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Alan D Zdunek

from Chicago, IL
Age ~64
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Also known as:
Alan Donald Zdunek, Alan Donald Zdunek Tru, Alen D Zdunek
Phone and address:
1537 Glenlake Ave, Chicago, IL 60660
(773) 274-1665
Related to:
Linda Darlene Fraser, 77Sara Zdunek, 28Maria A Zdunek, 33David C Zdunek, 31Teresita M Zdunek, 64Maria M Fraser, 65
Connected to:
Heather J Zdunek, 49Chrisopher D Zdunich, 30Margaret A Zdunich, 57Neil B Zdunkawicz, 65Lillian Zdunowski, 79Cynthia A Zdunski, 64Laura A Zdyb, 51Laura J Zdychnec, 66Joseph S Zdyrski, 84Alexander J Zdzinski, 67

Alan Zdunek Phones & Addresses

  • 1537 Glenlake Ave, Chicago, IL 60660 (773) 274-1665

Work

Company: University of illinois at chicago Aug 2015 Position: Director of undergraduate studies, clinical assistant professor

Education

Degree: Doctorates, Doctor of Philosophy School / High School: Illinois Institute of Technology 1986 to 1990 Specialities: Chemical Engineering

Skills

Materials Science • Chemical Engineering • R&D • Characterization • Electrochemistry • Nanotechnology • Chemistry • Experimentation • Laboratory • Materials • Project Management • Process Simulation • Surface Chemistry • Catalysis • Spectroscopy • Design of Experiments • Coatings • Proposal Writing • Fuel Cells • Technology Transfer • Electrochemical Engineering • Thin Films • Powder X Ray Diffraction • University Teaching • Integration • Semiconductors • Analytical Chemistry • Scanning Electron Microscopy • Laboratory Skills • Group Development • Afm • Nanomaterials • Research and Development • Engineering Analysis

Interests

Education

Emails

t***[email protected]

Industries

Chemicals

Resumes

Resumes

Alan Zdunek Photo 1

Interim Director Of Undergraduate Studies

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Location:
Chicago, IL
Industry:
Chemicals
Work:
University of Illinois at Chicago
Director of Undergraduate Studies, Clinical Assistant Professor
University of Illinois at Chicago
Interim Director of Undergraduate Studies
University of Illinois at Chicago Jul 2010 - Jul 2014
Adjunct Professor
Illinois Institute of Technology Sep 2006 - Jul 2010
Research Associate Professor and Adjunct Faculty
Air Liquide Apr 2003 - Aug 2006
Group Expert
Education:
Illinois Institute of Technology 1986 - 1990
Doctorates, Doctor of Philosophy, Chemical Engineering Illinois Institute of Technology 1983 - 1986
Master of Science, Masters, Chemical Engineering Knox College 1978 - 1982
Bachelors, Bachelor of Arts, Chemistry
Skills:
Materials Science
Chemical Engineering
R&D
Characterization
Electrochemistry
Nanotechnology
Chemistry
Experimentation
Laboratory
Materials
Project Management
Process Simulation
Surface Chemistry
Catalysis
Spectroscopy
Design of Experiments
Coatings
Proposal Writing
Fuel Cells
Technology Transfer
Electrochemical Engineering
Thin Films
Powder X Ray Diffraction
University Teaching
Integration
Semiconductors
Analytical Chemistry
Scanning Electron Microscopy
Laboratory Skills
Group Development
Afm
Nanomaterials
Research and Development
Engineering Analysis
Interests:
Education

Business Records

Name / Title
Company / Classification
Phones & Addresses
Alan Zdunek
Manager
Air Liquide America L.P
Mfg Industrial Gases
5220 E Ave, Oak Brook, IL 60525
5220 E Ave, La Grange, IL 60525
(708) 482-8400, (708) 579-7702

