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Jeffrey Cyhao Hung

from Burlingame, CA
Age ~58

Jeffrey Hung Phones & Addresses

  • 1529 La Mesa Dr, Burlingame, CA 94010 (650) 952-4478
  • Millbrae, CA
  • 2501 Donegal Ave, South San Francisco, CA 94080 (650) 952-4785
  • San Francisco, CA
  • San Jose, CA
  • Berkeley, CA
  • Menlo Park, CA
  • San Mateo, CA

Professional Records

Medicine Doctors

Jeffrey Hung Photo 1

Jeffrey L. Hung

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Specialties:
Diagnostic Radiology, Radiology
Work:
Brandywine Radiology GroupBrandywine Hospital Radiology
201 Reeceville Rd BLDG 203, Coatesville, PA 19320
(610) 383-8120 (phone), (610) 383-8378 (fax)
Education:
Medical School
West Virginia University School of Medicine
Graduated: 1994
Languages:
English
Spanish
Description:
Dr. Hung graduated from the West Virginia University School of Medicine in 1994. He works in Coatesville, PA and specializes in Diagnostic Radiology and Radiology. Dr. Hung is affiliated with Brandywine Hospital.

Publications

Amazon

Finance and Economics Discussion Series: The Geography of Stock Market Participation: The Influence of Communities and Local Firms

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This paper is the first to investigate the importance of geography in explaining equity market participation. We provide evidence to support two distinct local area effects. The first is a community ownership effect, that is, individuals are influenced by the investment behavior of members of their ...

Author

Nguyen Manh Hung, Jeffrey R. Brown

Binding

Paperback

Pages

48

Publisher

BiblioGov

ISBN #

1243986026

EAN Code

9781243986023

ISBN #

10

Us Patents

Etching Process For Organic Anti-Reflective Coating

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US Patent:
20020106902, Aug 8, 2002
Filed:
Feb 15, 2002
Appl. No.:
10/075602
Inventors:
Jeffrey Hung - San Jose CA, US
Brian Lee - Saratoga CA, US
International Classification:
H01L021/302
H01L021/461
US Classification:
438/706000
Abstract:
A process for selectively removing an anti-reflective coating (ARC) in the manufacturing of semiconductor integrated circuits using an oxygen-free plasma of one or more fluorine containing compounds, chlorine and an optional inert carrier gas. The process renders effective etching of the anti-reflective coating while maintaining dimensional control of a previously etched photoresist.

Etching Process For Organic Anti-Reflective Coating

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US Patent:
6391786, May 21, 2002
Filed:
Dec 31, 1997
Appl. No.:
09/002007
Inventors:
Jeffrey Hung - San Jose CA
Brian Lee - Saratoga CA
Assignee:
Lam Research Corporation - Fremont CA
International Classification:
H01L 21302
US Classification:
438706, 438710, 438711, 438712, 438714
Abstract:
A process for selectively removing an anti-reflective coating (ARC) in the manufacturing of semiconductor integrated circuits using an oxygen-free plasma of one or more fluorine containing compounds, chlorine and an optional inert carrier gas. The process renders effective etching of the anti-reflective coating while maintaining dimensional control of a previously etched photoresist.
Jeffrey Cyhao Hung from Burlingame, CA, age ~58 Get Report