physical and Technical Institute
1982 to 1988
MS in Physics and EE

Publications

Us Patents

Initiating Laser-Sustained Plasma

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US Patent:
8259771, Sep 4, 2012
Filed:
Jul 19, 2010
Appl. No.:
12/839332
Inventors:
Anatoly Shchemelinin - Pleasanton CA, US
Ilya Bezel - Sunnyvale CA, US
Matthew W. Derstine - Los Gatos CA, US
Assignee:
KLA-Tencor Corporation - Milpitas CA
International Classification:
H01S 3/223
H01S 3/091
US Classification:
372 55, 372 76, 372 85
Abstract:
A laser-sustained plasma light source with a bulb for enclosing a relatively cool gas environment, and an electrode disposed at least partially within the gas environment. A power supply applies a potential to the electrode, where the power supply is sufficient to create a corona discharge at the electrode within the gas environment, and the power supply is not sufficient to produce an arc discharge within the gas environment. The corona discharge thereby produces a relatively heated gas environment. A pump laser source focuses a laser beam within the gas environment, where the laser beam is sufficient to ignite a plasma in the relatively heated gas environment, but is not sufficient to ignite a plasma in the relatively cool gas environment.

Full Numerical Aperture Pump Of Laser-Sustained Plasma

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US Patent:
8517585, Aug 27, 2013
Filed:
Jun 22, 2011
Appl. No.:
13/165924
Inventors:
Ilya Bezel - Sunnyvale CA, US
Anatoly Shchemelinin - Pleasanton CA, US
Assignee:
KLA-Tencor Corporation - Milpitas CA
International Classification:
G02B 6/02
H01S 3/00
US Classification:
362553, 362259, 250504 R, 2504931, 2504941
Abstract:
A laser-sustained light source having a first laser source for providing a first beam portion having a first characteristic, a second laser source for providing a second beam portion having a second characteristic, where the first characteristic is different from the first characteristic, first optics that are reflective to the first characteristic and transmissive of the second characteristic, for reflecting the first beam portion along a first path into a reflection optics and through a cell to sustain a plasma, second optics that are reflective to the second characteristic and transmissive of the first characteristic, for reflecting the second beam portion along a second path into the reflection optics and through the cell to sustain the plasma, the first path exiting to the second optics, where the first beam is transmitted through the second optics and into a beam dump, and the second path exiting to the first optics, where the second beam is transmitted through the first optics and into the beam dump.

Multi-Wavelength Pumping To Sustain Hot Plasma

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US Patent:
20110291566, Dec 1, 2011
Filed:
Feb 12, 2010
Appl. No.:
13/119491
Inventors:
Ilya V. Bezel - Sunnyvale CA, US
Anatoly Shchemelinin - Pleasanton CA, US
Eugene Shifrin - Sunnyvale CA, US
Matthew W. Derstine - Los Gatos CA, US
Richard W. Solarz - Danville CA, US
Assignee:
KLA-TENCOR CORPORATION - Milpitas CA
International Classification:
H05H 1/24
US Classification:
31511121
Abstract:
A method of sustaining a plasma, by focusing a first wavelength of electromagnetic radiation into a gas within a volume, where the first wavelength is substantially absorbed by a first species of the gas and delivers energy into a first region of a plasma having a first size and a first temperature. A second wavelength of electromagnetic radiation is focused into the first region of the plasma, where the second wavelength is different than the first wavelength and is substantially absorbed by a second species of the gas and delivers energy into a second region of the plasma region within the first region of the plasma having a second size that is smaller than the first size and a second temperature that is greater than the first temperature.

Optically Pumping To Sustain Plasma

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US Patent:
20130001438, Jan 3, 2013
Filed:
Jun 21, 2012
Appl. No.:
13/529539
Inventors:
Ilya Bezel - Sunnyvale CA, US
Anatoly Shchemelinin - Pleasanton CA, US
Matthew Derstine - Los Gatos CA, US
Assignee:
KLA-TENCOR CORPORATION - Milpitas CA
International Classification:
B01J 19/12
US Classification:
2504921
Abstract:
A method for sustaining a plasma includes providing a volume of a gas; generating illumination of a first selected wavelength; and forming a first plasma species in a first region of the gas and a second plasma species in a second region of the gas by focusing the illumination of the first wavelength into the volume of gas, the first region having a first average temperature and a first size, the second region having a second average temperature and a second size, the illumination of the first selected wavelength transmitted by the second plasma species, the illumination of the first selected wavelength absorbed by the first plasma species by tuning the first selected wavelength of the illumination to an absorption line of the first plasma species, the absorption line being associated with an ionic absorption transition or an excited neutral transition of the first plasma species.

