Daniel H Marx

44837399, Nov 20, 1984

Feb 16, 1984

6/579154

Elena H. Too - Nutley NJ
Daniel R. Marx - Montclair NJ

OMI International Corporation - Warren MI

C23F 102
B44C 122
C03C 1500
C03C 2506

156656

An improved composition for selectively stripping gold from a metal substrate, especially copper metal, wherein the gold deposit is rapidly and effectively stripped without an attendant attack on the metal substrate. A minor amount of an organo mercapto compound, e. g. mercaptobenzothiazole, is added to the stripping composition to inhibit attack on the metal substrate.

54395003, Aug 8, 1995

Dec 2, 1993

8/161143

Daniel R. Marx - West Caldwell NJ

Materials Research Corporation - Orangeburg NY

C22C 1900
C22C 3800
B22F 312

75246

A magneto-optical sputter target having a composition comprising at least one rare earth element and at least one transition metal, with a structure which includes a transition metal constituent and a finely mixed alloy constituent of a rare earth phase and a rare earth/transition metal intermetallic compound. The structure of the present target contains a minimum of the intermetallic compound. A method of producing the present sputter target includes mixing particles of the transition metal constituent (preferably only alloyed transition metals) with particles of the finely mixed alloy to produce a powder blend and subjecting the powder blend to a pressing operation in an oxidizing inhibiting environment for a time and at a temperature and pressure which minimizes the rare earth/transition metal intermetallic compound content of the target.

44708866, Sep 11, 1984

Jan 4, 1983

6/454503

Robert Duva - Paramus NJ
Daniel R. Marx - Montclair NJ

OMI International Corporation - Warren MI

C25D 362

204 43G

Improved electroplating ternary gold alloy plating baths wherein the gold ingredient is an alkali metal auricyanide, the gold metal being in the plus three oxidation state, and the alloying metals are both cobalt and molybdenum. The electroplating baths also contain citric acid. A wetting agent or surfactant as well as a stress reducer-brightener are also advantageously utilized in the bath. The ternary alloys may be deposited on various electronic and decorative substrates, and the deposits were characterized by unique physical and mechanical properties. Most importantly, there is a substantial improvement in wear resistance. The method of utilizing such improved electroplating baths on various substrates is also described and claimed.

53363868, Aug 9, 1994

Oct 28, 1992

7/967458

Daniel R. Marx - West Caldwell NJ
Steven Hurwitt - Park Ridge NJ

Materials Research Corporation - Orangeburg NY

C23C 1434

20429812

A sputtering target and target assembly includes a target member having a substantially continuously concave top surface and a bottom surface with a central, downwardly directed hub and at least three annular regions of differing radius of curvature. The shape of the target member bottom surface conforms to a backplate to which it is mounted, thereby facilitating accurate mounting of the target member during sputtering. The corresponding shapes of the target member and backplate promote maximum utilization of sputtering material.