Aage P Bendiksen

7996853, Aug 9, 2011

Oct 4, 2005

11/243240

Aage Bendiksen - Wheaton IL, US
Benny Tseng - Brookfield CT, US
Louis Zhongliang Lu - Southbury CT, US

Hewlett-Packard Development Company, L.P. - Houston TX

G06F 9/44
G06F 17/00

719328

There is provided a method that includes (i) examining first data from a first Application Program Interface (API) call and second data from a second API call to determine whether (a) the first API call sent a message, and the second API call received the message, or (b) the first API call was conducted in a transactional unit of work, and the second API was also conducted in the transactional unit of work, and (ii) employing the first data and the second data in a subsequent process, if either of (a) or (b) is true.

7003781, Feb 21, 2006

May 5, 2000

09/564929

Aaron Kenneth Blackwell - Redding CT, US
Aage Bendiksen - Hamden CT, US
Benny Tseng - Danbury CT, US
Zhongliang Lu - Danbury CT, US
Amal Shah - Danbury CT, US

Bristol Technology Inc. - Danbury CT

G06F 9/00

719327

A method and system is disclosed for monitoring an operation of a distributed data processing system. The system can include a plurality of applications running on a plurality of host processors and communicating with one another, such as through a message passing technique. The method includes steps executed in individual ones of the plurality of applications, of (a) examining individual ones of generated API calls to determine if a particular API call meets predetermined API call criteria; (b) if a particular API call meets the predetermined API call criteria, storing all or a portion of the content of the API call as a stored event; (c) processing a plurality of the stored events to identify logically correlated events, such as those associated with a business transaction; and (d) displaying all or a portion of the stored API call content data for the logically correlated events.

20220252974, Aug 11, 2022

Apr 25, 2022

17/728608

- Veldhoven, NL
Aage BENDIKSEN - Fairfield CT, US
Derk Servatius Gertruda BROUNS - Herentals, BE
Pradeep K. GOVIL - Norwalk CT, US
Paul JANSSEN - Eindhoven, NL
Maxim Aleksandrovich NASALEVICH - Eindhoven, NL
Arnoud Willem NOTENBOOM - Rosmalen, NL
Mária PÉTER - Eindhoven, NL
Marcus Adrianus VAN DE KERKHOF - Helmond, NL
Willem Joan VAN DER ZANDE - Bussum, NL
Pieter-Jan VAN ZWOL - Eindhoven, NL
Johannes Petrus Martinus Bernardus VERMEULEN - Leende, NL
Willlem-Pieter VOORTHUIJZEN - s-Hertogenbosch, NL
James Norman WILEY - Menlo Park CA, US

G03F 1/64
G03F 1/22
G03F 7/20
G03F 1/62

A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

20230055116, Feb 23, 2023

Jan 21, 2021

17/794905

- Veldhoven, NL
Christopher Michael DOHAN - Redding CT, US
Justin Lloyd KREUZER - Trumbull CT, US
Michal Emanuel PAWLOWSKI - Norwalk CT, US
Aage BENDIKSEN - Fairfield CT, US
Kirill Urievich SOBOLEV - Brookfield CT, US
James Hamilton WALSH - Newtown CT, US
Roberto B. WIENER - Ridgefield CT, US
Arun Mahadevan VENKATARAMAN - Wilton CT, US

ASML Holding N.V. - Veldhoven

G03F 1/84

An inspection system includes a radiation source that generates a beam of radiation and irradiates a first surface of an object, defining a region of the first surface of the object. The radiation source also irradiates a second surface of the object, defining a region of the second surface, wherein the second surface is at a different depth level within the object than the first surface. The inspection system may also include a detector that defines a field of view (FOV) of the first surface including the region of the first surface, and receives radiation scattered from the region of the first surface and the region of the second surface. The inspection system may also include a processor that discards image data not received from the region of the first surface, and constructs a composite image comprising the image data from across the region of the first surface.