Publications

Us Patents

Corrosion Resistant Gas Cylinder And Gas Delivery System

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US Patent:
6202885, Mar 20, 2001
Filed:
May 28, 1999
Appl. No.:
9/322667
Inventors:
Alan D. Zdunek - Chicago IL
Eugene A. Kernerman - Mt. Prospect IL
William Korzeniowski - Dayton NJ
Assignee:
American Air Liquide Inc. - Countryside IL
Air Liquide Americas America Corporation - Houston TX
L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes
Georges Claude - Paris
International Classification:
C23C 1836
US Classification:
220586
Abstract:
A corrosion resistant gas cylinder and gas delivery system includes an electroless nickel-phosphorous layer overlying the inner surface of a steel alloy cylinder. The nickel-phosphorous layer has a thickness of at least about 20 micrometers and a porosity of no greater than about 0. 1%. The electroless nickel-phosphorous layer has a phosphorous content of at least about 10% by weight and a surface roughness of no greater than about 5 micrometers. Prior to introducing liquefied gas into the gas cylinder, a cleaning process is carried out using a two-step baking process to clean the surface of the nickel-phosphorus layer. The nickel-phosphorous layer substantially reduces the contamination of liquefied corrosive gasses stored in the gas cylinder by metal from the steel wall surface underlying the nickel-phosphorous layer. Metal contamination levels of less than about 55 ppb of iron, 10 ppb of chromium, and 5 ppb of nickel by weight can be maintained in liquefied corrosive gasses stored for an extended period of time in the electroless nickel-phosphorus plated gas cylinder.

Corrosion Resistant Gas Cylinder And Gas Delivery System

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US Patent:
6365227, Apr 2, 2002
Filed:
Mar 22, 2001
Appl. No.:
09/815023
Inventors:
Alan D. Zdunek - Chicago IL
Eugene A. Kernerman - Mt. Prospect IL
William Korzeniowski - Dayton NJ
Assignee:
LAir Liquide, Societe Anonyme pour lEtude et, l Exploitation des Procedes Claude of France
American Air Liquide Inc. - Countryside IL
International Classification:
B05D 722
US Classification:
427239, 427377, 427380, 427437, 427438
Abstract:
A corrosion resistant gas cylinder and gas delivery system includes an electroless nickel-phosphorous layer overlying the inner surface of a steel alloy cylinder. The nickel-phosphorous layer has a thickness of at least about 20 micrometers and a porosity of no greater than about 0. 1%. The electroless nickel-phosphorous layer has a phosphorous content of at least about 10% by weight and a surface roughness of no greater than about 5 micrometers. Prior to introducing liquefied gas into the gas cylinder, a cleaning process is carried out using a two-step baking process to clean the surface of the nickel-phosphorus layer. The nickel-phosphorous layer substantially reduces the contamination of liquefied corrosive gasses stored in the gas cylinder by metal from the steel wall surface underlying the nickel-phosphorous layer. Metal contamination levels of less than about 55 ppb of iron, 10 ppb of chromium, and 5 ppb of nickel by weight can be maintained in liquefied corrosive gasses stored for an extended period of time in the electroless nickel-phosphorus plated gas cylinder.

Micro Structured Electrode And Method For Monitoring Wafer Electroplating Baths

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US Patent:
7022212, Apr 4, 2006
Filed:
Oct 21, 2002
Appl. No.:
10/277178
Inventors:
Alan D. Zdunek - Chicago IL, US
Assignee:
American Air Liquide, Inc. - Fremont CA
International Classification:
G01N 27/26
US Classification:
204400, 204407, 204434, 204280, 204416, 422 8201, 422 8202, 422 8203, 422 98
Abstract:
A microstructured electrode coupled with an analytical method designed to simulate the actual conditions on the wafer and to measure critical parameters such as mass transfer of the active plating components, deposition rates of the copper in the plating bath solutions, and/or additive concentration is disclosed. Thus, an offline method for process control is provided. Additionally, the electrode and method can be incorporated into a copper interconnect bath tool or copper interconnect bath distribution system for online control of the process chemistry. The microstructured electrode design consists of a patterned electrode surface that simulates the dimensions of the interconnects and vias. The analytical method can be any type of method that allows diffusion or kinetic information to be obtained, such as electrochemical impedance, electrochemical noise, and other voltammetric or galvanostatic methods.

Micro Electromechanical Systems For Delivering High Purity Fluids In A Chemical Delivery System

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US Patent:
7195026, Mar 27, 2007
Filed:
Dec 12, 2003
Appl. No.:
10/733761
Inventors:
Dmitry Znamensky - Darien IL, US
Alan Zdunek - Chicago IL, US
International Classification:
F16K 11/00
US Classification:
137 1504, 137240
Abstract:
Complex fluidic micro electromechanical systems (MEMS) are incorporated into high purity chemical delivery systems, while maintaining valve sealing integrity, quality and performance of the system. In particular, fluidic MEMS systems are incorporated into high purity chemical delivery systems for semiconductor fabrication processes.

