Dong Hua Li from 600 Telford Ave, South San Francisco, CA 94080, age 59, Phone: (415) 816-8051

Method For High Aspect Ratio Hdp Cvd Gapfill

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US Patent:

6812153, Nov 2, 2004

Filed:

Apr 30, 2002

Appl. No.:

10/137132

Inventors:

Zhong Qiang Hua - Saratoga CA
Dong Qing Li - Santa Clara CA
Zhengquan Tan - Cupertino CA
Zhuang Li - San Jose CA
Michael Chiu Kwan - Redwood City CA
Bruno Geoffrion - San Jose CA
Padmanabhan Krishnaraj - San Francisco CA

Assignee:

Applied Materials Inc. - Santa Clara CA

International Classification:

H01L 21302

US Classification:

438706, 438710, 438712, 427569

Abstract:

A method of depositing a high density plasma silicon oxide layer having improved gapfill capabilities. In one embodiment the method includes flowing a process gas consisting of a silicon-containing source, an oxygen-containing source and helium into a substrate processing chamber and forming a plasma from the process gas. The ratio of the flow rate of the helium with respect to the combined flow rate of the silicon source and oxygen source is between 0. 5:1 and 3. 0:1 inclusive. In one particular embodiment, the process gas consists of monosilane (SiH ), molecular oxygen (O ) and helium.

Method For High Aspect Ratio Hdp Cvd Gapfill

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US Patent:

7064077, Jun 20, 2006

Filed:

Oct 1, 2004

Appl. No.:

10/956469

Inventors:

Zhong Qiang Hua - Saratoga CA, US
Dong Qing Li - Santa Clara CA, US
Zhengquan Tan - Cupertino CA, US
Zhuang Li - San Jose CA, US
Michael Chiu Kwan - Redwood City CA, US
Bruno Geoffrion - San Jose CA, US
Padmanabhan Krishnaraj - San Francisco CA, US

Assignee:

Applied Materials - Santa Clara CA

International Classification:

H01L 21/302

US Classification:

438715, 438706, 438714, 427569

Abstract:

A method of depositing a high density plasma silicon oxide layer having improved gapfill capabilities. In one embodiment the method includes flowing a process gas consisting of a silicon-containing source, an oxygen-containing source and helium into a substrate processing chamber and forming a plasma from the process gas. The ratio of the flow rate of the helium with respect to the combined flow rate of the silicon source and oxygen source is between 0. 5:1 and 3. 0:1 inclusive. In one particular embodiment, the process gas consists of monosilane (SiH), molecular oxygen (O) and helium.

Hdp-Cvd Multistep Gapfill Process

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US Patent:

7205240, Apr 17, 2007

Filed:

Jun 4, 2003

Appl. No.:

10/456611

Inventors:

M. Ziaul Karim - San Jose CA, US
Bikram Kapoor - Santa Clara CA, US
Anchuan Wang - Fremont CA, US
Dong Qing Li - Santa Clara CA, US
Katsunari Ozeki - Chiba, JP
Manoj Vellaikal - Santa Clara CA, US
Zhuang Li - San Jose CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C23C 16/00

US Classification:

438694, 438695, 438692, 438424, 438435, 42725523, 42725528, 42725537, 216 59, 216 67, 216 79, 15634524, 15634533, 15634548, 118696, 118697, 118723 I, 118723 IR

Abstract:

A gapfill process is provided using cycling of HDP-CVD deposition, etching, and deposition step. The fluent gas during the first deposition step includes an inert gas such as He, but includes Hduring the remainder deposition step. The higher average molecular weight of the fluent gas during the first deposition step provides some cusping over structures that define the gap to protect them during the etching step. The lower average molecular weight of the fluent gas during the remainder deposition step has reduced sputtering characteristics and is effective at filling the remainder of the gap.

Thin-Film Magnetic Head Having A Write Shield Layer

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US Patent:

7440229, Oct 21, 2008

Filed:

Aug 6, 2004

Appl. No.:

10/912245

Inventors:

Yoshitaka Sasaki - Santa Clara CA, US
Lijie Guan - Milpitas CA, US
Hiroyuki Ito - Sunnyvale CA, US
Dong Hong Li - Fremont CA, US

Assignee:

Headway Technologies, Inc. - Milpitas CA

International Classification:

G11B 5/127

US Classification:

36012522

Abstract:

A thin-film magnetic head has a laminated construction comprising a main pole layer having a magnetic pole tip on a side of the medium-opposing surface opposing a recording medium, a write shield layer opposing the magnetic pole tip forming a recording gap layer, on the side of the medium-opposing surface, and a thin-film coil wound around at least a portion of the write shield layer. The thin-film magnetic head has an upper yoke pole layer having a larger size than the portion of the main pole layer which is more distant from the medium-opposing surface than the recording gap layer, wherein the upper yoke pole layer is joined to the side of the main pole layer which is near the thin-film coil.