Adaptive Optics For Compensating Aberrations In Light-Sustained Plasma Cells

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US Patent:
20130003384, Jan 3, 2013
Filed:
Jun 21, 2012
Appl. No.:
13/529582
Inventors:
Ilya Bezel - Sunnyvale CA, US
Anatoly Shchemelinin - Pleasanton CA, US
Yanming Zhao - Milpitas CA, US
Matthew Derstine - Los Gatos CA, US
Assignee:
KLA-TENCOR CORPORATION - Milpitas CA
International Classification:
F21V 13/00
US Classification:
362276
Abstract:
A system for compensating abberative effects caused by a bulb of a plasma cell includes an illumination source configured to generate illumination; a plasma cell, the plasma cell including a bulb for containing a volume of gas; an ellipse configured to focus illumination from the illumination source into the volume of gas in order to generate a plasma within the volume of gas; and one or more adaptive optical elements configured to compensate for aberrations produced by one or more optical elements, the one or more adaptive optics elements positioned along an illumination pathway between the illumination source and the plasma cell.

Plasma Cell For Laser-Sustained Plasma Light Source

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US Patent:
20130106275, May 2, 2013
Filed:
Oct 9, 2012
Appl. No.:
13/647680
Inventors:
Anatoly Shchemelinin - Pleasanton CA, US
Ilya Bezel - Sunnyvale CA, US
Rajeev Patil - Fremont CA, US
Assignee:
KLA-TENCOR CORPORATION - Milpitas CA
International Classification:
H01J 61/52
H01J 61/28
US Classification:
313 39, 313634, 313112
Abstract:
A refillable plasma cell for use in a laser-sustained plasma light source includes a plasma bulb, the bulb being formed from a glass material substantially transparent to a selected wavelength of radiation, and a gas port assembly, the gas port assembly being operably connected to the bulb and disposed at a first portion of the gas bulb, wherein the bulb is configured to selectively receive a gas from a gas source via the gas port assembly.

Plasma Cell For Providing Vuv Filtering In A Laser-Sustained Plasma Light Source

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US Patent:
20130181595, Jul 18, 2013
Filed:
Jan 15, 2013
Appl. No.:
13/741566
Inventors:
Anatoly Shchemelinin - Pleasanton CA, US
Eugene Shifrin - Sunnyvale CA, US
Matthew Panzer - San Jose CA, US
Matthew Derstine - Los Gatos CA, US
Jincheng Wang - San Jose CA, US
Anant Chimmalgi - San Jose CA, US
Rajeev Patil - Fremont CA, US
Rudolf Brunner - Mountain View CA, US
Assignee:
KLA-TENCOR CORPORATION - Milpitas CA
International Classification:
F21V 9/06
US Classification:
313112
Abstract:
A plasma cell for use in a laser-sustained plasma light source includes a plasma bulb configured to contain a gas suitable for generating a plasma, the plasma bulb being substantially transparent to light emanating from a pump laser configured to sustain the plasma within the plasma bulb, wherein the plasma bulb is substantially transparent to at least a portion of a collectable spectral region of illumination emitted by the plasma, and a filter layer disposed on an interior surface of the plasma bulb, the filter layer configured to block a selected spectral region of the illumination emitted by the plasma.

Laser Sustained Plasma Bulb Including Water

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US Patent:
20140042336, Feb 13, 2014
Filed:
Mar 8, 2013
Appl. No.:
13/790084
Inventors:
Anatoly Shchemelinin - Pleasanton CA, US
Matthew Alan Panzer - San Jose CA, US
Assignee:
KLA-TENCOR CORPORATION - Milpitas CA
International Classification:
H01J 61/02
US Classification:
250424, 250423 R
Abstract:
A wafer inspection system includes a laser sustained plasma (LSP) light source that generates light with sufficient radiance to enable bright field inspection. Reliability of the LSP light source is improved by introducing an amount of water into the bulb containing the gas mixture that generates the plasma. Radiation generated by the plasma includes substantial radiance in a wavelength range below approximately 190 nanometers that causes damage to the materials used to construct the bulb. The water vapor acts as an absorber of radiation generated by the plasma in the wavelength range that causes damage. In some examples, a predetermined amount of water is introduced into the bulb to provide sufficient absorption. In some other examples, the temperature of a portion of the bulb containing an amount of condensed water is regulate to produce the desired partial pressure of water in the bulb.
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Anatoly Shchemelinin from Bozeman, MT, age ~59 Get Report