Method And Apparatus For Measuring Coating Quality

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US Patent:
20010001441, May 24, 2001
Filed:
Jan 16, 2001
Appl. No.:
09/759335
Inventors:
Alan Zdunek - Chicago IL, US
Paul Vanecek - Romeoville IL, US
Eugene Kernerman - Mount Prospect IL, US
International Classification:
G01N027/26
G01N027/48
US Classification:
205/791000, 204/404000, 204/434000, 205/776500
Abstract:
A method and apparatus for measuring the quality, e.g., thickness, porosity, or corrosion rate, of a coating inside a hollow body having an opening. The method comprises attaching a probe from a coating measuring device to one end of an extender arm having a flexible portion therein, placing the probe inside the hollow body through the opening, and making the desired measurements of the coating. The apparatus includes a flexible extender arm for use with a coating measuring device. The flexible extender arm comprises an elongated, substantially rigid body portion; a handle assembly connected to one end of the substantially rigid body portion; a flexible portion connected to an opposite end of the substantially rigid body portion; a coating measurement probe holder portion connected to an end of the flexible portion opposite the substantially rigid body portion; and a pull connected at one end thereof to the substantially rigid body portion and connected at an opposite end thereof to the coating measurement probe holder portion.

Gas Delivery Apparatus And Method For Monitoring A Gas Phase Species Therein

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US Patent:
20020152797, Oct 24, 2002
Filed:
Jan 4, 2002
Appl. No.:
10/035179
Inventors:
James McAndrew - Lockport IL, US
Eric Duchateau - Gieres, FR
Jean-Marc Girard - Tsukuba-shi, JP
Alan Zdunek - Chicago IL, US
International Classification:
G01N029/02
US Classification:
073/023200
Abstract:
Provided are novel gas delivery apparatuses. In accordance with one aspect of the invention, the apparatus features: a gas line network for delivering a gas from a gas source to a point of use; means for performing one or more vacuum/purge cycle in the gas line network, the vacuum/purge cycle including a vacuum phase and a purge phase; and a measurement system for detecting a gas phase molecular species in the gas line network during the vacuum phase and/or the purge phase of the vacuum/purge cycle. Also provided are methods for monitoring a gas phase molecular species in a gas delivery apparatus. The invention allows for replacement of components in a gas delivery system in a manner which is safe, and which avoids detrimental impact on the process being run and on the equipment.

Method And Apparatus For Monitoring, Dosing And Distribution Of Chemical Solutions

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US Patent:
20050051433, Mar 10, 2005
Filed:
Apr 19, 2004
Appl. No.:
10/827596
Inventors:
Alan Zdunek - Chicago IL, US
Omar Germouni - Chicago IL, US
Alejandro Barajas - Clarendon Hills IL, US
International Classification:
C25D021/12
US Classification:
205082000
Abstract:
It is an object of the present invention to provide a system and method for monitoring, dosing and distribution of a chemical composition in a material treatment process, the chemical composition containing at least one additive for maintaining quality of the chemical treatment process. The system and method include: at least one chemical containing unit configured to contain the chemical composition for the chemical treatment process; a dosing unit fluidly communicating with the at least one chemical containing unit configured to receive the chemical composition therefrom and to add a selected dose of the at least one additive to the chemical composition therein; an online monitor configured to monitor a property of the chemical composition at the dosing unit and to transmit a signal corresponding to the monitored property; and a controller programmed and configured to receive the signal from the online monitor and send a signal to the dosing system to add the selected dose to the chemical composition therein in response to the monitored property.

Method And Apparatus For Retrofitting Existing Real Time Control Systems For Monitoring, Controlling, And Distributing Chemicals During Electroplating

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US Patent:
20060172427, Aug 3, 2006
Filed:
Dec 7, 2005
Appl. No.:
11/296067
Inventors:
Omar Germouni - Chicago IL, US
Alan Zdunek - Chicago IL, US
International Classification:
G01N 33/00
US Classification:
436055000
Abstract:
Chemical treatment process control, including a virtual sensor based upon artificial intelligence that automatically computes and predicts additive concentrations in chemical baths used in manufacturing to compensate for the lag time in obtaining data from real-time analyzers (RTA). Once actual measurement data is obtained, bath concentrations can be further adjusted if necessary. Also disclosed is the retrofitting of a RTA with a controller where the data signal from the RTA has a proprietary communication protocol that is converted by hardware and/or software into a signal having an open communication protocol for transmission to the controller for controlling electrochemical bath concentration. Further disclosed is a method of controlling chemical concentration of electrochemical baths by predicting the depletion of chemicals during manufacture and causing dosing and/or draining of a portion of the bath during the time delay between RTA analyses. An algorithm written into program language and compiled into an executable format can be used in the controllers.
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Alan D Zdunek from Chicago, IL, age ~64 Get Report