Image Feature Identification And Motion Compensation Apparatus, Systems, And Methods

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US Patent:

7542614, Jun 2, 2009

Filed:

Jun 6, 2007

Appl. No.:

11/758910

Inventors:

Amnon Silverstein - Mountain View CA, US
Sheng Lin - Sunnyvale CA, US
Dong Li - Cupertino CA, US

Assignee:

Micron Technology, Inc. - Boise ID

International Classification:

G06K 9/36

US Classification:

382232

Abstract:

Apparatus, systems, and methods disclosed herein may estimate the magnitude of relative motion between a scene and an image capture device used to capture the scene. Some embodiments may utilize discrete cosine transform and/or Sobel gradient techniques to identify one or more blocks of pixels in an originating calibration image frame. Matching blocks of pixels may be located in a successive calibration image frame. Motion vectors originating at one calibration frame and terminating at the other calibration frame may be calculated. The magnitude of relative motion derived thereby may be used to adjust image capture parameters associated with the image capture device, including exposure settings.

Image Feature Identification And Motion Compensation Apparatus, Systems, And Methods

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US Patent:

7599566, Oct 6, 2009

Filed:

Jun 6, 2007

Appl. No.:

11/758815

Inventors:

Amnon Silverstein - Mountain View CA, US
Sheng Lin - Sunnyvale CA, US
Dong Li - Cupertino CA, US

Assignee:

Aptina Imaging Corporation - George Town

International Classification:

G06K 9/36

US Classification:

382238

Abstract:

Apparatus, systems, and methods disclosed herein may estimate the magnitude of relative motion between a scene and an image capture device used to capture the scene. Some embodiments may utilize discrete cosine transform and/or Sobel gradient techniques to identify one or more blocks of pixels in an originating calibration image frame. Matching blocks of pixels may be located in a successive calibration image frame. Motion vectors originating at one calibration frame and terminating at the other calibration frame may be calculated. The magnitude of relative motion derived thereby may be used to adjust image capture parameters associated with the image capture device, including exposure settings.

Thin-Film Magnetic Head, Method Of Manufacturing The Same, Head Gimbal Assembly, And Hard Disk Drive

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US Patent:

7718218, May 18, 2010

Filed:

Sep 10, 2008

Appl. No.:

12/232065

Inventors:

Yoshitaka Sasaki - Santa Clara CA, US
Lijie Guan - Milpitas CA, US
Hiroyuki Ito - Sunnyvale CA, US
Dong Hong Li - Fremont CA, US

Assignee:

Headway Technologies, Inc. - Milpitas CA

International Classification:

G11B 5/127
G11B 5/17
G11B 5/187

US Classification:

427130, 427355, 4273722, 427402

Abstract:

A thin-film magnetic head has a laminated construction comprising a main pole layer having a magnetic pole tip on a side of the medium-opposing surface opposing a recording medium, a write shield layer opposing the magnetic pole tip forming a recording gap layer, on the side of the medium-opposing surface, and a thin-film coil wound around at least a portion of the write shield layer. The thin-film magnetic head has an upper yoke pole layer having a larger size than the portion of the main pole layer which is more distant from the medium-opposing surface than the recording gap layer, wherein the upper yoke pole layer is joined to the side of the main pole layer which is near the thin-film coil.

Image Feature Identification And Motion Compensation Apparatus, Systems, And Methods

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US Patent:

7924316, Apr 12, 2011

Filed:

Mar 14, 2007

Appl. No.:

11/717954

Inventors:

Amnon Silverstein - Mountain View CA, US
Sheng Lin - Sunnyvale CA, US
Dong Li - Cupertino CA, US

Assignee:

Aptina Imaging Corporation - George Town

International Classification:

H04N 5/228

US Classification:

3482084

Abstract:

Apparatus, systems, and methods disclosed herein may estimate the magnitude of relative motion between a scene and an image capture device used to capture the scene. Some embodiments may utilize discrete cosine transform and/or Sobel gradient techniques to identify one or more blocks of pixels in an originating calibration image frame. Matching blocks of pixels may be located in a successive calibration image frame. Motion vectors originating at one calibration frame and terminating at the other calibration frame may be calculated. The magnitude of relative motion derived thereby may be used to adjust image capture parameters associated with the image capture device, including exposure settings.