20210208500, Jul 8, 2021

Mar 19, 2021

17/206649

- Veldhoven, NL
Aage BENDIKSEN - Fairfield CT, US
Derk Servatius Gertruda BROUNS - Herentals, BE
Pradeep K. GOVIL - Norwalk CT, US
Paul JANSSEN - Eindhoven, NL
Maxim Aleksandrovich NASALEVICH - Eindhoven, NL
Arnoud Willem NOTENBOOM - Rosmalen, NL
Mária PÉTER - Eindhoven, NL
Marcus Adrianus VAN DE KERKHOF - Helmond, NL
Willem Joan VAN DER ZANDE - Bussum, NL
Pieter-Jan VAN ZWOL - Eindhoven, NL
Johannes Petrus Martinus Bernardus VERMEULEN - Leende, NL
Willem-Pieter VOORTHUIJZEN - 's-Hertogenbosch, NL
James Norman WILEY - Menlo Park CA, US

ASML NETHERLANDS B.V. - Veldhoven
ASML HOLDING N.V. - Veldhoven

G03F 1/64
G03F 1/22
G03F 7/20
G03F 1/62

A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

20200341366, Oct 29, 2020

Nov 27, 2018

16/765339

- Veldhoven, NL
Aage BENDIKSEN - Fairfield CT, US
Richard JACOBS - Brookfield CT, US
Andrew JUDGE - Monroe CT, US
Veera Venkata Narasimha Narendra Phani KOTTAPALLI - Fairfield CT, US
Joseph Harry LYONS - Wilton CT, US
Theodorus Marinus MODDERMAN - Nuenen, NL
Manish RANJAN - Eindhoven, NL
Marcus Adrianus VAN DE KERKHOF - Helmond, NL
Xugang XIONG - Westport CT, US

ASML NETHERLANDS B.V. - Veldhoven
ASML HOLDING N.V. - Veldhoven

G03F 1/64
G03F 1/00
G03F 7/20

An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.

20200166855, May 28, 2020

Jun 28, 2018

16/630508

- Veldhoven, NL
Aage BENDIKSEN - Fairfield CT, US
Pedro Julian RIZO DIAGO - Chappaqua NY, US

ASML HOLDING N.V. - Veldhoven

G03F 7/20

A system designed to couple a patterning device to a support structure having a plurality of burls includes a camera module, an actuator, and a controller. The camera module is designed to capture image data of a backside of the patterning device. The actuator is coupled to at least one burl of the plurality of burls and is designed to move the at least one burl. The controller is designed to receive the image data captured from the camera module and determine one or more locations of contamination on the backside of the patterning device from the image data. The controller is also designed to control the actuator to move the at least one burl of the plurality of burls away from the one or more locations of contamination on the backside of the patterning device, based on the determined locations of contamination.

20200064731, Feb 27, 2020

Oct 30, 2019

16/667956

- Veldhoven, NL
Aage BENDIKSEN - Fairfield CT, US
Derk Servatius Gertruda BROUNS - Herentals, BE
Pradeep K. GOVIL - Norwalk CT, US
Paul JANSSEN - Eindhoven, NL
Maxim Aleksandrovich NASALEVICH - Eindhoven, NL
Arnould Willem NOTENBOOM - Rosmalen, NL
Mária PÉTER - Eindhoven, NL
Marcus Adrianus VAN DE KERKHOF - Helmond, NL
Willem Joan VAN DER ZANDE - Bussum, NL
Pieter-Jan VAN-ZWOL - Eindhoven, NL
Johannes Petrus Martinus Bernardus VERMEULEN - Leende, NL
Willem-Pieter VOORTHUIJZEN - 's-Hertogenbosch, NL
James Norman WILEY - Menlo Park CA, US

ASML NETHERLANDS B.V. - Veldhoven
ASML HOLDING N.V. - Veldhoven

G03F 1/64
G03F 1/22
G03F 7/20
G03F 1/62

A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.